Patents by Inventor Kenichi Ueda

Kenichi Ueda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11075570
    Abstract: There is provided a rotary electric machine that ensures improving a maximum torque and a rated power factor while reducing an increase in a starting current. In view of this, the rotary electric machine includes a shaft, a rotor, and a stator. The rotor is fixed to an outer periphery of the shaft. The stator is located so as to surround an outer periphery of the rotor. The rotor includes a rotor iron core including a plurality of rotor slots located at predetermined intervals in a circumferential direction and rotor bars inserted into the rotor slots. Rotor slits communicate with outer peripheral sides of the rotor slots. The rotor slits have a width ws in a circumferential direction. The width ws is smaller than a height hs in a radial direction of the rotor slit, and when a rated current is denoted as I1, a turn ratio (primary/secondary) is denoted as Tr, and a magnetic permeability in a vacuum is denoted as ?0, a relationship of ws>?0×I1×Tr/0.6 is met.
    Type: Grant
    Filed: July 31, 2017
    Date of Patent: July 27, 2021
    Assignee: Hitachi Industrial Products, Ltd.
    Inventors: Kazuo Nishihama, Masanori Sawahata, Takayuki Koyama, Makoto Imura, Yuuichirou Yoshitake, Kenichi Sugimoto, Kengo Ueda
  • Patent number: 10862261
    Abstract: A laser medium unit includes: a plate-shaped laser gain medium which includes a first surface and a second surface opposite to the first surface and generates emission light by the irradiation of excitation light from the first surface; a reflection member that is provided on the second surface so as to reflect the excitation light and the emission light; and a cooling member that cools the laser gain medium. The laser gain medium includes an irradiation area which is irradiated with the excitation light and an outer area which is located outside the irradiation area when viewed from a thickness direction intersecting the first surface and the second surface. The cooling member is thermally connected to the second surface through the reflection member so that a cooling area of the laser gain medium is formed on the second surface.
    Type: Grant
    Filed: February 5, 2018
    Date of Patent: December 8, 2020
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Kenichi Ueda, Koichi Iyama, Yoshinori Kato, Takashi Sekine, Toshiyuki Kawashima
  • Patent number: 10826263
    Abstract: A laser medium unit includes: a plate-shaped laser gain medium which includes a first surface and a second surface opposite to the first surface and generates emission light by the irradiation of excitation light from the first surface; a reflection member that is provided on the second surface so as to reflect the excitation light and the emission light; and a cooling member that cools the laser gain medium. The laser gain medium includes an irradiation area which is irradiated with the excitation light and an outer area which is located outside the irradiation area when viewed from a thickness direction intersecting the first surface and the second surface. The cooling member is thermally connected to the second surface through the reflection member so that a cooling area of the laser gain medium is formed on the second surface.
    Type: Grant
    Filed: February 5, 2018
    Date of Patent: November 3, 2020
    Assignee: Hamamatsu Photonics K.K.
    Inventors: Kenichi Ueda, Koichi Iyama, Yoshinori Kato, Takashi Sekine, Toshiyuki Kawashima
  • Publication number: 20190356105
    Abstract: A laser medium unit includes: a plate-shaped laser gain medium which includes a first surface and a second surface opposite to the first surface and generates emission light by the irradiation of excitation light from the first surface; a reflection member that is provided on the second surface so as to reflect the excitation light and the emission light; and a cooling member that cools the laser gain medium. The laser gain medium includes an irradiation area which is irradiated with the excitation light and an outer area which is located outside the irradiation area when viewed from a thickness direction intersecting the first surface and the second surface. The cooling member is thermally connected to the second surface through the reflection member so that a cooling area of the laser gain medium is formed on the second surface.
    Type: Application
    Filed: February 5, 2018
    Publication date: November 21, 2019
    Applicant: HAMAMATSU PHOTONICS K.K.
