Patents by Inventor Kenji Edamitsu

Kenji Edamitsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230390809
    Abstract: A substrate treating apparatus includes a process tank for storing a treatment liquid, a chamber for surrounding the process tank, a solvent vapor nozzle for supplying solvent vapor into the chamber, a cleaning liquid nozzle for supplying a cleaning liquid, and a controller. The controller causes immersion treatment, where a substrate is immersed in the treatment liquid stored in the process tank, to be performed for a preset period of time, and causes dry treatment, where the substrate processed with the treatment liquid and taken out of the process tank is dried with the solvent vapor supplied from the solvent vapor nozzle, to be performed. The controller causes the cleaning liquid nozzle to supply the cleaning liquid into the chamber and causes the process tank to be immersed in the cleaning liquid stored in the chamber, whereby the chamber cleaning treatment, where the chamber including an outer wall of the process tank is cleaned, is performed.
    Type: Application
    Filed: June 2, 2023
    Publication date: December 7, 2023
    Inventors: Shigeru YAMAMOTO, Takashi AKIYAMA, Daiki FUJII, Kenji EDAMITSU
  • Publication number: 20230290631
    Abstract: A substrate processing method is provided. The substrate processing method includes: (S7) supplying a water repellent agent (SMT) to a substrate (W); (S11) supplying dilute isopropyl alcohol (dIPA) to the substrate (W) after the supplying a water repellent agent (SMT), the dilute isopropyl alcohol (dIPA) being obtained by diluting isopropyl alcohol; and (S12) drying the substrate (W) after the supplying dilute isopropyl alcohol (dIPA).
    Type: Application
    Filed: June 22, 2021
    Publication date: September 14, 2023
    Inventors: Tetsuya EMOTO, Shigeru YAMAMOTO, Daiki FUJII, Kenji EDAMITSU, Keiji IWATA, Yuya KAWAI, Kenichi ITO
  • Publication number: 20230035447
    Abstract: A substrate treatment method includes a first gas treating step, a water-repellency treatment step, and a spraying step. In the first gas treating step, a first gas is supplied to the substrate inside the chamber in a state in which the inside of the chamber is decompressed. The first gas includes gas of an organic solvent. The water-repellency treatment step is executed after the first gas treating step. In the water-repellency treatment step, the inside of the chamber is in the decompressed state, and a water-repellent agent is supplied to the substrate inside the chamber. The spraying step is executed after the water-repellency treatment step. In the spraying step, the inside of the chamber is in the decompressed state, and a first liquid is sprayed over the substrate inside the chamber. The first liquid includes liquid of an organic solvent.
    Type: Application
    Filed: July 29, 2022
    Publication date: February 2, 2023
    Applicant: SCREEN Holdings Co., Ltd.
    Inventors: Shigeru YAMAMOTO, Kenji EDAMITSU, Daiki FUJII, Keiji IWATA, Kenichi ITO, Yuya KAWAI
  • Publication number: 20230035562
    Abstract: The substrate treatment method includes a first decompressing step, a first pressurizing step, and a first atmospheric pressure step. In the first decompressing step, the inside of a chamber is in a decompressed state, and a first gas is supplied to a substrate inside the chamber. The first gas includes an organic solvent. The first pressurizing step is executed after the first decompressing step. In the first pressurizing step, mixed gas is supplied to the substrate inside the chamber, and the inside of the chamber is pressurized from the decompressed state to an atmospheric pressure state. The mixed gas includes an organic solvent and inert gas. The first atmospheric pressure step is executed after the first pressurizing step. In the first atmospheric pressure step, the inside of the chamber is maintained in the atmospheric pressure state, and at least any of liquid discharge treatment and substrate treatment is performed.
    Type: Application
    Filed: July 29, 2022
    Publication date: February 2, 2023
    Applicant: SCREEN Holdings Co., Ltd.
    Inventors: Shigeru YAMAMOTO, Keiji IWATA, Daiki FUJII, Kenji EDAMITSU, Yuya KAWAI, Kenichi ITO
  • Publication number: 20220208545
    Abstract: A substrate treatment method includes a rinsing step of performing treatment of a substrate with a rinse liquid, an immersing step of immersing the substrate in a diluted isopropyl alcohol (dIPA) stored in a treatment tank after the rinsing step, a first isopropyl alcohol treatment step of performing treatment of the substrate with an isopropyl alcohol after the immersing step, and a water-repellent treatment step of performing water-repellent treatment of the substrate after the first isopropyl alcohol treatment step.
    Type: Application
    Filed: December 22, 2021
    Publication date: June 30, 2022
    Applicant: SCREEN Holdings Co., Ltd.
