Abstract: In a vehicle front part structure of a vehicle body, a gusset member is disposed in front of a front pillar. The gusset member is positioned so as to overlap with at least a front tire in the vertical direction of the vehicle body. The gusset member covers at least a portion of a lower portion of the front pillar on a front side in the longitudinal direction of the vehicle body. The gusset member has a stepped portion on a front side thereof in the longitudinal direction of the vehicle body. The stepped portion extends in the vertical direction of the vehicle body and makes a portion of the gusset member disposed inside in the vehicle width direction positioned relatively in front of a portion of the gusset member disposed outside in the vehicle width direction in the longitudinal direction of the vehicle body.

Abstract: In a joining structure of a lid box according to an embodiment of the invention, a joining area where a joining surface of a joining portion of a side outer panel faces a joining surface of a joining portion of the lid box includes a first area where the joining surfaces come into contact with each other and are supposed to be subjected to spot-welding and a second area where the joining surfaces are separated from each other by a predetermined gap and are supposed to be subjected to laser-welding, and the spot-welding is performed on the first area or the laser-welding is performed on the second area. For that reason, since the joining states respectively suitable for the spot-welding and the laser-welding are realized, sufficient welding quality is ensured in both the spot-welding and the laser-welding.

Abstract: A vehicle exterior member attaching structure for attaching a vehicle exterior member onto a protruding target location of a vehicle includes a vehicle engagement portion, an attachment hole, a covering portion, an engagement portion, and an attachment piece. When inserted into the attachment hole, the attachment piece positions the covering portion at a temporary position with respect to the target section. When the covering portion is pulled toward the vehicle engagement portion and the attachment piece is pressed against the rim of the attachment hole, the attachment piece is rotated in a direction opposite to the direction in which the covering portion is pulled. In a state in which the covering portion is positioned at a desired position, the attachment piece returns to an original position to maintain engagement between the vehicle engagement portion and the engagement portion.

Abstract: A reinforcing structure of a vehicle door enables a part to be housed in the vehicle door and prevents a luggage compartment space from being decreased and an inner panel from being damaged by the weight of the part. A back door 10 includes an inner panel 16 and an outer panel 18, and the inner panel 16 and the outer panel 18 are joined to each other to form an internal space 20 therebetween. The inner panel 16 has a part housing recess 24 that is formed from the outer surface side (from a luggage compartment 23) toward the internal space 20. A reinforcing member configured to join the part housing recess 24 to the outer panel 18 is provided.

Abstract: A support structure for a fuel lid attached by a hinge to a vehicle body is provided with an annular rubber seal, which is provided on the vehicle body to surround an oil filler port in the vehicle body. The rubber seal has a top surface and an inner circumferential surface. The support structure includes a contact plate provided on a back surface of the fuel lid. The contact plate contacts the rubber seal when the fuel lid is in the closed state. The contact plate has an upper surface contact portion for contacting the upper surface of the rubber seal, and an inner-surface contact portion for contacting the inner circumferential surface of the rubber seal.

Abstract: In a joining structure of a lid box according to an embodiment of the invention, a joining area where a joining surface of a joining portion of a side outer panel faces a joining surface of a joining portion of the lid box includes a first area where the joining surfaces come into contact with each other and are supposed to be subjected to spot-welding and a second area where the joining surfaces are separated from each other by a predetermined gap and are supposed to be subjected to laser-welding, and the spot-welding is performed on the first area or the laser-welding is performed on the second area. For that reason, since the joining states respectively suitable for the spot-welding and the laser-welding are realized, sufficient welding quality is ensured in both the spot-welding and the laser-welding.

Abstract: A recess is formed at the center of a bumper absorber, provided on the vehicle outer side of a bumper reinforcement, so as to face forward, and an upper recess wall face of an upper absorber portion located on the upper side of the recess is inclined downward. If the subject vehicle is small in height and the amount of vertical overlap between the bumper absorber and the rear bumper of other vehicle (a barrier used in the narrow vertical overlap barrier test of the IIHS) is small, in the initial collision stage, the rear bumper of the other vehicle is guided by the inclined upper recess wall face to move relatively downward while the bumper of the subject vehicle moves relatively upward, preventing underride, increasing the amount of vertical overlap between the rear bumper of the other vehicle and the bumper absorber, and thus achieving reliable impact absorption.

