Patents by Inventor Kenji Kato

Kenji Kato has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8048613
    Abstract: An alkali development-type solder resist includes (A) a carboxyl group-containing photosensitive resin obtained by reacting (a) a compound having two or more cyclic ether or thioether groups in the molecule with (b) an unsaturated monocarboxylic acid, reacting the product with (c) a polybasic acid anhydride, reacting the resulting resin with (d) a compound having a cyclic ether group and an ethylenic unsaturated group in the molecule, and reacting the product additionally with (c) a polybasic acid anhydride, (B) an oxime ester-based photopolymerization initiator containing a specific oxime ester group, (C) a compound having two or more ethylenic unsaturated groups in the molecule, and (D) a thermosetting component, wherein the dry film obtained by applying the composition has an absorbance of 0.3 to 1.2 per 25 ?m of the film thickness at a wavelength of 350 to 375 nm.
    Type: Grant
    Filed: October 13, 2008
    Date of Patent: November 1, 2011
    Assignee: Taiyo Ink Mfg. Co., Ltd.
    Inventors: Nobuhito Itoh, Yoko Shibasaki, Kenji Kato, Masao Arima
  • Patent number: 8047605
    Abstract: One aspect of the present invention can include a vehicle seat, a seat frame having a cushion frame, the cushion frame with a first and second side frame, a bead extending from an outer side of one of the first and second side frame, the bead including a first and second inclined surface connected at a ridge portion, and a notch portion defined in a lower portion of the at least one of the first and second side frame, wherein the notch portion is positioned proximate the bead.
    Type: Grant
    Filed: January 14, 2009
    Date of Patent: November 1, 2011
    Assignee: Toyota Boshoku Kabushiki Kaisha
    Inventors: Akira Yamazaki, Kenji Kato
  • Patent number: 8029333
    Abstract: A device for polishing the peripheral edge part of a semiconductor wafer includes a wafer stage for holding the wafer, a wafer stage unit including devices for rotating the wafer stage, causing the wafer stage to undergo a rotary reciprocating motion within the same plane as the surface of the wafer stage, and moving the wafer stage parallel to the surface, a notch polishing part for polishing the notch on the wafer and a bevel polishing part for polishing the beveled part of the wafer. Pure water is supplied to the wafer to prevent it from becoming dry as it is transported from the notch polishing part to the bevel polishing part.
    Type: Grant
    Filed: October 17, 2007
    Date of Patent: October 4, 2011
    Assignees: EBARA Corporation, NIHON Micro Coating Co., Ltd.
    Inventors: Tamami Takahashi, Kenya Ito, Mitsuhiko Shirakashi, Kazuyuki Inoue, Kenji Yamaguchi, Masaya Seki, Satoru Sato, Jun Watanabe, Kenji Kato, Jun Tamura, Souichi Asakawa
  • Patent number: 8025844
    Abstract: A hydrogen sensor includes a thin film layer formed on a top surface of a planar optical transmission medium, and a catalyst layer formed on a top surface of the thin film layer. A first interface is created between the planar optical transmission medium and the thin film layer. A substrate is joined to a bottom surface of the planar optical transmission medium so that a second interface is created between the planar optical transmission medium and the substrate. On entering a first end portion of the planer optical transmission medium, light from a light source is spread by an entrance section, and the spread light is transmitted inside the planar optical transmission medium to a second end portion by being reflected by the first and second interfaces alternately. Light exiting from the second end portion is transmitted to an optical sensor by an exit light-collecting section.
    Type: Grant
    Filed: July 10, 2007
    Date of Patent: September 27, 2011
    Assignees: Kabushiki Kaisha Atsumitec, National Institute of Advanced Industrial Science and Technology
    Inventors: Naoki Uchiyama, Naoki Matsuda, Kazuki Yoshimura, Kenji Kato
  • Patent number: 8024973
    Abstract: A semiconductor acceleration sensor includes an acceleration sensor chip that includes a weight portion, a base portion provided around the weight portion with a gap therebetween, and beam portions flexibly connecting the weight portion and the base portion; and a stopper plate that is provided above the acceleration sensor chip. The stopper plate includes: a plurality of fixing portions that are protrudingly provided at positions opposite to the base portion and are fixed to the base portion; first concave portions that are formed around the fixing portions at positions opposite to the weight portion and define the displacement of the weight portion; and a second concave portion that is formed at a position opposite to the beam portions and is deeper than the first concave portion.
    Type: Grant
    Filed: March 11, 2009
    Date of Patent: September 27, 2011
    Assignee: Oki Semiconductor Co., Ltd.