    Inventors: Shigeru YAMAMOTO, Daiki FUJII, Keiji IWATA, Kenji EDAMITSU, Yuya KAWAI, Kenichi ITO
  • Patent number: 10559480
    Abstract: A substrate treatment apparatus according to the present invention is provided with a first tank that stores treatment liquid for treating a substrate and a first path that returns the treatment liquid, which has spilled over from an upper part of the first tank, to a lower part of the first tank. A second path that branches from the first path, a measurement tank that stores the treatment liquid, which has flowed in from the second path, and a pressure measurement part that measures the pressure of the treatment liquid at a predetermined depth in the measurement tank in a state in which the treatment liquid spills over from an upper part of the measurement tank are provided. Therefore, techniques for highly precisely measuring the pressure of the treatment liquid used in treatment of substrates can be provided.
    Type: Grant
    Filed: February 7, 2018
    Date of Patent: February 11, 2020
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Koji Kurasaki, Kenji Edamitsu, Masaharu Sato, Kei Takechi, Takeshi Matsumura
  • Publication number: 20180277454
    Abstract: A substrate treatment method according to the present invention is a substrate treatment method of treating at least one substrate in a treatment tank with treatment liquid. The substrate treatment method includes the following processes of: acquiring in advance treatment information of the substrate to be treated in the treatment tank; specifying a predicted concentration change pattern corresponding to the acquired treatment information of the substrate by referencing correspondence information describing a plurality of situations possible for the treatment information and a plurality of concentration change patterns of the treatment liquid prepared in advance to respectively correspond to the plurality of situations of the treatment information; and carrying out concentration control of the treatment liquid based on the predicted concentration change pattern while the substrate is treated in the treatment tank.
    Type: Application
    Filed: February 7, 2018
    Publication date: September 27, 2018
    Inventors: Koji KURASAKI, Kenji EDAMITSU, Masaharu SATO, Kei TAKECHI, Takeshi MATSUMURA, Hiroaki UCHIDA, Shigeru YAMAMOTO, Tomohiro TAKAHASHI, Hironobu IWATANI, Shinji SUGIOKA
  • Publication number: 20180247839
    Abstract: A substrate treatment apparatus according to the present invention is provided with a first tank that stores treatment liquid for treating a substrate and a first path that returns the treatment liquid, which has spilled over from an upper part of the first tank, to a lower part of the first tank. A second path that branches from the first path, a measurement tank that stores the treatment liquid, which has flowed in from the second path, and a pressure measurement part that measures the pressure of the treatment liquid at a predetermined depth in the measurement tank in a state in which the treatment liquid spills over from an upper part of the measurement tank are provided. Therefore, techniques for highly precisely measuring the pressure of the treatment liquid used in treatment of substrates can be provided.
    Type: Application
    Filed: February 7, 2018
    Publication date: August 30, 2018
    Inventors: Koji KURASAKI, Kenji EDAMITSU, Masaharu SATO, Kei TAKECHI, Takeshi MATSUMURA
  • Patent number: 7363858
    Abstract: A printing apparatus includes a printing plate feeder for feeding printing plates to a first plate cylinder. The printing plate feeder has a pair of transport rollers acting as a leveling roller and a driven roller. The leveling roller is fixed to a leveling roller rotary shaft extending parallel to a rotational axis of the first plate cylinder, and is opposed to middle and opposite end regions of the first plate cylinder. The leveling roller rotary shaft is connected to a driving device, a one-way clutch for permitting rotation only in a transport direction of the printing plates, and a torque transmission clutch acting as a loading device for applying a load to rotation in a direction opposite to the transport direction of the printing plates.
    Type: Grant
    Filed: March 15, 2005
    Date of Patent: April 29, 2008
    Assignee: Dainippon Screen Mfg. Co., Ltd.
    Inventors: Kenji Edamitsu, Masahiko Takeuchi
  • Patent number: 7021212
    Abstract: A printing apparatus includes a first plate cylinder with a squeeze roller disposed therearound. The squeeze roller is connected to a squeeze roller moving mechanism that moves the squeeze roller between a squeeze position adjacent the peripheral surface of the first plate cylinder, and a standby position spaced away from the peripheral surface of the first plate cylinder. When in the standby position, the squeeze roller is shielded from the first plate cylinders by a shield connected to a shield moving mechanism.
    Type: Grant
    Filed: March 15, 2005
    Date of Patent: April 4, 2006
    Assignee: Dainippon Screen Mfg. Co., Ltd.
