Abstract: In one embodiment, a data generation method includes generating a plurality of parametric elements by dividing, at positions of an extremum and an inflection point, a parametric curve that expresses a shape of a writing pattern and is defined by a plurality of control points arranged in order in a predetermined direction, generating a polygon by extracting, for each of the parametric elements, one or some of the plurality of control points and connecting the extracted control points in order in the predetermined direction, calculating a coverage by the polygon in each of a plurality of rectangular segmented regions obtained by dividing a target to be irradiated with a charged particle beam into a predetermined size, and calculating a coverage of each segmented region in a peripheral part of the writing pattern by finding intersections of each of the plurality of parametric elements and four sides of each of the plurality of segmented regions.

Abstract: In one embodiment, a coverage calculating method is for calculating a coverage of a pattern in each of pixel regions obtained by dividing a writing region onto which the pattern is to be written by irradiation with a charged particle beam. Each of the pixel regions has a predetermined size. The method includes generating a plurality of first pixel regions by virtually dividing the writing region, the first pixel regions each having a first size, calculating a coverage of a pattern in the first pixel region, generating a plurality of second pixel regions by virtually dividing the first pixel region, the second pixel regions each having a second size smaller than the first size, selecting a second pixel region approximating a pattern shape in the first pixel region, and calculating a coverage in the selected second pixel region.

Abstract: In one embodiment, a writing data generating method is for generating writing data used in a multi charged particle beam writing apparatus. The method includes calculating, for a figure containing a curve and a straight line included in design data, a plurality of control points representing the curve and a plurality of vertices of the curve and straight line, and expressing a position of each of the control points and vertices as a displacement from an adjacent control point or vertex to generate the writing data.

Abstract: According to the present invention, writing data capable of suppressing a data amount and a calculation amount in a multi charged particle beam writing apparatus is generated from design data including a figure having a curve. The present embodiment relates to a writing data generating method for generating writing data used in a multi charged particle beam writing apparatus. The method includes calculating a pair of curves each representing a curve portion of a figure included in design data, the curves each being defined by a plurality of control points, and generating the writing data by expressing a position of a second control point adjacent in a traveling direction of the curve to a first control point of the plurality of control points as a displacement from the first control point in the traveling direction of the curve and a displacement from the first control point in a direction orthogonal to the traveling direction.

Abstract: In one embodiment, a data generation method is for calculating a coverage of a polygon in each of a plurality of pixels obtained by dividing a target to be irradiated with a charged particle beam into predetermined sizes. The method includes dividing a parametric curve that defines a pattern shape into a plurality of parametric curves, calculating, for each of the plurality of parametric curves, an area of a region surrounded by a segment connecting end points among control points of the parametric curve and the parametric curve, calculating positions of vertexes of a figure having an area equivalent to the calculated area and having, as one side thereof, the segment connecting the end points, and generating the polygon by using the vertexes.

Abstract: In one embodiment, a data generation method includes generating a plurality of parametric elements by dividing, at positions of an extremum and an inflection point, a parametric curve that expresses a shape of a writing pattern and is defined by a plurality of control points arranged in order in a predetermined direction, generating a polygon by extracting, for each of the parametric elements, one or some of the plurality of control points and connecting the extracted control points in order in the predetermined direction, calculating a coverage by the polygon in each of a plurality of rectangular segmented regions obtained by dividing a target to be irradiated with a charged particle beam into a predetermined size, and calculating a coverage of each segmented region in a peripheral part of the writing pattern by finding intersections of each of the plurality of parametric elements and four sides of each of the plurality of segmented regions.

Abstract: In one embodiment, a charged particle beam writing method includes dividing a figure pattern defined in writing data into a plurality of shot figures, virtually dividing a writing target substrate into a plurality of mesh regions, and calculating a correction irradiation amount to correct proximity effect and middle range effect for each of the mesh regions based on a position of the figure pattern, calculating an irradiation amount for each of the plurality of shot figures using the correction irradiation amount, calculating an insufficient irradiation amount at an edge portion of the shot figure based on the irradiation amount, resizing the shot figure based on the insufficient irradiation amount, and writing the resized shot figure on the writing target substrate using a charged particle beam in the irradiation amount.

Abstract: In one embodiment, a charged particle beam writing method includes virtually dividing a writing region of the substrate into a plurality of first mesh regions in a first mesh size, calculating an area density of the pattern for each of the plurality of first mesh regions to generate first mesh data, converting a mesh size of the first mesh data into a second mesh size greater than the first mesh size to generate second mesh data, performing a convolution operation between the second mesh data and a proximity effect correction kernel to generate third mesh data, converting a mesh size of the third mesh data into the first mesh size to generate fourth mesh data, performing a convolution operation between the first mesh data and a middle range effect correction kernel to generate fifth mesh data, and adding the fourth mesh data and the fifth mesh data together to calculate an irradiation amount of the charged particle beam for each of the plurality of first mesh regions.

Abstract: In one embodiment, a writing data generating method is for generating writing data used in a multi charged particle beam writing apparatus. The method includes calculating, for a figure containing a curve and a straight line included in design data, a plurality of control points representing the curve and a plurality of vertices of the curve and straight line, and expressing a position of each of the control points and vertices as a displacement from an adjacent control point or vertex to generate the writing data.

Abstract: In one embodiment, a writing data generating method is for generating writing data used in a multi charged particle beam writing apparatus. The method includes calculating, for a figure containing a curve and a straight line included in design data, a plurality of control points representing the curve and a plurality of vertices of the curve and straight line, and expressing a position of each of the control points and vertices as a displacement from an adjacent control point or vertex to generate the writing data.