    Inventors: Kenichi UEDA, Koichi IYAMA, Yoshinori KATO, Takashi SEKINE, Toshiyuki KAWASHIMA
  • Patent number: 9695513
    Abstract: A hydrophobization treatment apparatus includes a cooling device which cools a substrate, a light irradiation device which irradiates thermal radiation light from light sources onto front surface of the substrate, a gas supply device which supplies hydrophobization-treatment gas to the substrate, an exhaust device which exhausts the gas, a lifting device which moves the substrate such that the lifting device raises and lowers the substrate between the cooling device and light sources, and a control device which has circuitry to control the light irradiation device, the gas supply device, the exhaust device and the lifting device. The circuitry of the control device executes first gas supply control to discharge and exhaust the gas into and from the space between the gas container and substrate, and after the first control, second gas supply control to discharge and exhaust the gas into and from the space between the gas container and substrate.
    Type: Grant
    Filed: August 27, 2015
    Date of Patent: July 4, 2017
    Assignee: TOKYO ELECTRON LIMITED
    Inventor: Kenichi Ueda
  • Patent number: 9558960
    Abstract: A substrate processing method includes a coating step that applies a coating liquid to a substrate having a front surface on which a pattern is formed, thereby forming a coating film on the substrate, a film removing step that heats the substrate to gasify components of the coating film thereby to reduce a thickness of the film, and a film curing step that is performed after or simultaneously with the film removing step and that heats the substrate to cure the coating film through crosslinking reaction. The film removing step is performed under conditions ensuring that an average thickness of the cured coating film is not greater than 80% of an average thickness of the coating film before being subjected to the film removing step.
    Type: Grant
    Filed: December 24, 2015
    Date of Patent: January 31, 2017
    Assignee: Tokyo Electron Limited
    Inventors: Takahiro Shiozawa, Kenichi Ueda
  • Patent number: 9552987
    Abstract: A substrate processing method is performed to improve surface roughness of a pattern mask formed on a substrate by being exposed and developed. The method includes supplying a first solvent in a gaseous state to a surface of the substrate to dissolve the pattern mask, and supplying a second solvent to the surface of the substrate, which is supplied with the first solvent, to dissolve the pattern mask, wherein a permeability of the second solvent is lower than a permeability of the first solvent.
    Type: Grant
    Filed: June 6, 2014
    Date of Patent: January 24, 2017
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Yuichiro Miyata, Keiichi Tanaka, Kenichi Ueda, Takahiro Shiozawa
  • Patent number: 9434094
    Abstract: A molding die includes a die having a mold plane; and gloss control granules composed of 50 to 80 pbw of a shape retention fixation base material such as a thermosetting resin; 30 to 80 pbw of a diffuse reflecting surface formation core material such as a ceramic powder; and 5 to 10 pbw of a roughness enhancement material such as an inorganic fiber, adhered to the mold plane in a spaced-apart manner. The gloss control granules are each independently adhered in the spaced-apart manner to form gloss control projections on the mold plane of the die so that a surface of a molded product molded on the die forms a surface having a small specular reflection or a diffuse reflection, and the gloss control projections having fine, uneven surfaces with recesses and projections are formed on the mold plane at a coating rate of 40 to 80%.
    Type: Grant
    Filed: February 21, 2012
    Date of Patent: September 6, 2016
    Assignee: TANAZAWA HAKKOSHA CO., LTD.
    Inventors: Kenichi Ueda, Mitsushi Sogabe
  • Publication number: 20160189974
    Abstract: A substrate processing method includes a coating step that applies a coating liquid to a substrate having a front surface on which a pattern is formed, thereby forming a coating film on the substrate, a film removing step that heats the substrate to gasify components of the coating film thereby to reduce a thickness of the film, and a film curing step that is performed after or simultaneously with the film removing step and that heats the substrate to cure the coating film through crosslinking reaction. The film removing step is performed under conditions ensuring that an average thickness of the cured coating film is not greater than 80% of an average thickness of the coating film before being subjected to the film removing step.
