Patents by Inventor Kenji Akai

Kenji Akai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8734575
    Abstract: The airflow controlling device includes a bacteria counting portion counting bacteria of a controlled space; a first smoothing processing portion performing a first smoothing process on the bacteria count; a second smoothing processing portion performing a second smoothing process on the bacteria count; a bacteria reducing capability storing portion storing a bacteria reducing capability relative to each flow rate; a first flow rate evaluating portion selecting a flow rate matching a bacteria reducing capability compatible with an increase in a bacteria count forecasted from the processing result of the first smoothing processing portion; a second flow rate evaluating portion selecting a flow rate matching a bacteria reducing capability compatible with an increase in a bacteria count forecasted from the processing result of the second smoothing processing portion; and a flow rate determining portion selecting a flow rate into the controlled space based on the flow rates selected by the first and second flow r
    Type: Grant
    Filed: July 6, 2011
    Date of Patent: May 27, 2014
    Assignee: Azbil Corporation
    Inventors: Masato Tanaka, Mayumi Miura, Kenji Akai, Shuji Sawada, Yasuko Horiguchi
  • Publication number: 20120020831
    Abstract: The airflow controlling device includes a bacteria counting portion counting bacteria of a controlled space; a first smoothing processing portion performing a first smoothing process on the bacteria count; a second smoothing processing portion performing a second smoothing process on the bacteria count; a bacteria reducing capability storing portion storing a bacteria reducing capability relative to each flow rate; a first flow rate evaluating portion selecting a flow rate matching a bacteria reducing capability compatible with an increase in a bacteria count forecasted from the processing result of the first smoothing processing portion; a second flow rate evaluating portion selecting a flow rate matching a bacteria reducing capability compatible with an increase in a bacteria count forecasted from the processing result of the second smoothing processing portion; and a flow rate determining portion selecting a flow rate into the controlled space based on the flow rates selected by the first and second flow r
    Type: Application
    Filed: July 6, 2011
    Publication date: January 26, 2012
    Applicant: Yamatake Corporation
    Inventors: Masato Tanaka, Mayumi Miura, Kenji Akai, Shuji Sawada, Yasuko Horiguchi
  • Patent number: 6025596
    Abstract: In a measurement method for measuring the epitaxial film thickness of a multilayer epitaxial wafer, a reflectivity spectrum of a multilayer epitaxial wafer having at least two epitaxial layers of different electric characteristics is measured by using infrared radiation in a far infrared region of at least 500 cm.sup.-1 or less, and frequency-analysis is performed on the reflection spectrum thus obtained by a maximum entropy method, and the film thickness of each epitaxial layer is calculated on the basis of the analysis spectrum thus obtained.
    Type: Grant
    Filed: February 5, 1998
    Date of Patent: February 15, 2000
    Assignee: Toshiba Ceramics Co., Ltd.
    Inventors: Hiroshi Shirai, Kenji Akai, Toshio Abe, Chikara Tojima, Katsuyuki Iwata