Abstract: According to the present invention, writing data capable of suppressing a data amount and a calculation amount in a multi charged particle beam writing apparatus is generated from design data including a figure having a curve. The present embodiment relates to a writing data generating method for generating writing data used in a multi charged particle beam writing apparatus. The method includes calculating a pair of curves each representing a curve portion of a figure included in design data, the curves each being defined by a plurality of control points, and generating the writing data by expressing a position of a second control point adjacent in a traveling direction of the curve to a first control point of the plurality of control points as a displacement from the first control point in the traveling direction of the curve and a displacement from the first control point in a direction orthogonal to the traveling direction.

Abstract: In one embodiment, a data generation method is for calculating a coverage of a polygon in each of a plurality of pixels obtained by dividing a target to be irradiated with a charged particle beam into predetermined sizes. The method includes dividing a parametric curve that defines a pattern shape into a plurality of parametric curves, calculating, for each of the plurality of parametric curves, an area of a region surrounded by a segment connecting end points among control points of the parametric curve and the parametric curve, calculating positions of vertexes of a figure having an area equivalent to the calculated area and having, as one side thereof, the segment connecting the end points, and generating the polygon by using the vertexes.

Abstract: A writing data generating method for generating writing data used in a multi charged particle beam writing apparatus, that can suppress a data amount and a calculation amount in a multi charged particle beam writing apparatus generated from design data including a figure having a curve. The method includes calculating a pair of curves each representing a curve portion of a figure included in design data, the curves each being defined by a plurality of control points, and generating the writing data by expressing a position of a second control point adjacent in a traveling direction of the curve to a first control point of the plurality of control points as a displacement from the first control point in the traveling direction of the curve and a displacement from the first control point in a direction orthogonal to the traveling direction.

Abstract: In one embodiment, a writing data generation method is for generating writing data used by a multi-charged particle beam writing apparatus. The writing data generation method includes referring to library data in which a vertex sequence including a plurality of vertices is registered, and extracting a portion of an outer line of a figure contained in design data, the portion corresponding to the vertex sequence, and representing the extracted portion by information which identifies the vertex sequence and information which indicates a connection method for the plurality of vertices of the vertex sequence, and generating the writing data.

Abstract: In one embodiment, a charged particle beam writing method includes virtually dividing a writing region of the substrate into a plurality of first mesh regions in a first mesh size, calculating an area density of the pattern for each of the plurality of first mesh regions to generate first mesh data, converting a mesh size of the first mesh data into a second mesh size greater than the first mesh size to generate second mesh data, performing a convolution operation between the second mesh data and a proximity effect correction kernel to generate third mesh data, converting a mesh size of the third mesh data into the first mesh size to generate fourth mesh data, performing a convolution operation between the first mesh data and a middle range effect correction kernel to generate fifth mesh data, and adding the fourth mesh data and the fifth mesh data together to calculate an irradiation amount of the charged particle beam for each of the plurality of first mesh regions.

Abstract: In one embodiment, a charged particle beam writing method includes dividing a figure pattern defined in writing data into a plurality of shot figures, virtually dividing a writing target substrate into a plurality of mesh regions, and calculating a correction irradiation amount to correct proximity effect and middle range effect for each of the mesh regions based on a position of the figure pattern, calculating an irradiation amount for each of the plurality of shot figures using the correction irradiation amount, calculating an insufficient irradiation amount at an edge portion of the shot figure based on the irradiation amount, resizing the shot figure based on the insufficient irradiation amount, and writing the resized shot figure on the writing target substrate using a charged particle beam in the irradiation amount.

Abstract: A writing data generating method for generating writing data used in a multi charged particle beam writing apparatus, that can suppress a data amount and a calculation amount in a multi charged particle beam writing apparatus generated from design data including a figure having a curve. The method includes calculating a pair of curves each representing a curve portion of a figure included in design data, the curves each being defined by a plurality of control points, and generating the writing data by expressing a position of a second control point adjacent in a traveling direction of the curve to a first control point of the plurality of control points as a displacement from the first control point in the traveling direction of the curve and a displacement from the first control point in a direction orthogonal to the traveling direction.

Abstract: In one embodiment, a data processing method is provided for generating writing data from design data and registering the writing data in a charged particle beam writing apparatus. The method includes generating the writing data by performing a plurality of conversion processes on a plurality of pieces of first frame data obtained through division of the design data corresponding to one chip, and performing a plurality of preprocessing processes on a plurality of pieces of second frame data obtained through division of the writing data of the chip, and registering the writing data of the chip in the charged particle beam writing apparatus. The plurality of conversion processes are performed in frame-basis pipeline processing, and the plurality of preprocessing processes are performed in frame-basis pipeline processing. The writing data is registered in the charged particle beam writing apparatus on a frame basis.

Abstract: A drawing data generating method according to an embodiment is a method for generating drawing data input to a drawing apparatus that draws a plurality of figure patterns on an object using a charged particle beam. The method includes generating the drawing data in accordance with a data format that not only defines a plurality of pieces of figure information, but also sequentially defines dose information of each figure before or after the plurality of pieces of figure information. The dose information of each of the second and succeeding figures is converted to a representation based on the dose information of any preceding figure, and a data length of the dose information is made variable for each figure. For example, the dose information of each of the second and succeeding figures is converted to a difference representation between a dose of the figure and a dose of the preceding figure, and a data length of the difference representation is changed in accordance with the magnitude of a difference value.

Abstract: In one embodiment, a writing data generating method is for generating writing data used in a multi charged particle beam writing apparatus. The method includes calculating, for a figure containing a curve and a straight line included in design data, a plurality of control points representing the curve and a plurality of vertices of the curve and straight line, and expressing a position of each of the control points and vertices as a displacement from an adjacent control point or vertex to generate the writing data.