Patents by Inventor Kenji Kobayashi

Kenji Kobayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210129489
    Abstract: A composite member (1) satisfies the following expressions. X/(E×|CTE(B)?CTE(A)|)?50, X/(E×|CTE(B)?CTE(C)|)?50, Y/|CTE(B)?CTE(A)|×L(BA)?50, and Y/|CTE(B)?CTE(C)|×L(BC)?50. X: shear bond strength (MPa) between the heat dissipating base substrate and heat generating member, Y: fracture elongation of the thermoconductive insulating adhesive film, E: modulus of elasticity (MPa) of the thermoconductive insulating adhesive film, CTE(A): linear expansion coefficient (° C.?1) of the heat dissipating base substrate, CTE(B): linear expansion coefficient (° C.?1) of the thermoconductive insulating adhesive film, CTE(C): linear expansion coefficient (° C.
    Type: Application
    Filed: August 13, 2018
    Publication date: May 6, 2021
    Applicants: TOYO INK SC HOLDINGS CO., LTD., TOYOCHEM CO., LTD.
    Inventors: Toshiichi SAWAGUCHI, Naohiro TANAKA, Kaori SAKAGUCHI, Kenji ANDOU, Hidenobu KOBAYASHI
  • Publication number: 20210114018
    Abstract: A reaction vessel has plural wells each configured to accommodate a sample on the same plane or on the same straight line. Among the wells of a well plate, a specific well other than a well at a center of point symmetry is an orientation recognizing well in which a fluorescent dye is placed. The reaction vessel can identify a position of the orientation recognizing well by using fluorescence emitted from the fluorescent dye, and can thereby recognize an orientation of the reaction vessel.
    Type: Application
    Filed: October 18, 2019
    Publication date: April 22, 2021
    Applicant: SHIMADZU CORPORATION
    Inventors: Naoko TAKAOKA, Masamitsu SHIKATA, Kenji NINOMIYA, Shinichiro KOBAYASHI
  • Patent number: 10964526
    Abstract: A substrate processing method includes forming a liquid film of a processing liquid covering an entire upper surface of a horizontally-held substrate; heating the substrate to make the processing liquid of the substrate evaporate to form a gas phase layer between the upper surface of the substrate and the processing liquid and maintain the liquid film on the gas phase layer; blowing a gas at a first flow rate onto the liquid film on the substrate to partially remove the processing liquid to open a hole in the liquid film; heating the substrate to spread the hole to an outer periphery of the substrate and move the liquid film on the gas phase layer to remove the processing liquid, constituting the liquid film, off the substrate; and blowing a gas at a second flow rate greater than the first flow rate onto a region of the upper surface of the substrate within the hole after the hole opening step to spread the hole to the outer periphery of the substrate and move the liquid film on the gas phase layer to remove
    Type: Grant
    Filed: February 12, 2019
    Date of Patent: March 30, 2021
    Inventors: Manabu Okutani, Kenji Kobayashi, Naohiko Yoshihara
  • Patent number: 10965211
    Abstract: A technology for suppressing a performance degradation of a solar battery caused by PID is provided. A conversion device includes a DC/DC converter and a control part. A solar battery is connected to an input end of the DC/DC converter. When direct-current power generated by the solar battery is converted and output, the DC/DC converter makes a potential of a negative electrode of the solar battery to be higher than a potential in a negative electrode of the output when the power input from the solar battery exceeds a prescribed value. The control part changes a voltage of the power output from the solar battery to detect a peak value of the power, and stops the operation of the DC/DC converter when the peak value is smaller than the prescribed value.
