Patents by Inventor Kenichiro Iwamura

Kenichiro Iwamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Self-supporting film, self-supporting structure, method for manufacturing self-supporting film, and pellicle
    Patent number: 10578962
    Abstract: Provided is a self-supporting film that has an anti-reflection function independently, so that the self-supporting film exhibits excellent optical characteristics as a result. A self-supporting film has a rugged-structure layer having periodic rugged shapes formed on a surface thereof, with these periodic rugged shapes being formed on at least one surface. The average thickness of the self-supporting film ranges from 0.2 ?m to 20.0 ?m. The rugged-structure layer has a yield strain of 1% or greater and a tensile elongation of 10% or greater.
    Type: Grant
    Filed: July 25, 2016
    Date of Patent: March 3, 2020
    Assignee: ASAHI KASEI E-MATERIALS CORPORATION
    Inventors: Seitaro Doi, Kenichiro Iwamura, Takuji Namatame
  • SELF-SUPPORTING FILM, SELF-SUPPORTING STRUCTURE, METHOD FOR MANUFACTURING SELF-SUPPORTING FILM, AND PELLICLE
    Publication number: 20160334699
    Abstract: Provided is a self-supporting film that has an anti-reflection function independently, so that the self-supporting film exhibits excellent optical characteristics as a result. A self-supporting film has a rugged-structure layer having periodic rugged shapes formed on a surface thereof, with these periodic rugged shapes being formed on at least one surface. The average thickness of the self-supporting film ranges from 0.2 ?m to 20.0 ?m. The rugged-structure layer has a yield strain of 1% or greater and a tensile elongation of 10% or greater.
    Type: Application
    Filed: July 25, 2016
    Publication date: November 17, 2016
    Applicant: ASAHI KASEI E-MATERIALS CORPORATION
    Inventors: Seitaro DOI, Kenichiro IWAMURA, Takuji NAMATAME
  • SELF-SUPPORTING FILM, SELF-SUPPORTING STRUCTURE, METHOD FOR MANUFACTURING SELF-SUPPORTING FILM, AND PELLICLE
    Publication number: 20130004711
    Abstract: Provided is a self-supporting film that has an anti-reflection function independently, so that the self-supporting film exhibits excellent optical characteristics as a result. A self-supporting film has a rugged-structure layer having periodic rugged shapes formed on a surface thereof, with these periodic rugged shapes being formed on at least one surface. The average thickness of the self-supporting film ranges from 0.2 ?m to 20.0 ?m. The rugged-structure layer has a yield strain of 1% or greater and a tensile elongation of 10% or greater.
    Type: Application
    Filed: April 13, 2011
    Publication date: January 3, 2013
    Inventors: Seitaro Doi, Kenichiro Iwamura, Takuji Namatame