Abstract: A recess is formed at the center of a bumper absorber, provided on the vehicle outer side of a bumper reinforcement, so as to face forward, and an upper recess wall face of an upper absorber portion located on the upper side of the recess is inclined downward. If the subject vehicle is small in height and the amount of vertical overlap between the bumper absorber and the rear bumper of other vehicle (a barrier used in the narrow vertical overlap barrier test of the IIHS) is small, in the initial collision stage, the rear bumper of the other vehicle is guided by the inclined upper recess wall face to move relatively downward while the bumper of the subject vehicle moves relatively upward, preventing underride, increasing the amount of vertical overlap between the rear bumper of the other vehicle and the bumper absorber, and thus achieving reliable impact absorption.

Abstract: A rear door assembly for a motor vehicle includes an outer door panel and an inner panel. The inner panel is fixedly secured to the inner surface of the outer door panel. The inner panel has a main frame having a generally transversely extending opening and a frame member fixedly secured to the main frame. The frame member extends between opposite sides of the opening in the main frame and extends along a bottom edge of the window opening. The frame member has a transversely extending upper flange and a lower flange spaced apart from the upper flange. The frame member has a main wall extending between the upper and lower flanges and forming a generally U-shaped cross section therewith. The flanges are directly fixedly secured to the inner surface of the outer panel and forming a transversely extending support beam therewith.

Abstract: According to an aspect of the invention, there is provided a pattern forming method including forming a lower layer organic film on a substrate, forming an upper layer resist film containing an inorganic element on the lower layer organic film, exposing a pattern on the upper layer resist film and performing development processing to form an opening in the upper layer resist film, supplying a coating forming agent to the upper layer resist film having the opening formed therein to embed and form a coating film in the opening of the upper layer resist film, thermally contracting the coating film to narrow the opening of the upper layer resist film, removing the coating film by dry etching processing and subsequently selectively removing the lower layer organic film with the upper layer resist film being used as a mask, thereby collectively processing the coating film and the lower layer organic film.

Abstract: A pattern forming method comprises forming a first resist pattern on a substrate, irradiating light on the first resist pattern, forming a resist film including a cross-linking material on the substrate and the first resist pattern, forming a second resist pattern including a cross-linking layer formed at an interface between the first resist pattern and the resist film by causing a cross-linking reaction at the interface, and irradiating light on the first resist pattern including setting an amount of the light irradiated on the first resist pattern such that a dimension of the second resist pattern is to be a predetermined dimension based on a previously prepared relationship between a difference between a dimension relating to the first resist pattern and a dimension relating to the second resist pattern and the amount of the light irradiated on the first resist pattern.

Abstract: A rear door assembly for a motor vehicle includes an outer door panel and an inner panel. The inner panel is fixedly secured to the inner surface of the outer door panel. The inner panel has a main frame having a generally transversely extending opening and a frame member fixedly secured to the main frame. The frame member extends between opposite sides of the opening in the main frame and extends along a bottom edge of the window opening. The frame member has a transversely extending upper flange and a lower flange spaced apart from the upper flange. The frame member has a main wall extending between the upper and lower flanges and forming a generally U-shaped cross section therewith. The flanges are directly fixedly secured to the inner surface of the outer panel and forming a transversely extending support beam therewith.

Abstract: A method for evaluating a local flare in an exposure tool, includes: measuring a projection light intensity distribution by transferring a monitor mask pattern onto a semiconductor substrate; calculating a first ratio between an illumination light intensity on the monitor mask pattern and a first projection light intensity calculated based on the monitor mask pattern; calculating a distribution function of a local flare, due to a mask pattern coverage of the monitor mask pattern, based on the first ratio and the projection light intensity distribution; dividing a design mask pattern into a plurality of unit areas; calculating a second ratio between the illumination light intensity on each of the unit areas and a second projection light intensity calculated based on the design mask pattern; and calculating a local flare intensity in each of the unit areas, based on the second ratio and the distribution function.