    Inventors: Akihiko Nomura, Kenji Kato
  • Publication number: 20110203788
    Abstract: A hot water supply apparatus using a heat medium provides a heat medium circulation path that circulates the heat medium, a heat medium pump that pumps the heat medium into the heat medium circulation path, a heat source that generates heat heating the heat medium, a heat medium heat exchanger that exchanges heat generated by the heat source for the heat medium, a hot water supply heat exchanger that exchanges heat of the heat medium circulating in the heat medium circulation path for clean water, and a control unit that sets the heat medium in the heat medium circulation path in a predetermined temperature and controls the rotating speed of the heat medium pump and the combustion amount of the heat source according to a heat requirement.
    Type: Application
    Filed: February 24, 2010
    Publication date: August 25, 2011
    Applicant: TAKAGI INDUSTRIAL CO., LTD.
    Inventor: Kenji Kato
  • Publication number: 20110200519
    Abstract: The present invention provides a fixed bed reactor for carrying out a mixed gas/liquid phase reaction, wherein the reactor has a piping structure composed of microchannels, the cross-sectional area of the fixed bed is 0.0001 cm2 to 0.
    Type: Application
    Filed: October 15, 2009
    Publication date: August 18, 2011
    Inventors: Tomoya Inque, Tomio Kato, Kenji Kato
  • Patent number: 7988835
    Abstract: There are provided a method and an apparatus which form silicon dots having substantially uniform particle diameters and exhibiting a substantially uniform density distribution directly on a substrate at a low temperature. A hydrogen gas (or a hydrogen gas and a silane-containing gas) is supplied into a vacuum chamber (1) provided with a silicon sputter target (e.g., target 30), or the hydrogen gas and the silane-containing gas are supplied into the chamber (1) without arranging the silicon sputter target therein, a high-frequency power is applied to the gas(es) so that plasma is generated such that a ratio (Si(288 nm)/H?) between an emission intensity Si(288 nm) of silicon atoms at a wavelength of 288 nm and an emission intensity H? of hydrogen atoms at a wavelength of 484 nm in plasma emission is 10.0 or lower, and preferably 3.0 or lower, or 0.
    Type: Grant
    Filed: September 12, 2006
    Date of Patent: August 2, 2011
    Assignees: Nissin Electric Co., Ltd., EMD Corporation
    Inventors: Eiji Takahashi, Takashi Mikami, Shigeaki Kishida, Kenji Kato, Atsushi Tomyo, Tsukasa Hayashi, Kiyoshi Ogata, Yuichi Setsuhara
  • Patent number: 7922938
    Abstract: A process for producing a fine silver particle colloidal dispersion the fine silver particles of which have a larger average particle diameter than those in the conventional Carey-Lea process and also which has superior dispersion stability. An aqueous silver nitrate solution is allowed to react with a mixed solution of an aqueous iron(II) sulfate solution and an aqueous sodium citrate solution, and the resultant reaction fluid containing an agglomerate of fine silver particles is left at 0 to 100° C. to obtain an agglomerate of fine silver particles having grown into granular particles. Next, this agglomerate of fine silver particles having grown into granular particles is filtered, and, to the resultant cake of the agglomerate of fine silver particles, pure water is added to obtain a fine silver particle colloidal dispersion having an average particle diameter of 20 to 200 nm.
    Type: Grant
    Filed: December 8, 2005
    Date of Patent: April 12, 2011
    Assignee: Sumitomo Metal Mining Co., Ltd.
    Inventors: Hiroyuki Tanaka, Kenji Kato, Masaya Yukinobu
  • Publication number: 20110037428
    Abstract: A connection apparatus to which an electronic device having a rechargeable power unit and capable of charging the rechargeable power unit in plural charge modes, can be connected, the connection apparatus including; a connector to which the electronic device can be connected and to which are connected an electric signal line used for exchanging electric signals with the electronic device and a power supply line used for charging the rechargeable power unit in the plural charge modes; and a signal output module for delivering to the connector a simulated reconnection signal for causing the electronic device to detect a temporary interruption of an electrical connection between the electronic device and the connector and a subsequent restoration of the temporarily interrupted electrical connection after a prescribed time interval, and a charge mode selection signal which the electronic device refers to, after having received the simulated reconnection signal, in selecting one of the charge modes.
    Type: Application
    Filed: August 10, 2010
    Publication date: February 17, 2011
    Applicant: BUFFALO INC.
