Patents by Inventor Kenji Murao

Kenji Murao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7887723
    Abstract: It is an object of the present invention to provide a method which can easily and selectively modify specific sites on indentations or protrusions of indentation/protrusion structures fabricated by nano-imprinting. Pressing a mold having indentation/protrusion structures onto a polymer substrate comprising at least two layers of different chemical composition exposes the second layer, which has been covered by the outermost layer, in pillars formed as a result of the pressing. Site-specific chemical modification of the pillars can be achieved by formulating a desired chemical composition for the second layer beforehand, or by chemical modification of the exposed second layer cross-sections in the pillars.
    Type: Grant
    Filed: January 17, 2007
    Date of Patent: February 15, 2011
    Assignee: Hitachi, Ltd.
    Inventors: Kenji Murao, Kosuke Kuwabara, Masahiko Ogino
  • Patent number: 7883764
    Abstract: Disclosed is a resinous molded article which has a fine structure of a nanometer level and includes a material containing a polymer of a polymerizable organic fluorocompound. The polymer is formed from, for example, a monomeric precursor composition containing a methacrylate and/or an acrylate in combination with a fluorine-containing photopolymerizable monomeric precursor composition miscible with the former composition.
    Type: Grant
    Filed: October 16, 2007
    Date of Patent: February 8, 2011
    Assignee: Hitachi Chemical Company, Ltd.
    Inventor: Kenji Murao
  • Publication number: 20080167396
    Abstract: Disclosed is a resinous molded article which has a fine structure of a nanometer level and includes a material containing a polymer of a polymerizable organic fluorocompound. The polymer is formed from, for example, a monomeric precursor composition containing a methacrylate and/or an acrylate in combination with a fluorine-containing photopolymerizable monomeric precursor composition miscible with the former composition.
    Type: Application
    Filed: October 16, 2007
    Publication date: July 10, 2008
    Inventor: Kenji Murao
  • Publication number: 20070190786
    Abstract: It is an object of the present invention to provide a method which can easily and selectively modify specific sites on indentations or protrusions of indentation/protrusion structures fabricated by nano-imprinting. Pressing a mold having indentation/protrusion structures onto a polymer substrate comprising at least two layers of different chemical composition exposes the second layer, which has been covered by the outermost layer, in pillars formed as a result of the pressing. Site-specific chemical modification of the pillars can be achieved by formulating a desired chemical composition for the second layer beforehand, or by chemical modification of the exposed second layer cross-sections in the pillars.
    Type: Application
    Filed: January 17, 2007
    Publication date: August 16, 2007
    Inventors: Kenji Murao, Kosuke Kuwabara, Masahiko Ogino
  • Publication number: 20040231995
    Abstract: It is an object of the present invention to provide a copper electroplating method for a printed circuit board having via-holes, which can reproducibly secure good plated film quality and via-hole filling capacity even when the board includes a resist or the like. The electroplating bath for electroplating of a printed circuit board, containing at least one compound selected from the group consisting of pyridinium, bipyridinium, phenanthrolinium, quinolinium and phenazinium salts in the form of onium with an N-alkyl, N-aralkyl, N-aryl, N-alkylene or N-aralkylene moiety.
    Type: Application
    Filed: May 21, 2004
    Publication date: November 25, 2004
    Inventor: Kenji Murao
  • Patent number: 5460914
    Abstract: The present invention aims to provide a deformed toner having a narrow toner particle size distribution, a simple manufacturing method of same, and an imaging apparatus using same.The toner particles are characterized in having an average diameter of d (d is in a range of 4-15 .mu.m), and that a volumetric fraction of the particles having the diameter in a range of d.+-.0.2 d equals to or exceeds 90% of total volume of the particles, and further, when a specific surface area of the toner per 1 cm.sup.3 determined by a BET method is expressed by A (m.sup.2/ g) and a specific gravity of the particle is expressed by D (g/cm.sup.3), A of the particles stands in a range expressed by an equation, 7/(D.multidot.d).ltoreq.A.ltoreq.10/(D.multidot.d).An image having a preferable definition can be obtained by improving a resolution of image by making the particle size distribution of toner particles narrow, and providing the toner having an electrification charge at least 10 .mu.C/g with a narrow distribution.
    Type: Grant
    Filed: February 3, 1994
    Date of Patent: October 24, 1995
    Assignee: Hitachi, Ltd.
    Inventors: Hiroshi Sasaki, Kishiro Iwasaki, Kenji Murao
  • Patent number: 4076646
    Abstract: A liquid crystal composition for field effect display devices, comprising a nematic liquid crystal composition having a substantially positive dielectric anisotropy and at least one of o-terphenyl and m-terphenyl. This composition sufficiently functions at 2 V, because the threshold voltage of the liquid crystal composition can be made about 1.5 V.
    Type: Grant
    Filed: September 8, 1976
    Date of Patent: February 28, 1978
    Assignee: Hitachi, Ltd.
    Inventors: Fumio Nakano, Hisao Yokokura, Kenji Murao
  • Patent number: 3966631
    Abstract: A nematic liquid crystal composition having an improved response to a pulsating driving voltage for effecting a dynamic scattering mode which comprises a predominant amount of a nematic liquid crytal having properties of the dynamic scattering mode and 0.001 to 3% by weight of an onium halide salt having a nitrogen atom as a nucleus, the composition further containing a phenolic compound for improving the solubility of the onium halide salt in the lqiuid crystal and assisting in increasing the degree of dissociation of the neutral onium halide salt to ions.
    Type: Grant
    Filed: August 8, 1974
    Date of Patent: June 29, 1976
    Assignee: Hitachi, Ltd.
    Inventors: Kazuhisa Toriyama, Hidetoshi Abe, Fumio Nakano, Kenji Murao, Mikio Sato