Abstract: A pretreatment liquid is a pretreatment liquid to be used for a pretreatment that is performed on an impermeable base material before an image is recorded on the impermeable base material, containing an aggregating agent, an aqueous medium, and a resin, in which the resin has at least one selected from the group consisting of a structural unit (1), a structural unit (2), and a structural unit (3), and a glass transition temperature of the resin is ?40° C. or higher and lower than 100° C. In the formulae, R2 represents a hydrogen atom or a C1 to C4 alkyl group, A2 represents —NH— or —N(L4-Y4)—, L2 and L4 represent a divalent group or a single bond, L3 represents a divalent group, Y2 and Y4 represent a monovalent group such as an alkyl group, and Y3 represents a monovalent group such as —OH.

Abstract: Provided are a pretreatment liquid for recording an image on an impermeable base material with an aqueous ink, the pretreatment liquid including an aqueous medium, a resin a having a glass transition temperature of lower than 25° C., and particles of a resin b having a glass transition temperature of 25° C. or higher; an ink set; a base material for image recording; an image recorded material; a method of producing a base material for image recording; and an image recording method.

Abstract: Provided is an image recording method including applying an ink containing water, a resin X, and a colorant onto a resin base material A which has a specific distortion rate and to which a tension is applied, to obtain an image, heating the image to a temperature Td and drying the image, and cooling the image to a temperature Tr, in which ?total calculated by Equation (1) is 40 kgf/cm2 or less. E(Td) represents an elastic modulus of the resin X at the temperature Td, ?(Td) represents an expansion coefficient of the resin base material A under specific conditions, E(T) represents an elastic modulus of the resin X at a temperature T of the image in the cooling, ?r(T) represents a linear expansion coefficient of the resin X at the temperature T, and ?s(T) represents a linear expansion coefficient of the resin base material A under specific conditions.

Abstract: There are provided a compound of Formula (1) and a labeled biological substance having the compound. Z1 and Z2 represent a specific 6-membered ring. However, at least one of Z1 or Z2 is a benzene ring having a specific substituent at an ortho position with respect to a nitrogen atom to which L1 or L2 is bonded, or a specific nitrogen-containing 6-membered ring in which a ring-constituting atom located at the ortho position is a nitrogen atom. R1 to R4, R11 to R13, L1, L2, and R21 represents specific groups, and n, ?1, ?2, and m represent specific numbers. The compound has at least one structure represented by —(CH2—CH2—O)m-R21 on a heterocyclic ring and has at least one substituent capable of being bonded to a carboxy group or a biological substance at a specific position, and in a case where at least one of Z1 or Z2 is the specific nitrogen-containing 6-membered ring, the specific substituents may be bonded to each other to form a ring.

Abstract: Provided are any one of the following compounds and a fluorescently labeled biological substance having this compound. R1 to R27, L11, L12, and X+ represent a specific group, and at least one of R1 to R4 represents a substituted alkyl group. In a case where at least one of R1 to R4 is an alkyl group having a carboxy group or a substituent capable of being bonded to a biological substance, at least one of R11 to R27 is an alkyl group or an aryl group, or at least one of R1 to R4, which does not correspond to the alkyl group having a carboxy group or an alkyl group having a substituent capable of being bonded to a biological substance, is an alkyl group having a sulfoalkyl group through a single bond or a linking group. The total of n1 to n4 is an integer of 3 or more, and m=n1+n2+n3+n4?1 is satisfied. At least one of R1 to R4, R13, L11 or L12 in Formula (1) and at least one of R1 to R4, R24, L11, or L12 in Formula (2) have a specific substituent.

Abstract: Provided are an ink for an impermeable base material, including an aqueous medium and resin particles, in which a resin of the resin particles has a glass transition temperature of ?40° C. or higher and 85° C. or lower, the resin has at least one selected from the group consisting of a unit (1) to a unit (3), and at least one of an acid group or a salt of the acid group, an acid value of the resin is 0.10 mmol/g or greater and 2.65 mmol/g or less, and a proportion of a solvent having a boiling point of 250° C. or higher in the aqueous medium is 3% by mass or less, and an image recording method. R2 represents a hydrogen atom or a C1 to C4 alkyl group, A2 represents —NH— or —N(L4-Y4)—, L2 and L4 represent a divalent group or a single bond, L3 represents a divalent group, and Y2 to Y4 represent a monovalent group.