    Type: Grant
    Filed: January 18, 2019
    Date of Patent: March 30, 2021
    Assignee: OMRON Corporation
    Inventors: Hirokazu Ehara, Kazumi Tsuchimichi, Kenji Kobayashi, Yasuhiro Tsubota
  • Publication number: 20210086238
    Abstract: A liquid film of a processing liquid containing at least one of sulfuric acid, a sulfate, peroxosulfuric acid, and a peroxosulfate, or a processing liquid containing hydrogen peroxide is formed on a substrate. A plasma is radiated to the liquid film. Thereby, a substrate processing method in which substrate processing using an oxidizing power of the processing liquid can be efficiently performed is provided.
    Type: Application
    Filed: September 10, 2020
    Publication date: March 25, 2021
    Applicant: SCREEN Holdings Co., Ltd.
    Inventors: Akira HORIKOSHI, Shohei NAKAMURA, Shigeru TAKATSUJI, Motohiro KONO, Takahiro KIMURA, Kenji KOBAYASHI
  • Publication number: 20210062056
    Abstract: The thermally reversible cross-linked hot-melt adhesive has good handling properties and storage stability, can be repeatedly melted by heating and solidified by cooling, and has high adhesiveness and good pot life. It is obtained b melting and mixing a maleimide compound, having a maleimide group at a plurality of ends thereof, with a mixture of a star-branched-structure polyurethane resin having a furan ring at a plurality of ends thereof and a straight-chain polyurethane resin having a furan ring at both ends thereof. It has a low viscosity when being melted by heating, and, after being solidified by cooling, forms a high molecular weight body having a three-thmensionally cross-linked structure, and therefore, is a resin having high cohesive force and high adhesiveness. It does not react with moisture in the air and therefore can be stored in air, and is suitable as a hot-melt adhesive for bookbinding.
    Type: Application
    Filed: June 19, 2018
    Publication date: March 4, 2021
    Applicant: Taiyo Seiki Co., Ltd.
    Inventors: Kenji Kobayashi, Norihiko Kinoshita
  • Publication number: 20210066071
    Abstract: A substrate processing method and a substrate processing apparatus are provided, which solve problems of pattern collapse and particles. The substrate processing method includes: a surface modification step of modifying a surface of a substrate having an oxide thereon to improve or reduce roughness of the surface; a surface cleaning step of supplying a treatment liquid to the modified surface of the substrate to clean the surface of the substrate with the treatment liquid; and a hydrophobization step of supplying a hydrophobizing agent to the cleaned surface of the substrate to hydrophobize the surface of the substrate.
    Type: Application
    Filed: November 19, 2018
    Publication date: March 4, 2021
    Inventors: Pohling THEN, Kenji KOBAYASHI, Sadamu FUJII, Taiki HINODE
  • Publication number: 20210053705
    Abstract: A binding machine, includes: an accommodating portion configured to accommodate a wound binding tape; a main handle; and a clincher arm. The accommodating portion includes, with the wound binding tape in an accommodated state, a side wall portion that faces a side surface of the binding tape, and a circumferential portion that is continuous with the side wall portion, faces a front surface of the binding tape, and is provided with an opening for accommodating the binding tape in a part of the circumferential portion.
    Type: Application
    Filed: August 20, 2020
    Publication date: February 25, 2021
    Applicant: MAX CO., LTD.
    Inventors: Satoshi TAGUCHI, Kenji KOBAYASHI, Hajime TAKEMURA
  • Publication number: 20210053709
    Abstract: A binding machine includes: a main handle configured to accommodate a staple; a staple driver supported by the main handle and configured to drive the staple; and a clincher arm rotatably attached to the main handle and including a clincher, the clincher being configured to clinch the staple driven by the staple driver. The staple driver includes: a driving portion that extends in a direction away from the main handle and is configured to drive the staple toward the clincher, and an attachment portion with which the driving portion is attached to the main handle, and the attachment portion extends in a longitudinal direction of the main handle from a side edge of the driving portion.
    Type: Application
    Filed: August 19, 2020
    Publication date: February 25, 2021
    Applicant: MAX CO., LTD.
