Patents by Inventor Kenichiro Miyashita
Kenichiro Miyashita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9834696Abstract: An undercoat agent including a block copolymer having a plurality of blocks bonded formed on a substrate. The undercoat agent contains a resin component that includes a structural unit having an aromatic ring and a structural unit having no aromatic ring, and the resin component includes a group which can interact with the substrate and does not include a 3 to 7-membered, ether-containing cyclic group; and a method of forming a pattern of a layer containing a block copolymer. The method includes applying an undercoat agent to a substrate to form a layer containing the undercoat agent; forming a layer containing a block copolymer having multiple blocks bonded on a surface of the layer containing the undercoat agent, followed by a phase separation of the layer containing the block copolymer; and selectively removing a phase containing at least one block of multiple blocks constituting the block copolymer.Type: GrantFiled: May 16, 2016Date of Patent: December 5, 2017Assignee: TOKYO OHKA KOGYO CO., LTD.Inventors: Takahiro Senzaki, Ken Miyagi, Tsuyoshi Kurosawa, Daiju Shiono, Tasuku Matsumiya, Kenichiro Miyashita, Katsumi Ohmori
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Patent number: 9676934Abstract: The present invention relates to a composition including: a component (A) being a block copolymer including a block PA bonded to one, or two or more blocks incompatible with the block PA and whose etching selectivity to the block PA is greater than one; and a component (B) being at least one polymer selected from the group consisting of a random copolymer and a homopolymer, wherein the polymer of the component (B) is compatible with at least one block other than the block PA within the blocks constituting the block copolymer of the component (A), and is incompatible with the block PA.Type: GrantFiled: March 7, 2013Date of Patent: June 13, 2017Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Takahiro Senzaki, Ken Miyagi, Kenichiro Miyashita
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Patent number: 9475088Abstract: A method of producing a structure containing a phase-separated structure, including applying a neutralization film to a substrate to form a layer of a neutralization film; applying a block copolymer having a plurality of polymers bonded thereto, and a weight average molecular weight of 150,000 or more to the layer of the neutralization film, so as to form a layer containing the block copolymer and having a coating film thickness of 23 nm or less; and phase-separating the layer containing the block copolymer.Type: GrantFiled: August 6, 2014Date of Patent: October 25, 2016Assignee: TOKYO OHKA KOGYO CO., LTD.Inventors: Tsuyoshi Kurosawa, Daiju Shiono, Ken Miyagi, Tasuku Matsumiya, Kenichiro Miyashita, Katsumi Ohmori
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Publication number: 20160257838Abstract: An undercoat agent including a block copolymer having a plurality of blocks bonded formed on a substrate. The undercoat agent contains a resin component that includes a structural unit having an aromatic ring and a structural unit having no aromatic ring, and the resin component includes a group which can interact with the substrate and does not include a 3 to 7-membered, ether-containing cyclic group; and a method of forming a pattern of a layer containing a block copolymer. The method includes applying an undercoat agent to a substrate to form a layer containing the undercoat agent; forming a layer containing a block copolymer having multiple blocks bonded on a surface of the layer containing the undercoat agent, followed by a phase separation of the layer containing the block copolymer; and selectively removing a phase containing at least one block of multiple blocks constituting the block copolymer.Type: ApplicationFiled: May 16, 2016Publication date: September 8, 2016Inventors: Takahiro SENZAKI, Ken MIYAGI, Tsuyoshi KUROSAWA, Daiju SHIONO, Tasuku MATSUMIYA, Kenichiro MIYASHITA, Katsumi OHMORI
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Patent number: 9169421Abstract: A method of producing a structure containing a phase-separated structure, including forming, on a substrate, a layer containing a block copolymer having a block of a polyhedral oligomeric silsesquioxane structure-containing structural unit; forming a top coat film by applying, to the layer containing the block copolymer, a top coat material which undergoes a change in polarity upon heating, and controls a surface energy of the layer containing the block copolymer; and subjecting the layer containing the block copolymer on which the top coat film is formed to phase separation by thermal annealing.Type: GrantFiled: February 20, 2014Date of Patent: October 27, 2015Assignees: TOKYO OHKA KOGYO CO., LTD., TOKYO INSTITUTE OF TECHNOLOGYInventors: Tasuku Matsumiya, Takehiro Seshimo, Katsumi Ohmori, Ken Miyagi, Daiju Shiono, Kenichiro Miyashita, Tsuyoshi Kurosawa, Teruaki Hayakawa