    Inventor: Kenji Edamitsu
  • Patent number: 7017491
    Abstract: A plate discharger includes a peeling claw, a transport device and an air blowing device. The transport device has a rotary shaft, first transport rollers rotatable about the rotary shaft, a driven rotary shaft connected to a drive gear meshed with and driven by a transmission gear disposed sideways from the first transport rollers, second transport rollers rotatable about the driven rotary shaft, peeling rollers pivotable about the rotary shaft, and belts wound around the first transport rollers and peeling rollers. When a printing plate is passed between the first transport rollers and second transport rollers, the air blowing device blows air to the undersurface of the printing plate.
    Type: Grant
    Filed: March 25, 2005
    Date of Patent: March 28, 2006
    Assignee: Dainippon Screen Mfg. Co., Ltd.
    Inventor: Kenji Edamitsu
  • Publication number: 20050235855
    Abstract: A plate discharger includes a peeling claw, a transport device and an air blowing device. The transport device has a rotary shaft, first transport rollers rotatable about the rotary shaft, a driven rotary shaft connected to a drive gear meshed with and driven by a transmission gear disposed sideways from the first transport rollers, second transport rollers rotatable about the driven rotary shaft, peeling rollers pivotable about the rotary shaft, and belts wound around the first transport rollers and peeling rollers. When a printing plate is passed between the first transport rollers and second transport rollers, the air blowing device blows air to the undersurface of the printing plate.
    Type: Application
    Filed: March 25, 2005
    Publication date: October 27, 2005
    Inventor: Kenji Edamitsu
  • Publication number: 20050229803
    Abstract: A printing apparatus includes a first plate cylinder with a squeeze roller disposed therearound. The squeeze roller is connected to a squeeze roller moving mechanism that moves the squeeze roller between a squeeze position adjacent the peripheral surface of the first plate cylinder, and a standby position spaced away from the peripheral surface of the first plate cylinder. When in the standby position, the squeeze roller is shielded from the first plate cylinders by a shield connected to a shield moving mechanism.
    Type: Application
    Filed: March 15, 2005
    Publication date: October 20, 2005
    Inventor: Kenji Edamitsu
  • Publication number: 20050229802
    Abstract: A printing apparatus includes a printing plate feeder for feeding printing plates to a first plate cylinder. The printing plate feeder has a pair of transport rollers acting as a leveling roller and a driven roller. The leveling roller is fixed to a leveling roller rotary shaft extending parallel to a rotational axis of the first plate cylinder, and is opposed to middle and opposite end regions of the first plate cylinder. The leveling roller rotary shaft is connected to a driving device, a one-way clutch for permitting rotation only in a transport direction of the printing plates, and a torque transmission clutch acting as a loading device for applying a load to rotation in a direction opposite to the transport direction of the printing plates.
    Type: Application
    Filed: March 15, 2005
    Publication date: October 20, 2005
    Inventors: Kenji Edamitsu, Masahiko Takeuchi
  • Patent number: 6729239
    Abstract: A printing device reads an image on a printing paper with an image pickup part. It image-processes obtained image data in a control part, and operates the positions of respective register marks (R1 to R4). It operates the quantity of displacement necessary for positioning an image. It obtains an offset count number Co for deciding an image recording starting position from the obtained quantity of displacement. It stores the obtained offset count number Co while obtaining starting position data. Then, dimensional correction data for the image is calculated. The image on the printing paper is first picked up, and the necessary quantity of displacement is calculated. A speed coefficient k is calculated for changing the rotational speed of a plate cylinder. Following this, a correction quantity by a Cd default count number previously set for deciding the image recording starting position is changed. Accordingly, the offset count number Co is calculated again on the basis of the obtained speed variable k.
    Type: Grant
    Filed: April 3, 2002
    Date of Patent: May 4, 2004
    Assignee: Dainippon Screen MFG Co., Ltd.
    Inventors: Kenji Edamitsu, Shoji Kakimoto, Yoshihiro Katsuma
  • Publication number: 20020148376
    Abstract: A printing device reads an image on a printing paper with an image pickup part. It image-processes obtained image data in a control part, and operates the positions of respective register marks (R1 to R4). It operates the quantity of displacement necessary for positioning an image. It obtains an offset count number Co for deciding an image recording starting position from the obtained quantity of displacement. It stores the obtained offset count number Co while obtaining starting position data. Then, dimensional correction data for the image is calculated. The image on the printing paper is first picked up, and the necessary quantity of displacement is calculated. A speed coefficient k is calculated for changing the rotational speed of a plate cylinder. Following this, a correction quantity by a Cd default count number previously set for deciding the image recording starting position is changed. Accordingly, the offset count number Co is calculated again on the basis of the obtained speed variable k.
    Type: Application
    Filed: April 3, 2002
    Publication date: October 17, 2002
    Applicant: DAINIPPON SCREEN MFG CO., LTC
    Inventors: Kenji Edamitsu, Shoji Kakimoto, Yoshihiro Katsuma