    Inventors: Satoshi TAGUCHI, Kenji KOBAYASHI
  • Publication number: 20210057235
    Abstract: TMAH, hydrogen peroxide and water are mixed to make alkaline etching liquid containing TMAH, the hydrogen peroxide and the water and not containing hydrogen fluoride compound. The etching liquid is supplied to a substrate on which a polysilicon film and a silicon oxide film are exposed, thereby etching the polysilicon film while inhibiting etching the silicon oxide film.
    Type: Application
    Filed: November 22, 2018
    Publication date: February 25, 2021
    Applicant: SCREEN Holdings Co., Ltd.
    Inventors: Sei NEGORO, Kenji KOBAYASHI
  • Publication number: 20210043468
    Abstract: One of a setting dissolved oxygen concentration and a setting atmosphere oxygen concentration is determined based on a required etching amount. Thereafter, based on the required etching amount and the one of the determined setting dissolved oxygen concentration and setting atmosphere oxygen concentration, the other of the setting dissolved oxygen concentration and the setting atmosphere oxygen concentration is determined. A low oxygen gas whose oxygen concentration is equal or approached to the determined setting atmosphere oxygen concentration flows into a chamber that houses a substrate. Furthermore, an etching liquid whose dissolved oxygen is reduced such that its dissolved oxygen concentration is equal or approached to the determined setting dissolved oxygen concentration is supplied to the entire region of the upper surface of the substrate held horizontally.
    Type: Application
    Filed: October 23, 2020
    Publication date: February 11, 2021
    Inventors: Sei NEGORO, Kenji KOBAYASHI
  • Patent number: 10912683
    Abstract: A sheet-like article (1) for an absorbent article of the invention includes a plurality of absorbent units (4), each including: a long base portion (2); and water-absorbent polymer particles (3) that are fixed to a surface of first side of the long base portion (2). In the sheet-like article (1), the absorbent units (4) are arranged such that the longitudinal direction thereof is oriented in one direction. When the water-absorbent polymer particles (3) absorb a liquid, the water-absorbent polymer particles (3) swell beyond the lateral side edge portions (2s), of the long base portion (2), that extend along the longitudinal direction, and a position, in the thickness direction, of each long base portion is varied from the position thereof before absorbing the liquid.
    Type: Grant
    Filed: October 6, 2016
    Date of Patent: February 9, 2021
    Assignee: KAO CORPORATION
    Inventors: Kenji Kobayashi, Bin Latif Muhamad Nor Salehuddin, Ryota Kuramae, Aiko Onda
  • Publication number: 20200407610
    Abstract: Provided is a moisture-curable polyurethane hot-melt adhesive (PUR) that, when heated, produces less hazardous isocyanate gas, and is safe and easy for a user to handle. This moisture-curable polyurethane hot-melt adhesive comprises 100 parts by weight of a urethane pre-polymer which is a product obtained from a reaction between an excessive amount of diphenylmethane diisocyanate and a mixture of a crystalline polyester polyol and a non-crystalline polyester polyol and/or a non-crystalline polyether polyol, and 5-20 parts by weight of a surface-modified silica gel containing an amino group. Preferable as the surface-modified silica gel is a silica gel to which a residual group of a silane oligomer, which is a hydrolytic product of aminoalkyl(di or tri)alkoxysilane, is linked.
    Type: Application
    Filed: May 8, 2018
    Publication date: December 31, 2020
    Applicant: Taiyo Seiki Co., Ltd.
    Inventors: Norihiko Kinoshita, Kenji Kobayashi
  • Publication number: 20200399404
    Abstract: The present invention relates to a petroleum resin having the content of a volatile organic compound component of less than 100 wt ppm; and a hydrogenated petroleum resin having the content of a volatile organic compound component of less than 100 wt ppm.
    Type: Application
    Filed: March 8, 2019
    Publication date: December 24, 2020
    Applicant: IDEMITSU KOSAN CO.,LTD.
