Abstract: A substrate processing method includes a liquid film forming step of forming a liquid film, a liquid film heat retaining step of keeping the liquid film warm, a gas phase layer forming step of forming a gas phase layer which holds the processing liquid on a center portion of the liquid film, an opening forming step of forming an opening in the center portion of the liquid film by excluding the processing liquid held by the gas phase layer, a substrate rotating step of rotating the substrate around a rotation axis, and an opening expanding step of expanding the opening, while a state in which the gas phase layer is formed on an inner circumferential edge of the liquid film is maintained, by moving the irradiation region toward a circumferential edge portion of the substrate while the liquid film heat retaining step and the substrate rotating step are performed.

Abstract: The present invention relates to a petroleum resin having the content of a volatile organic compound component of less than 100 wt ppm; and a hydrogenated petroleum resin having the content of a volatile organic compound component of less than 100 wt ppm.

Abstract: To appropriately manufacture a semiconductor device. A glass substrate is a glass substrate for manufacturing the semiconductor device. In a case in which one surface is directed downward in a vertical direction, and a first position, a second position, and a third position on the one surface on an outer side in a radial direction with respect to a center point of the glass substrate are supported by supporting members, a lowest point as a position where a height in the vertical direction is the lowest on other surface is positioned in a circular central region on an inner side in the radial direction with respect to the first position, the second position, and the third position when viewed from the vertical direction, a center of the central region is a center point of the glass substrate, and a diameter of the central region has a length of ? of a diameter of the glass substrate.

Abstract: A substrate processing method includes supplying a chemical solution to a surface of a substrate (step S11), supplying a rinse liquid to the surface of the substrate after step S11 (step S12), bringing a heated dry processing liquid to the surface of the substrate after step S12 (step S14), and drying the substrate by removing the dry processing liquid from the surface of the substrate (step S15). The dry processing liquid has a lower surface tension than the rinse liquid. The boiling point of the dry processing liquid is higher than the boiling point of the rinse liquid. The dry processing liquid that comes in contact with the surface of the substrate in step S14 has a temperature that is a predetermined contact temperature higher than or equal to the boiling point of the rinse liquid and lower than the boiling point of the dry processing liquid.

Abstract: A classification system according to an embodiment includes a score calculation unit, a determination unit, and a classification unit. The score calculation unit calculates respective scores of predetermined classes from input data. The determination unit determines whether the input data belongs to anyone of the classes based on the respective scores of the classes, which are calculated by the score calculation unit. The classification unit determines which one of the classes the input data belongs to, based on the calculated scores when the determination unit determines that the input data belongs to anyone of the classes and determines that the input data belongs to an unknown class that is other than the classes when the determination unit determines that the input data does not belong the classes.

Abstract: A non-transitory computer readable medium stores a program causing a computer to execute: executing a first game in which a battle game is executed and a place of a current player among a plurality of players is determined based on a result of the battle game, each of the plurality of players organizing at least one party used in the battle game; storing the at least one party of each of the plurality of players in association with a place of each of the plurality of players in the first game; selecting a party to be used in a second game from the stored parties based on a type of the second game and the place of the current player in the first game; and executing the second game in which the battle game is executed by using the selected party and a party organized by the current player.

Abstract: A liquid film of a processing liquid containing at least one of sulfuric acid, a sulfate, peroxosulfuric acid, and a peroxosulfate, or a processing liquid containing hydrogen peroxide is formed on a substrate. A plasma is radiated to the liquid film. Thereby, a substrate processing method in which substrate processing using an oxidizing power of the processing liquid can be efficiently performed is provided.

Abstract: A lubricating oil composition may be used for lubrication of a shock absorber. The composition may include a base oil (A), a zinc dithiophosphate (B), and an alkenylsuccinic imide (C). The lubricating oil composition can be more preferably applied to lubrication of a shock absorber. Based on the total lubricating oil composition mass, a content of the component (C) in terms of nitrogen atoms is in a range of from 0.001 to 0.09 mass %, and/or a content of the component (B) in terms of zinc atoms is in a range of from 0.005 to 1.0 mass %.

Abstract: A processor receives a search query for graph data representing a graph including nodes and edges, the search query specifying a search criterion. The processor determines whether a value of a first property associated with a first node matches the search criterion. The processor predicts whether a value of a second property associated with a second node matches the search criterion, in accordance with a result of the determining and a constraint rule between the first node and the second node. The processor generates a search result for the search query in accordance with the result of the determining and a result of the predicting.

Abstract: First and second concentration measurement parts (415, 425) are provided in first and second supply liquid lines (412, 422) in which first and second supply liquids flow, respectively. A dissolved concentration of gas in the second supply liquid is lower than that in the first supply liquid. In the first and second supply liquid lines, respective one ends of first and second branch lines (51, 52) are connected to respective positions on the upstream side of the concentration measurement parts. The other ends of the first and second branch lines are connected to a mixing part (57), and by mixing the first and second supply liquids, a processing liquid is generated. Respective flow rate adjustment parts (58) of the first and second branch lines are controlled on the basis of respective measured values of the first and second concentration measurement parts so that the dissolved concentration of the gas in the processing liquid can become a set value.