    Type: Application
    Filed: December 24, 2015
    Publication date: June 30, 2016
    Inventors: Takahiro Shiozawa, Kenichi Ueda
  • Publication number: 20150361559
    Abstract: A hydrophobization treatment apparatus includes a cooling device which cools a substrate, a light irradiation device which irradiates thermal radiation light from light sources onto front surface of the substrate, a gas supply device which supplies hydrophobization-treatment gas to the substrate, an exhaust device which exhausts the gas, a lifting device which moves the substrate such that the lifting device raises and lowers the substrate between the cooling device and light sources, and a control device which has circuitry to control the light irradiation device, the gas supply device, the exhaust device and the lifting device. The circuitry of the control device executes first gas supply control to discharge and exhaust the gas into and from the space between the gas container and substrate, and after the first control, second gas supply control to discharge and exhaust the gas into and from the space between the gas container and substrate.
    Type: Application
    Filed: August 27, 2015
    Publication date: December 17, 2015
    Applicant: TOKYO ELECTRON LIMITED
    Inventor: Kenichi Ueda
  • Publication number: 20150212960
    Abstract: The power consumption of a USB 3.0 hub is reduced, and the interconnection between the USB 3.0 hub and USB 3.0 devices is improved. On receiving a data transfer request packet, which is transferred by a DS port in a low power consumption state, from a host, an SS controller of an SS hub makes the DS port transmit an LFPS for returning a destination device of the data transfer request packet to U0 state, and transmits a transfer enable packet, which is generated by the SS controller itself and shows that the destination device has become ready to correspond to the data transfer, to the host after transmitting a transfer deferment packet to the host. The SS controller does not execute a process that is specified in USB 3.0, and in which a transfer deferment packet is transmitted to the destination device after the DS port return to U0 state.
    Type: Application
    Filed: December 30, 2014
    Publication date: July 30, 2015
    Inventors: Kenichi Ueda, Tadahiro Watanabe, Chie Hinoma
  • Publication number: 20140363976
    Abstract: A substrate processing method is performed to improve surface roughness of a pattern mask formed on a substrate by being exposed and developed. The method includes supplying a first solvent in a gaseous state to a surface of the substrate to dissolve the pattern mask, and supplying a second solvent to the surface of the substrate, which is supplied with the first solvent, to dissolve the pattern mask, wherein a permeability of the second solvent is lower than a permeability of the first solvent.
    Type: Application
    Filed: June 6, 2014
    Publication date: December 11, 2014
    Inventors: Yuichiro MIYATA, Keiichi TANAKA, Kenichi UEDA, Takahiro SHIOZAWA
  • Publication number: 20130141792
    Abstract: [Problem to be Solved] Provided are a molding die by which a molded article with a reduced gloss can be molded; and a manufacturing method therefor, and provided are a method for matching the gloss levels of molded articles, by which the glosses of the surfaces of the molded articles molded with materials such as different synthetic resins can be matched; a molding die; and a manufacturing method therefor.
    Type: Application
    Filed: February 21, 2012
    Publication date: June 6, 2013
    Applicant: TANAZAWA HAKKOSHA CO., LTD.
    Inventors: Kenichi Ueda, Mitsushi Sogabe
  • Patent number: 7972680
    Abstract: To realize a resin composition which enables formation of a film having excellent film formability and bending resistance and having a small retardation. A resin composition of the present invention comprises: an acrylic resin as a main component; and organic fine particles whose average particle diameter ranges from 0.01 ?m to 1 ?m, wherein a glass transition temperature of the acrylic resin ranges from 110° C. to 200° C., and each of the organic fine particles has a structural unit of a vinyl cyanide monomer and a structural unit of an aromatic vinyl monomer.
    Type: Grant
    Filed: February 21, 2007
    Date of Patent: July 5, 2011
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Kenichi Ueda, Shigeo Otome, Akio Naka
  • Publication number: 20100168340
    Abstract: To realize a resin composition which enables formation of a film having excellent film formability and bending resistance and having a small retardation. A resin composition of the present invention comprises: an acrylic resin as a main component; and organic fine particles whose average particle diameter ranges from 0.01 ?m to 1 ?m, wherein a glass transition temperature of the acrylic resin ranges from 110° C. to 200° C., and each of the organic fine particles has a structural unit of a vinyl cyanide monomer and a structural unit of an aromatic vinyl monomer.
