Abstract: A glass containing no lead and comprising, calculated as oxides: 40-60 wt. % ZnO, 15-35 wt. % B2O3, 1-16 wt. % SiO2, 1-10 wt. % Al2O3, 2-15 wt. % MnO2, and at least one selected from the group consisting of Li2O, Na2O and K2O in their total of 0.5-10 wt. %, and a glass with the above-described components where a total of at least one selected from the group consisting of Li2O, Na2O and K2O is 0-5 wt. %, and at least one selected from the group consisting of MgO, CaO, TiO2, Cr2O3, ZrO2, Ta2O5, SnO2, and Fe2O3 is further included in their total of 0.1-5 wt. %. A conductive paste using such a glass as an inorganic binder has a superior binder removal ability and a good sinterability and can form dense conductors with excellent characteristics with respect to resistance to plating solutions, adhesive strength, resistance to thermal shocks, etc.

Abstract: A glass containing no lead and comprising, calculated as oxides: 40-60 wt. % ZnO, 15-35 wt. % B2O3, 1-16 wt. % SiO2, 1-10 wt. % Al2O3, 2-15 wt. % MnO2, and at least one selected from the group consisting of Li2O, Na2O and K2O in their total of 0.5-10 wt. %, and a glass with the above-described components where a total of at least one selected from the group consisting of Li2O, Na2O and K2O is 0-5 wt. %, and at least one selected from the group consisting of MgO, CaO, TiO2, Cr2O3, ZrO2, Ta2O5, SnO2, and Fe2O3 is further included in their total of 0.1-5 wt. %. A conductive paste using such a glass as an inorganic binder has a superior binder removal ability and a good sinterability and can form dense conductors with excellent characteristics with respect to resistance to plating solutions, adhesive strength, resistance to thermal shocks, etc.

Abstract: A lamp, particularly a discharge lamp, in which an bulb portion of the lamp vessel can be formed with high dimensional accuracy and an advantageous light radiation characteristic and long service life obtained is achieved by the lamp vessel having and its bulb portion and scaling tube portions which are formed from a compacted body of sintered silica glass, and by sealing components, which are hermetically connected to the sealing tube portions and to which an emission part in the bulb is joined, having a first end which is made of silicon dioxide and a second end that is made of a functional gradient material which contains an electrically conductive inorganic material component as the main constituent.

Abstract: A crystallized glass for a substrate of an information-recording disk, which has been obtained by melting a glass forming material consisting essentially of, in wt. % as oxide, 55 to 85% of SiO.sub.2, 5 to 20% of Li.sub.2 O, 0 to 10% of K.sub.2 O+Na.sub.2 O, 0 to 10% of MgO, 0 to 20% of CaO, 0 to 10% of SrO, 0 to 10% of BaO, 0 to 10% of ZnO, 0 to 10% of Al.sub.2 O.sub.3, 0 to 15% of B.sub.2 O.sub.3, 0 to 6% of P.sub.2 O.sub.5, 0 to 3% of TiO.sub.2, 0 to 3% of ZrO.sub.2, 0 to 3% of SnO.sub.2 and 0 to 1% of As.sub.2 O.sub.3 +Sb.sub.2 O.sub.3, 0.1 to 10 wt. % of F and 0.1 to 20 wt. % of Cl, molding, vitrifying and crystallizing the material, and which contains at least 0.05% by weight of chlorine after crystallization. The glass forming material may further contain 0 to 10% of Fe.sub.2 O.sub.3, 0 to 10% of Cr.sub.2 O.sub.3, 0 to 10% of NiO, 0 to 10% of V.sub.2 O.sub.5, 0 to 10% of CuO, 0 to 10% of MnO.sub.2, 0 to 10% of MoO.sub.3, the total of Fe.sub.2 O.sub.3 +Cr.sub.2 O.sub.3 +NiO+V.sub.2 O.sub.5 +CuO+MnO.sub.

Abstract: For improvement in heat radiation capability without sacrifice of affinity for a paste, a substrate used for fabrication of a thick film circuit has a multi-level structure having a foundation of an aluminum nitride and a surface film provided on the foundation, and the surface film is formed of an oxygen compound containing silicon atoms.

Abstract: An insulating substrate is used for fabrication of a thick film circuit and comprises a foundation of aluminum nitride and a surface film structure provided on the foundation, in which the foundation contains at least one oxidizing agent selected from the group consisting of an yttrium oxide and a calcium oxide ranging from 0.1% to 10% by weight for enhancing a stiffness of the foundation, and in which the surface film structure is of the multi-level surface film structure having a lower surface film of an aluminum oxide rapidly grown on the foundation in the presence of the oxidizing agent and an upper surface film containing a silicon oxide and a substance selected from the group consisting of a zirconium oxide, a titanium oxide and a boron oxide for enhancing the resistivity against a firing operation.

Abstract: An immunological assay method, wherein the concentration of a substance to be assayed is calculated from a calibration curve, which is formed in the preparation of a reagent or in the assay of a sample based on parameter(s) determined in the preparation of the reagent, without the need of forming any additional calibration curve each time, is disclosed. By the immunological assay method of the present invention, the concentration of the substance to be assayed can be efficiently and discontinuously determined, when compared with conventional ones. The method of the present invention is particularly suitable for quantitatively determining an antigen or an antibody.