    Inventors: Satoshi SAKAGUCHI, Kenji KATO, Tsukasa ITO
  • Patent number: 7887677
    Abstract: A silicon object formation target substrate is arranged in a first chamber, a silicon sputter target is arranged in a second chamber communicated with the first chamber, plasma for chemical sputtering is formed from a hydrogen gas in the second chamber, chemical sputtering is effected on the silicon sputter target with the plasma thus formed, producing particles contributing to formation of silicon object, whereby a silicon object is formed, on the substrate, from the particles moved from the second chamber to the first chamber.
    Type: Grant
    Filed: September 21, 2006
    Date of Patent: February 15, 2011
    Assignee: Nissin Electric Co., Ltd.
    Inventors: Takashi Mikami, Atsushi Tomyo, Kenji Kato, Eiji Takahashi, Tsukasa Hayashi
  • Patent number: 7880392
    Abstract: Plasma producing method and apparatus wherein a plurality of high-frequency antennas are arranged in a plasma producing chamber, and a high-frequency power supplied from a high-frequency power supply device (including a power source, a phase controller and the like) is applied to a gas in the chamber from the antennas to produce inductively coupled plasma. At least some of the plurality of high-frequency antennas are arranged in a fashion of such parallel arrangement that the antennas successively neighbor to each other and each of the antennas is opposed to the neighboring antenna. The high-frequency power supply device controls a phase of a high-frequency voltage applied to each antenna, and thereby controls an electron temperature of the inductively coupled plasma.
    Type: Grant
    Filed: October 26, 2006
    Date of Patent: February 1, 2011
    Assignees: Nissin Electric Co., Ltd., EMD Corporation
    Inventors: Kenji Kato, Hiroshige Deguchi, Hitoshi Yoneda, Kiyoshi Kubota, Akinori Ebe, Yuichi Setsuhara
  • Publication number: 20110012068
    Abstract: A process for producing a fine silver particle colloidal dispersion which can simply form conductive silver layers and antimicrobial coatings by screen printing or the like. The process is characterized by having a reaction step of allowing an aqueous silver nitrate solution to react with a mixed solution of an aqueous iron(II) sulfate solution and an aqueous sodium citrate solution to form an agglomerate of fine silver particles, a filtration step of filtering the resultant agglomerate of fine silver particles to obtain a cake of the agglomerate of fine silver particles, a dispersion step of adding pure water to the cake to obtain a first fine silver particle colloidal dispersion of a water system in which dispersion the fine silver particles have been dispersed in the pure water, and a concentration and washing step of concentrating and washing the first fine silver particle colloidal dispersion of a water system.
    Type: Application
    Filed: July 15, 2010
    Publication date: January 20, 2011
    Applicant: SUMITOMO METAL MINING CO., LTD.
    Inventors: Kenji Kato, Masaya Yukinobu
  • Patent number: 7872480
    Abstract: A gas sensor control apparatus for controlling a gas sensor includes a resistance detection unit and a heater control unit. The resistance detection unit detects a resistance of an object cell of the gas sensor. When the resistance of the object cell is lower than a predetermined threshold, the heater control unit controls energization of a heater such that the resistance detected by the resistance detection unit is a first predetermined resistance. Subsequently, after elapse of a predetermined time, the heater control unit further controls energization of the heater in such a manner that the resistance detected by the resistance detection unit is a second predetermined resistance of a resistance value that is higher than that of the first predetermined resistance.
    Type: Grant
    Filed: August 25, 2008
    Date of Patent: January 18, 2011
    Assignee: NGK Spark Plug Co., Ltd.
    Inventors: Kenji Kato, Hisashi Sasaki, Koji Shiotani
  • Patent number: 7838197
    Abstract: There are provided a photosensitive composition used in one-shot exposure of exposing it via a photomask to light from a UV lamp or in direct writing with light from a UV lamp or laser light to form a patterned latent image to be developed with an alkaline aqueous solution, wherein a difference between maximum absorbance and minimum absorbance, in a wavelength range of 355 to 405 nm, of a dry coating thereof before light exposure is within 0.3 per 25 ?m film thickness of the dry coating, and a dry film obtained by applying the photosensitive composition onto a carrier film and then drying it.
    Type: Grant
    Filed: November 14, 2007
    Date of Patent: November 23, 2010
    Assignee: Taiyo Ink Mfg. Co., Ltd.