Abstract: Provided is an image recording method including applying a pretreatment liquid containing water and a resin X and an ink containing water and a colorant onto a resin base material A which has a specific distortion rate and to which a tension is applied, to obtain an image, heating the image to a temperature Td and drying the image, and cooling the image to a temperature Tr, in which ?total calculated by Equation (1) is 40 kgf/cm2 or less. E(Td) represents an elastic modulus of the resin X at the temperature Td, ?(Td) represents an expansion coefficient of the resin base material A under specific conditions, E(T) represents an elastic modulus of the resin X at a temperature T of the image in the cooling, ?r(T) represents a linear expansion coefficient of the resin X at the temperature T, and ?s(T) represents a linear expansion coefficient of the resin base material A under specific conditions.

Abstract: Provided is an image recording method including applying an ink containing water, a resin X, and a colorant onto a resin base material A which has a specific distortion rate and to which a tension is applied, to obtain an image, heating the image to a temperature Td and drying the image, and cooling the image to a temperature Tr, in which ?total calculated by Equation (1) is 40 kgf/cm2 or less. E(Td) represents an elastic modulus of the resin X at the temperature Td, ?(Td) represents an expansion coefficient of the resin base material A under specific conditions, E(T) represents an elastic modulus of the resin X at a temperature T of the image in the cooling, ?r(T) represents a linear expansion coefficient of the resin X at the temperature T, and ?s(T) represents a linear expansion coefficient of the resin base material A under specific conditions.

Abstract: An organic semiconductor element in which an organic semiconductor layer contains a compound of Formula (1), a compound of Formula (2), and/or a compound of Formula (3) or contains a polymer having a structure of any one of formed by Formulae (8) to (10): in which X1 represents a nitrogen atom or CRa, and rings A to B each represent a specific nitrogen-containing ring; Y1 represents an oxygen atom, a sulfur atom, CRb2, or NRc; V1 represents NRd, an oxygen atom, a sulfur atom, or a selenium atom; Ra to Rd each represent a hydrogen atom or a substituent; R1 represents a specific substituent, and p is an integer of 0 to 2; n represents 1 or 2; and * represents a bonding site.

Abstract: A pretreatment liquid is a pretreatment liquid to be used for a pretreatment that is performed on an impermeable base material before an image is recorded on the impermeable base material, including a resin and an aqueous medium, in which the resin has at least one selected from the group consisting of a structural unit (1), and a structural unit (2), a glass transition temperature of the resin is ?40° C. or higher and lower than 100° C., and a content of an alkyl (meth)acrylate unit containing a C2 or more chain alkyl group in the resin is less than 5% by mass. In the formulae, R2 represents a hydrogen atom or a C1 to C4 alkyl group, A2 represents —NH— or —N(L4-Y4)—, L2 and L4 represent a divalent group or a single bond, L3 represents a divalent group, Y2 and Y4 represent a monovalent group such as an alkyl group, and Y3 represents a monovalent group such as —OH.

Abstract: A pretreatment liquid is a pretreatment liquid to be used for a pretreatment that is performed on an impermeable base material before an image is recorded on the impermeable base material, containing an aggregating agent, an aqueous medium, and a resin, in which the resin has at least one selected from the group consisting of a structural unit (1), a structural unit (2), and a structural unit (3), and a glass transition temperature of the resin is ?40° C. or higher and lower than 100° C. In the formulae, R2 represents a hydrogen atom or a C1 to C4 alkyl group, A2 represents —NH— or —N(L4-Y4)—, L2 and L4 represent a divalent group or a single bond, L3 represents a divalent group, Y2 and Y4 represent a monovalent group such as an alkyl group, and Y3 represents a monovalent group such as —OH.

Abstract: Provided are an organic thin film transistor element comprising an organic semiconductor layer containing a specific polymer which has a repeating unit including a structure represented by a specific formula, an organic semiconductor film suitable as the organic semiconductor layer and a method of manufacturing the same, and a polymer and a composition suitable as a constituent material of the organic semiconductor film.