    Type: Application
    Filed: February 21, 2007
    Publication date: July 1, 2010
    Applicant: NIPPON SHOKUBAI CO., LTD
    Inventors: Kenichi Ueda, Shigeo Otome, Akio Naka
  • Patent number: 7657673
    Abstract: A data transfer control device, which transfers a large capacity of data speedily and sequentially, has three buffers that are used as a WR (write) buffer, an intermediate buffer, and an RD (read) buffer. To send data sequentially, the data transfer control device switches-over the buffers in one of the following three ways (A), (B), and (C), using determination flags indicating whether the buffers store effective data (data not yet referenced). A buffer control device switches-over (A) the WR buffer and RD buffer if a WR buffer effective flag 33 is on and an intermediate buffer effective flag 34 and an RD buffer effective flag 35 are off, (B) the WR buffer and the intermediate buffer if the WR buffer effective flag 33 and the RD buffer effective flag 35 are on and the intermediate buffer effective flag 34 is off, and (C) the intermediate buffer and the RD buffer if the intermediate buffer effective flag 34 is on and the RD buffer effective flag 35 is off.
    Type: Grant
    Filed: February 24, 2006
    Date of Patent: February 2, 2010
    Assignee: NEC Electronics Corporation
    Inventor: Kenichi Ueda
  • Patent number: 7448087
    Abstract: A recording medium is provided which is protected against unauthorized use and has heightened security. The recording medium stores storage authentication information that authenticates a user, and has an area that corresponds to the storage authentication information. The recording medium further includes a tamper-resistant authentication unit that judges whether or not received authentication information that authenticates a user matches the storage authentication information. The authentication unit is prevented from being decoded or tampered by third parties. In addition, it is possible to restrict access to the area according to the content of authentication.
    Type: Grant
    Filed: July 17, 2003
    Date of Patent: November 4, 2008
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Motoji Ohmori, Kenichi Ueda, Eiji Ueda
  • Publication number: 20080250173
    Abstract: A communication adapter comprises a host controller to interact with a connected device that is USB connected to the communication adapter, a wireless communication unit which communicates with an external wireless communication apparatus, and which has an endpoint configuration that corresponds one-to-one to an endpoint configuration of the connected device, and a data convertor which converts data from the wireless communication apparatus into data to be transmitted to the connected device, and converts data from the connected device into data to be transmitted to the wireless communication apparatus. Data transfer is performed between the wireless communication apparatus and the connected device.
    Type: Application
    Filed: April 3, 2008
    Publication date: October 9, 2008
    Applicant: NEC Electronics Corporation
    Inventor: Kenichi Ueda
  • Publication number: 20080220235
    Abstract: To provide an amorphous thermoplastic resin and a film or sheet each having high transparency and high heat resistance and a UV-absorbing ability, which can be used in various optical materials which needs to have excellent optical characteristics and well-balanced mechanical strength, molding processability, and surface hardness. An amorphous thermoplastic resin including a UV-absorbing monomer unit and having a glass transition temperature of 120° C. or more, in which the amorphous thermoplastic resin has a light transmittance of 80% or more at 500 nm and a light transmittance of less than 30% at 380 nm.
    Type: Application
    Filed: September 29, 2006
    Publication date: September 11, 2008
    Applicant: Nippon Shokubai Co Ltd
    Inventors: Hiroko Izumi, Yoshitomo Nakata, Kenichi Ueda
  • Patent number: 7397577
    Abstract: A printing system including a plurality of different kinds of printers and a printer selecting device therefore are disclosed. The printer selecting device includes an accepting section for accepting information representative of a desired number of printings input, and selecting means for selecting one of the printers matching with the desired number of printings. Image data to be printed are sent from the printer selecting device to the printer selected. In this configuration, one printer adequate for the desired number of printings, which is an important factor for the selection of a printer, is automatically selected.
    Type: Grant
    Filed: March 28, 2006
    Date of Patent: July 8, 2008
    Assignees: Tohoku Ricoh Co., Ltd., Ricoh Company, Ltd.
    Inventors: Kenichi Ueda, Hideaki Matsuda, Mutsuo Ogawa