    Inventors: Yoko Shibasaki, Kenji Kato, Masao Arima
  • Patent number: 7786178
    Abstract: A process for producing a fine silver particle colloidal dispersion which can simply form conductive silver layers and antimicrobial coatings by screen printing or the like. The process is characterized by having a reaction step of allowing an aqueous silver nitrate solution to react with a mixed solution of an aqueous iron(II) sulfate solution and an aqueous sodium citrate solution to form an agglomerate of fine silver particles, a filtration step of filtering the resultant agglomerate of fine silver particles to obtain a cake of the agglomerate of fine silver particles, a dispersion step of adding pure water to the cake to obtain a first fine silver particle colloidal dispersion of a water system in which dispersion the fine silver particles have been dispersed in the pure water, and a concentration and washing step of concentrating and washing the first fine silver particle colloidal dispersion of a water system.
    Type: Grant
    Filed: April 27, 2004
    Date of Patent: August 31, 2010
    Assignee: Sumitomo Metal Mining Co., Ltd.
    Inventors: Kenji Kato, Masaya Yukinobu
  • Publication number: 20100210093
    Abstract: In the method for forming a silicon-based thin film by the plasma CVD method using high-frequency excitation, a polycrystalline silicon-based thin film having high degree of crystallization is formed relatively at a low temperature, economically, and productively. The polycrystalline silicon-based thin film is formed in such a state that the pressure of gas during formation of the film is selected and determined from the range of 0.0095 Pa to 64 Pa; the ratio (Md/Ms) of a supply flow rate Md of a diluting gas to a supply flow rate Ms of a film-forming material gas introduced into a deposition chamber is selected and determined from the range of 0 to 1200; the high-frequency power density is selected and determined from the range of 0.
    Type: Application
    Filed: October 29, 2007
    Publication date: August 19, 2010
    Inventors: Kenji Kato, Eiji Takahashi
  • Patent number: 7776491
    Abstract: A separator unit inserted into a fuel cell having an electrolyte layer interposed between a fuel electrode and an oxygen electrode is provided with a plate like separator that separates fuel gas supplied to the fuel electrode from oxidizing gas supplied to the oxygen electrode, and a mesh like collector having an opening that forms one of a passage through which the fuel gas flows and a passage through which the oxidizing gas flows. The collector is provided to at least one side of the separator base in abutment against one of the fuel electrode and the oxygen electrode. The separator base has a coolant passage formed therein, through which a coolant is allowed to flow, and an electrode abutment portion of the collector, which abuts against one of the fuel electrode and the oxygen electrode, has an aperture ratio higher than those of other portions of the collector.
    Type: Grant
    Filed: March 8, 2006
    Date of Patent: August 17, 2010
    Assignee: Kabushikaisha Equos Research
    Inventors: Noriyuki Takada, Kenji Kato, Yoshihiro Tamura, Toshihiko Nonobe
  • Publication number: 20100189921
    Abstract: A plasma generating method and apparatus which use plural high-frequency antennas 2 to generate inductively coupled plasma, and a plasma processing apparatus using the apparatus. The antennas 2 are identical to one another. Application of a high-frequency electric power to the antennas 2 is performed from a high-frequency power source 4 which is disposed commonly to the antennas 2, through one matching circuit 5 and one busbar 3. The busbar 3 is partitioned into sections the number of which is equal to that of the antennas, while setting a portion which is connected to the matching circuit 5, as a reference. One-end portions of the antennas are connected to corresponding sections 31, 32, 33 through power supplying lines 311, 321, 331. The other end portions of the antennas are grounded. The impedances of the sections of the busbar, and those of the power supplying lines are adjusted so that same currents flow through the antennas, and a same voltage is applied to the antennas.
    Type: Application
    Filed: April 2, 2010
    Publication date: July 29, 2010
    Applicant: Nissin Electric Co., Ltd. and EMD Corporation
    Inventors: Hiroshige DEGUCHI, Hitoshi Yoneda, Kenji Kato, Akinori Ebe, Yuichi Setsuhara
  • Publication number: 20100140113
    Abstract: There is provided a control apparatus for a gas sensor, which has a sensor element equipped with first and second oxygen pumping cells. The sensor control apparatus is configured to drive the first oxygen pumping cell to adjust the oxygen concentration of gas under measurement, drive the second oxygen pumping cell to produce a flow of electric current according to the amount of oxygen pumped out of the oxygen concentration adjusted gas by the second oxygen pumping cell, perform specific drive control to control the amount of oxygen pumped by the second oxygen pumping cell to a predetermined level after startup of the sensor element and before the application of the drive voltage between the electrodes of the second oxygen pumping cell.
    Type: Application
    Filed: December 3, 2009
    Publication date: June 10, 2010
    Applicant: NGK SPARK PLUG CO., LTD.
    Inventors: Satoshi TERAMOTO, Hirotaka Onogi, Koji Shiotani, Kenji Kato, Takashi Kawai