Abstract: Provided are a pretreatment liquid for recording an image on an impermeable base material with an aqueous ink, the pretreatment liquid including an aqueous medium, a resin a having a glass transition temperature of lower than 25° C., and particles of a resin b having a glass transition temperature of 25° C. or higher; an ink set; a base material for image recording; an image recorded material; a method of producing a base material for image recording; and an image recording method.

Abstract: Provided are an organic thin film transistor element comprising an organic semiconductor layer containing a specific polymer which has a repeating unit including a structure represented by a specific formula, an organic semiconductor film suitable as the organic semiconductor layer and a method of manufacturing the same, and a polymer and a composition suitable as a constituent material of the organic semiconductor film.

Abstract: A photoelectric conversion element includes a first electrode that has a photosensitive layer containing a light absorbing agent on a conductive support; and a second electrode that is opposite to the first electrode, in which the light absorbing agent contains a perovskite compound, and a compound represented by Formula (A-0), (G)p-L, ??Formula (A-0) in the formula, G represents a group or a salt such as —P(?O)(ORa)2 and —P(?O)(O?Ya+)2; Ra represents a hydrogen atom or a substituent; Ya represents a counter salt; p is an integer of 1 or more; and L represents an aliphatic hydrocarbon group not having an amino group.

Abstract: An organic semiconductor element in which an organic semiconductor layer contains a compound of Formula (1) and/or a compound of Formula (2) or contains a polymer having a structure of any one of Formulae (9) and (10): in which X1 represents a nitrogen atom or CRa, rings A to D each represent a specific aromatic ring or an aromatic heterocyclic ring; Y1 represents an oxygen atom, a sulfur atom, CRb2, or NRc; Ra to Rc each represent hydrogen atoms or substituents; R1 and R2 each represent a to specific substituent; n represents 1 or 2; and * represents a bonding site.

Abstract: An organic semiconductor element in which an organic semiconductor layer contains a compound of Formula (1), a compound of Formula (2), and/or a compound of Formula (3) or contains a polymer having a structure of any one of formed by Formulae (8) to (10): in which X1 represents a nitrogen atom or CRa, and rings A to B each represent a specific nitrogen-containing ring; Y1 represents an oxygen atom, a sulfur atom, CRb2, or NRc; V1 represents NRd, an oxygen atom, a sulfur atom, or a selenium atom; Ra to Rd each represent a hydrogen atom or a substituent; R1 represents a specific substituent, and p is an integer of 0 to 2; n represents 1 or 2; and * represents a bonding site.

Abstract: Provided are a photoelectric conversion element including a first electrode having a photosensitive layer including a light absorber on a conductive support and a second electrode facing the first electrode, in which the light absorber includes a compound having a perovskite-type crystal structure including organic cations, cations of a metallic atom other than elements belonging to Group I of the periodic table, and anions, and at least some of the organic cations constituting the compound are organic cations having a silyl group and a solar cell using the photoelectric conversion element. Also provided is a composition containing a compound represented by Formula (1a) and a halogenated metal: R13Si-L-NR23Hal??Formula (1a) in the formula, R1, R2, and L are specific groups; and Hal represents a halogen atom.

Abstract: Provided are a photoelectric conversion element including a first electrode having a photosensitive layer including a light absorber on a conductive support and a second electrode facing the first electrode, in which the light absorber includes a compound having a perovskite-type crystal structure including organic cations, cations of a metallic atom other than elements belonging to Group I of the periodic table, and anions, and at least some of the organic cations constituting the compound are organic cations having a silyl group and a solar cell using the photoelectric conversion element. Also provided is a composition containing a compound represented by Formula (1a) and a halogenated metal. R13Si-L-NR23Hal??Formula (1a) In the formula, R1, R2, and L are specific groups. Hal represents a halogen atom.

Abstract: Provided is a photoelectric conversion element in which a photosensitive layer is composed of a light absorbing agent containing a perovskite compound, the element including a protective layer that includes a compound having a molecular weight of 5000 or less which is represented by Formula (A), on a surface of the photosensitive layer; a method for manufacturing this photoelectric conversion element; and a solar cell which is formed of this photoelectric conversion element. RA—Z??Formula (A) In Formula (A), RA represents a specific group. Z represents an acidic group or a salt thereof. Further provided is a surface treating agent for a perovskite-type crystal film, including a compound having a molecular weight of 5000 or less which is represented by Formula (A).