Abstract: A semiconductor device with favorable electrical characteristics is provided. A semiconductor device with stable electrical characteristics is provided. The semiconductor device includes a semiconductor layer, a first insulating layer, and a first conductive layer. The first insulating layer is provided over the semiconductor layer. The first conductive layer is provided over the first insulating layer. The semiconductor layer includes a first region that overlaps with the first conductive layer and the first insulating layer, a second region that does not overlap with the first conductive layer and overlaps with the first insulating layer, and a third region that overlaps with neither the first conductive layer nor the first insulating layer. The semiconductor layer contains a metal oxide. The second region and the third region contain a first element. The first element is one or more elements selected from boron, phosphorus, aluminum, and magnesium.

Abstract: Manufacturing equipment for a light-emitting device with which steps from formation to sealing of a light-emitting element can be successively performed is provided. With the manufacturing equipment for a light-emitting device, a deposition step, a lithography step, and an etching step for forming an organic EL element and a sealing step by formation of a protective layer can be successively performed. Accordingly, a downscaled organic EL element with high luminance and high reliability can be formed. Moreover, the manufacturing equipment can have an in-line system where apparatuses are arranged in the order of process steps for the light-emitting device, resulting in high throughput manufacturing.

Abstract: Logic LSI includes first power domains PD1 to PD4, thick-film power switches SW1 to SW4, and power switch controllers PSWC1 to PSWC4. The thick-film power switches are formed by thick-film power transistors manufactured in a process common to external input/output circuits I/O. The first power domains include second power domains SPD11 to SPD42 including logic blocks, control circuit blocks SCB1 to SCB4, and thin-film power switches SWN11 to SWN42 that are connected to the thick-film power switches via virtual ground lines VSSM1 to VSSM4, and formed by thin-film power transistors manufactured in a process common to the logic blocks. In this way, power switches having different thickness of gate insulating films from one another are vertically stacked so as to be in a hierarchical structure, and each power switch is individually controlled by a power switch controller and a control circuit block correspondingly to each mode.

Abstract: Logic LSI includes first power domains PD1 to PD4, thick-film power switches SW1 to SW4, and power switch controllers PSWC1 to PSWC4. The thick-film power switches are formed by thick-film power transistors manufactured in a process common to external input/output circuits I/O. The first power domains include second power domains SPD11 to SPD42 including logic blocks, control circuit blocks SCB1 to SCB4, and thin-film power switches SWN11 to SWN42 that are connected to the thick-film power switches via virtual ground lines VSSM1 to VSSM4, and formed by thin-film power transistors manufactured in a process common to the logic blocks. In this way, power switches having different thickness of gate insulating films from one another are vertically stacked so as to be in a hierarchical structure, and each power switch is individually controlled by a power switch controller and a control circuit block correspondingly to each mode.

Abstract: Logic LSI includes first power domains PD1 to PD4, thick-film power switches SW1 to SW4, and power switch controllers PSWC1 to PSWC4. The thick-film power switches are formed by thick-film power transistors manufactured in a process common to external input/output circuits I/O. The first power domains include second power domains SPD11 to SPD42 including logic blocks, control circuit blocks SCB1 to SCB4, and thin-film power switches SWN11 to SWN42 that are connected to the thick-film power switches via virtual ground lines VSSM1 to VSSM4, and formed by thin-film power transistors manufactured in a process common to the logic blocks. In this way, power switches having different thickness of gate insulating films from one another are vertically stacked so as to be in a hierarchical structure, and each power switch is individually controlled by a power switch controller and a control circuit block correspondingly to each mode.

Abstract: A semiconductor integrated circuit includes a first power source wiring line (VDD1) for conveying a first supply voltage; a logic circuit block (CKB) which is operable by being fed with the first supply voltage; a second power source wiring line (VDD2) for propagating a second supply voltage which is higher in level than the first supply voltage; a switch (MPS) which is capable of connecting the first power source wiring line and the second power source wiring line; and a control circuit (VCTLC) which can control the switch when the first supply voltage has undergone a potential drop, so as to intermittently connect the second power source wiring line to the first power source wiring line. Owing to the control of the control circuit, a local supply voltage fluctuation is prevented, thereby to achieve the enhancement of the power source performance of the semiconductor integrated circuit.

Abstract: Logic LSI includes first power domains PD1 to PD4, thick-film power switches SW1 to SW4, and power switch controllers PSWC1 to PSWC4. The thick-film power switches are formed by thick-film power transistors manufactured in a process common to external input/output circuits I/O. The first power domains include second power domains SPD11 to SPD42 including logic blocks, control circuit blocks SCB1 to SCB4, and thin-film power switches SWN11 to SWN42 that are connected to the thick-film power switches via virtual ground lines VSSM1 to VSSM4, and formed by thin-film power transistors manufactured in a process common to the logic blocks. In this way, power switches having different thickness of gate insulating films from one another are vertically stacked so as to be in a hierarchical structure, and each power switch is individually controlled by a power switch controller and a control circuit block correspondingly to each mode.