Abstract: According to an aspect of the invention, there is provided a pattern forming method including forming a lower layer organic film on a substrate, forming an upper layer resist film containing an inorganic element on the lower layer organic film, exposing a pattern on the upper layer resist film and performing development processing to form an opening in the upper layer resist film, supplying a coating forming agent to the upper layer resist film having the opening formed therein to embed and form a coating film in the opening of the upper layer resist film, thermally contracting the coating film to narrow the opening of the upper layer resist film, removing the coating film by dry etching processing and subsequently selectively removing the lower layer organic film with the upper layer resist film being used as a mask, thereby collectively processing the coating film and the lower layer organic film.

Abstract: Compounds represented by the following general formula (I) wherein ring A is benzene, cyclohexane, pyridine, piperidine, a derivative thereof, imidazole, a derivative thereof, etc.; the ring B represents benzene, cyclohexane, pyrrole or a derivative thereof, furan, thiophene, etc.; R1, R2 and R3 represent each hydrogen, alkyl, halogen, hydroxyl, alkoxy, etc.; W represents hydrogen, alkyl or hydroxycarbonylalkyl; X represents halogen, cyano, nitro, etc.; X? represents hydrogen, halogen, etc.; and Y represents alkyl, hydroxyalkyl, hydroxycarbonylalkyl, aminoalkyl, etc.; salt thereof, and drugs comprising these compounds. Because of having an exellent effect of inhibiting activated lymphocyte proliferation, these compounds are usefull as preventives or remedies for various autoimmune diseases.

Abstract: The present invention relates to a compound of the formula wherein R1 is substituted aryl, heteroaryl and the like, R2 and R3 are hydrogen, alkyl, halogen, hydroxyl group and the like, Q is N, CH and the like, W is hydrogen, alkyl, hydroxycarbonylalkyl and the like, X is halogen, cyano, nitro, amino and the like, X? is hydrogen, halogen, cyano, nitro, and Y is alkyl, hydroxyl group, alkoxy, mercapto and the like and a salt thereof, and a medicine containing the said compound. The compound of the present invention shows a superior inhibitory effect on activated lymphocytes proliferation and is useful as an agent for the prophylaxis or treatment of various autoimmune diseases.

Abstract: The present application provides a method for manufacturing a semiconductor device, the method including forming a resist film on a substrate, forming a protective film on the resist film, exposing the resist film with a first liquid interposed between the protective film and a lens for exposure, removing the protective film using an oxidative second liquid after exposing the resist film, and developing the resist film to form a resist pattern after removing the protective film.

Abstract: A method for evaluating a local flare in an exposure tool, includes: measuring a projection light intensity distribution by transferring a monitor mask pattern onto a semiconductor substrate; calculating a first ratio between an illumination light intensity on the monitor mask pattern and a first projection light intensity calculated based on the monitor mask pattern; calculating a distribution function of a local flare, due to a mask pattern coverage of the monitor mask pattern, based on the first ratio and the projection light intensity distribution; dividing a design mask pattern into a plurality of unit areas; calculating a second ratio between the illumination light intensity on each of the unit areas and a second projection light intensity calculated based on the design mask pattern; and calculating a local flare intensity in each of the unit areas, based on the second ratio and the distribution function.

Abstract: A pattern forming method comprises forming a first resist pattern on a substrate, irradiating light on the first resist pattern, forming a resist film including a cross-linking material on the substrate and the first resist pattern, forming a second resist pattern including a cross-linking layer formed at an interface between the first resist pattern and the resist film by causing a cross-linking reaction at the interface, and irradiating light on the first resist pattern including setting an amount of the light irradiated on the first resist pattern such that a dimension of the second resist pattern is to be a predetermined dimension based on a previously prepared relationship between a difference between a dimension relating to the first resist pattern and a dimension relating to the second resist pattern and the amount of the light irradiated on the first resist pattern.

Abstract: The methods and compositions of the invention and the compounds used in the invention involve a novel immunosuppression mechanism, accelerated lymphocyte homing immunosuppression (ALH-immunosuppression). For example, the compound FTY720 specifically directs lymphocytes to the peripheral lymph nodes, mesenteric lymph nodes, and Peyer's patches. By reversibly sequestering lymphocytes in these tissues, the compounds can inhibit an immune response in a mammal. Understanding these mechanisms provides a novel immunosuppression therapy that can synergistically interact with other immunosuppressive compounds. Screening methods for identifying similar ALH-immunosuppression compounds are also described. The invention allows better treatments and therapies wherever an immunosuppression regimen is desired.