    Inventors: Kiyohiko YOKOTA, Kenji KOBAYASHI, Masakatsu KUROKI
  • Patent number: 10861718
    Abstract: One of a setting dissolved oxygen concentration and a setting atmosphere oxygen concentration is determined based on a required etching amount. Thereafter, based on the required etching amount and the one of the determined setting dissolved oxygen concentration and setting atmosphere oxygen concentration, the other of the setting dissolved oxygen concentration and the setting atmosphere oxygen concentration is determined. A low oxygen gas whose oxygen concentration is equal or approached to the determined setting atmosphere oxygen concentration flows into a chamber that houses a substrate. Furthermore, an etching liquid whose dissolved oxygen is reduced such that its dissolved oxygen concentration is equal or approached to the determined setting dissolved oxygen concentration is supplied to the entire region of the upper surface of the substrate held horizontally.
    Type: Grant
    Filed: December 26, 2018
    Date of Patent: December 8, 2020
    Inventors: Sei Negoro, Kenji Kobayashi
  • Patent number: 10858212
    Abstract: A sheet-like article (1) for an absorbent article of the invention includes a plurality of absorbent units (4), each including a long base portion (2) and water-absorbent polymer particles (3) fixed to a surface of one face of the long base portion (2). In the sheet-like article (1), the absorbent units (4) are arranged such that their longitudinal direction is oriented in one direction. Before the water-absorbent polymer particles (3) absorb a liquid, the water-absorbent polymer particles (3) are located inward of both lateral side edge portions (2s), of the long base portion (2), that extend along the longitudinal direction. When the water-absorbent polymer particles (3) absorb a liquid, the water-absorbent polymer particles (3) swell beyond the lateral side edge portions (2s), of the long base portion (2), that extend along the longitudinal direction, and a position, in the thickness direction, of the long base portion (2) is varied from the position thereof before absorbing the liquid.
    Type: Grant
    Filed: October 6, 2016
    Date of Patent: December 8, 2020
    Assignee: KAO CORPORATION
    Inventors: Bin Latif Muhamad Nor Salehuddin, Kenji Kobayashi, Ryota Kuramae, Aiko Onda
  • Patent number: 10825713
    Abstract: A substrate processing apparatus includes a substrate heating unit arranged to heat the underside of a substrate while supporting the substrate thereon and an attitude changing unit arranged to cause the substrate heating unit to undergo an attitude change between a horizontal attitude and a tilted attitude. In an organic solvent removing step to be performed following a substrate heating step of heating the substrate, the substrate heating unit undergoes an attitude change to the tilted attitude so that the upper surface of the substrate becomes tilted with respect to the horizontal surface.
    Type: Grant
    Filed: July 6, 2017
    Date of Patent: November 3, 2020
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Naohiko Yoshihara, Kenji Kobayashi, Manabu Okutani
  • Publication number: 20200285116
    Abstract: A light source device includes: a substrate; a plurality of light sources disposed on the substrate; a wavelength conversion member disposed to face the plurality of light sources; and a diffusion member disposed between the wavelength conversion member and the plurality of light sources, and configured to uniformize distribution of traveling direction angle of incident light.
    Type: Application
    Filed: May 22, 2020
    Publication date: September 10, 2020
    Applicant: Sony Corporation
    Inventors: Koichi Yamamoto, Kenji Kobayashi, Yasuhiro Nishida
  • Patent number: D901672
    Type: Grant
    Filed: August 2, 2018
    Date of Patent: November 10, 2020
    Assignee: ATOM MEDICAL CORPORATION
    Inventors: Takashi Tanabe, Kenji Kobayashi, Ichiro Matsubara
  • Patent number: D904599
    Type: Grant
    Filed: August 2, 2018
    Date of Patent: December 8, 2020
    Assignee: ATOM MEDICAL CORPORATION
    Inventors: Takashi Tanabe, Kenji Kobayashi, Ichiro Matsubara