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Patent number: 9029073Abstract: A undercoat agent used for performing phase separation of a layer formed on a substrate and containing a block copolymer having a plurality of blocks bonded, wherein the undercoat agent contains a resin component, the resin component is formed from a structural unit having an aromatic ring and a structural unit not having an aromatic ring, and the resin component has a group that can interact with the substrate, and also has a 3 to 7-membered, ether-containing cyclic group.Type: GrantFiled: March 5, 2013Date of Patent: May 12, 2015Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Takahiro Senzaki, Ken Miyagi, Kenichiro Miyashita
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Patent number: 9017919Abstract: A resist composition containing a base component (A) which exhibits changed solubility in a developing solution under the action of acid, and an acid generator component (B) which generates acid upon exposure, wherein the acid generator component (B) includes an acid generator (B1) having a group represented by general formula (b1-1) shown below in the cation moiety.Type: GrantFiled: October 27, 2011Date of Patent: April 28, 2015Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Yoshiyuki Utsumi, Akiya Kawaue, Yoshitaka Komuro, Kenichiro Miyashita
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Publication number: 20150093507Abstract: A method of producing a structure containing a phase-separated structure, the method including: a step of forming a layer of a neutralization film; a step of form a layer containing a mixture of a plurality of block copolymers having different periods; and a step of phase-separating the layer containing the plurality of block copolymers.Type: ApplicationFiled: September 23, 2014Publication date: April 2, 2015Inventors: Tsuyoshi Kurosawa, Daiju Shiono, Ken Miyagi, Tasuku Matsumiya, Kenichiro Miyashita, Katsumi Ohmori
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Publication number: 20150044371Abstract: A method of producing a structure containing a phase-separated structure, including applying a neutralization film to a substrate to form a layer of a neutralization film; applying a block copolymer having a plurality of polymers bonded thereto, and a weight average molecular weight of 150,000 or more to the layer of the neutralization film, so as to form a layer containing the block copolymer and having a coating film thickness of 23 nm or less; and phase-separating the layer containing the block copolymer.Type: ApplicationFiled: August 6, 2014Publication date: February 12, 2015Inventors: Tsuyoshi Kurosawa, Daiju Shiono, Ken Miyagi, Tasuku Matsumiya, Kenichiro Miyashita, Katsumi Ohmori
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Patent number: 8846291Abstract: A resist composition including: a base component (A) which exhibits changed solubility in a developing solution under action of acid; a nitrogen-containing organic compound component (C) containing a compound (C1) represented by general formula (c1) shown below; and an acid generator component (B) which generates acid upon exposure, provided that the compound (C1) is excluded from the acid generator component (B): wherein RN represents a nitrogen-containing heterocyclic group which may have a substituent; X0 represents a linear or branched divalent aliphatic hydrocarbon group of 1 to 10 carbon atoms, a cyclic divalent aliphatic hydrocarbon group of 3 to 20 carbon atoms or a divalent aliphatic hydrocarbon group of 3 to 20 carbon having a cyclic partial structure, or any one of these groups in which some or all of the hydrogen atoms thereof have been substituted with fluorine atoms; and M+ represents an organic cation.Type: GrantFiled: December 6, 2011Date of Patent: September 30, 2014Assignee: Tokyo Ohka Kogyo Co. Ltd.Inventors: Yoshiyuki Utsumi, Kenichiro Miyashita, Akiya Kawaue
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Publication number: 20140238954Abstract: A method of producing a structure containing a phase-separated structure, including forming, on a substrate, a layer containing a block copolymer having a block of a polyhedral oligomeric silsesquioxane structure-containing structural unit; forming a top coat film by applying, to the layer containing the block copolymer, a top coat material which undergoes a change in polarity upon heating, and controls a surface energy of the layer containing the block copolymer; and subjecting the layer containing the block copolymer on which the top coat film is formed to phase separation by thermal annealing.Type: ApplicationFiled: February 20, 2014Publication date: August 28, 2014Applicants: Tokyo Institute of Technology, Tokyo Ohka Kogyo Co., Ltd.Inventors: Tasuku Matsumiya, Takehiro Seshimo, Katsumi Ohmori, Ken Miyagi, Daiju Shiono, Kenichiro Miyashita, Tsuyoshi Kurosawa, Teruaki Hayakawa