Abstract: A hot-stamped product with improved delayed-fracture resistance is provided. The hot-stamped product 1 includes: a steel substrate 10; and an Al film 20 formed on the steel substrate 10, the Al film 20 including: an interface layer 21 located at the interface with the steel substrate 10 and with part of the ?Fe substituted by Al and Si; an intermediate layer 22 formed on the interface layer 21; and an oxide layer formed on the intermediate layer, the intermediate layer 22 including an Fe—Al—Si phase 22a with part of the ?Fe substituted by Al and Si, the Fe—Al—Si phase 22a including one or more elements selected from the group consisting of Zr, Ce, Y, Ta, Ni, Cu, Nb, Cr, Co, V and Ti, the oxide layer 23 including one or more elements selected from the group consisting of Be, Mg, Ca, Sr, Ba, Sc and Zn.

Abstract: A light source device includes: a substrate; a plurality of light sources disposed on the substrate; a wavelength conversion member disposed to face the plurality of light sources; and a diffusion member disposed between the wavelength conversion member and the plurality of light sources, and configured to uniformize distribution of traveling direction angle of incident light.

Abstract: First and second concentration measurements are provided in lines for first and second supply liquid lines. A dissolved concentration of gas in the second supply liquid is lower than that in the first supply liquid. In the first and second lines, first ends of branch lines are connected upstream of the concentration measurements. The second ends of the branch lines are connected to a mixing part. By mixing the first and second supply liquids, a processing liquid is generated. Respective flow rates in the branch lines are based on the first and second concentration measurements to set the dissolved concentration of the gas in the processing liquid. Thus, particles or the like can be removed from the processing liquid to be supplied to a substrate, and the dissolved concentration of the gas in the processing liquid can be set with high accuracy.

Abstract: A rebar tying tool may be configured to tie rebars with a wire. The rebar tying tool may include: a contact member configured to contact the wire during a tying operation in which the rebar tying tool ties the rebars with the wire. The contact member may include: a base; and a surface layer covering at least a part of a surface of the base and configured to contact the wire during the tying operation. Hardness of the surface layer may be higher than hardness of the base.

Abstract: A rebar tying tool may be configured to tie rebars with a wire. The rebar tying tool may include: a first cutter; and a second cutter configured to cut the wire by moving relative to the first cutter. The second cutter may include: a cutting part configured to contact and cut the wire; a first connecting part connected to a first portion of the cutting part; and a second connecting part connected to a second portion of the cutting part, the second portion being different from the first portion.

Abstract: A training data generation device includes a processor that executes a procedure. The procedure includes classifying, based on a feature value, each of a first plural number of training data having a first attribute and each of a second plural number of training data having a second attribute; based on a comparison of a number of training data classified in a first group against a number of training data classified in a second group from among the first plurality of training data, selecting a third plurality of training data from training data classified in a third group and training data classified in a fourth group from among the second plurality of training data, the third group corresponding to the first group, the fourth group corresponding to the second group; and converting each of the third plurality of training data into a fourth plurality of training data having the first attribute.

Abstract: Disclosed is a substrate treating apparatus. All treating units are each arranged such that a treatment chamber, a chemical piping space, and an exhaust chamber are located side by side along a transportation space, the chemical piping space is located on a first side of the treatment chamber, and the exhaust chamber faces the chemical piping space across the treatment chamber when seen from the transportation space. The exhaust chamber faces the chemical piping space across the treatment chamber, leading to prevention of obstruction of a passage for passing a pipe, configured to supply a chemical to a substrate held by a holding rotator, by an exhaust pipe. Moreover, a single type of treating units is enough for the substrate treating apparatus instead of two types of treating units currently used. This results in sharing of components by all the treating units.

Abstract: According to the present invention, a substrate W is provided with a recess 95. The width of the recess 95 is smaller than the depth of the recess 95. An etching target which is at least one of a single crystal of silicon, a polysilicon and an amorphous silicon is exposed in at least a part of the upper part of a lateral surface 95s and in at least a part of the lower part of the lateral surface 95s. The etching target is etched by supplying an alkaline first etching liquid, in which an inert gas is dissolved, to the substrate W. The etching target is etched by supplying an alkaline second etching liquid, in which a dissolution gas is dissolved, and which has a dissolved oxygen concentration higher than that of the first etching liquid, to the substrate W before or after the first etching liquid is supplied to the substrate W.

Abstract: A light source device includes: a substrate; a plurality of light sources disposed on the substrate; a wavelength conversion member disposed to face the plurality of light sources; and a diffusion member disposed between the wavelength conversion member and the plurality of light sources, and configured to uniformize distribution of traveling direction angle of incident light.

Abstract: In the present invention, an alkaline first etching liquid is fed to a substrate, whereby an etching target representing a silicon monocrystal and/or polysilicon is etched. An alkaline second etching liquid is fed to the substrate after or before the first etching liquid is fed to the substrate, whereby the etching target is etched, the second etching liquid containing a compound that inhibits contact between hydroxide ions and the etching target, the difference between the maximum value and the minimum value of the etching speed with respect to the (110) face, the (100) face, and the (111) face of silicon being smaller in the second etching liquid than in the first etching liquid, and the maximum value of the etching speed being smaller in the second etching liquid than in the first etching liquid.