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Publication number: 20130252179Abstract: A undercoat agent used for performing phase separation of a layer formed on a substrate and containing a block copolymer having a plurality of blocks bonded, wherein the undercoat agent contains a resin component, the resin component is formed from a structural unit having an aromatic ring and a structural unit not having an aromatic ring, and the resin component has a group that can interact with the substrate, and also has a 3 to 7-membered, ether-containing cyclic group.Type: ApplicationFiled: March 5, 2013Publication date: September 26, 2013Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Takahiro Senzaki, Ken Miyagi, Kenichiro Miyashita
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Publication number: 20130240481Abstract: The present invention relates to a composition including: a component (A) being a block copolymer including a block PA bonded to one, or two or more blocks incompatible with the block PA and whose etching selectivity to the block PA is greater than one; and a component (B) being at least one polymer selected from the group consisting of a random copolymer and a homopolymer, wherein the polymer of the component (B) is compatible with at least one block other than the block PA within the blocks constituting the block copolymer of the component (A), and is incompatible with the block PA.Type: ApplicationFiled: March 7, 2013Publication date: September 19, 2013Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Takahiro Senzaki, Ken Miyagi, Kenichiro Miyashita
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Publication number: 20130243958Abstract: An undercoat agent which is used for phase separating a layer including a block copolymer having a plurality of blocks bonded formed on a substrate, wherein the undercoat agent contains a resin component, the resin component includes a structural unit having an aromatic ring and a structural unit having no aromatic ring, and the resin component includes a group which can interact with the substrate and does not include a 3 to 7-membered, ether-containing cyclic group; and a method of forming a pattern of a layer containing a block copolymer, including: a step (1) in which the undercoat agent is applied to a substrate to form a layer containing the undercoat agent; a step (2) in which a layer containing a block copolymer having a plurality of blocks bonded is formed on a surface of the layer containing the undercoat agent, followed by a phase separation of the layer containing the block copolymer; and a step (3) in which a phase containing at least one block of the plurality of blocks constituting the block coType: ApplicationFiled: March 8, 2013Publication date: September 19, 2013Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Takahiro Senzaki, Ken Miyagi, Tsuyoshi Kurosawa, Daiju Shiono, Tasuku Matsumiya, Kenichiro Miyashita, Katsumi Ohmori
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Publication number: 20120148955Abstract: A resist composition including: a base component (A) which exhibits changed solubility in a developing solution under action of acid; a nitrogen-containing organic compound component (C) containing a compound (C1) represented by general formula (c1) shown below; and an acid generator component (B) which generates acid upon exposure, provided that the compound (C1) is excluded from the acid generator component (B): wherein RN represents a nitrogen-containing heterocyclic group which may have a substituent; X0 represents a linear or branched divalent aliphatic hydrocarbon group of 1 to 10 carbon atoms, a cyclic divalent aliphatic hydrocarbon group of 3 to 20 carbon atoms or a divalent aliphatic hydrocarbon group of 3 to 20 carbon having a cyclic partial structure, or any one of these groups in which some or all of the hydrogen atoms thereof have been substituted with fluorine atoms; and M+ represents an organic cation.Type: ApplicationFiled: December 6, 2011Publication date: June 14, 2012Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Yoshiyuki Utsumi, Kenichiro Miyashita, Akiya Kawaue
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Publication number: 20120107744Abstract: A resist composition containing a base component (A) which exhibits changed solubility in a developing solution under the action of acid, and an acid generator component (B) which generates acid upon exposure, wherein the acid generator component (B) includes an acid generator (B1) having a group represented by general formula (b1-1) shown below in the cation moiety.Type: ApplicationFiled: October 27, 2011Publication date: May 3, 2012Applicant: Tokyo Ohka Kogyo Co., Ltd.Inventors: Yoshiyuki Utsumi, Akiya Kawaue, Yoshitaka Komuro, Kenichiro Miyashita