Abstract: A filter apparatus for improving gas temperature stability while maintaining a high impurity removal capacity. The filter apparatus includes a filter for removing impurities from a gas and a temperature adjuster for adjusting the temperature of the gas to a predetermined temperature. The filter apparatus further includes a humidity detector, arranged at the upstream side of the filter, for adjusting the humidity of the gas before the gas passes through the filter.

Abstract: A filter apparatus for improving gas temperature stability while maintaining a high impurity removal capacity. The filter apparatus includes a filter for removing impurities from a gas and a temperature adjuster for adjusting the temperature of the gas to a predetermined temperature. The filter apparatus further includes a humidity detector, arranged at the upstream side of the filter, for adjusting the humidity of the gas before the gas passes through the filter.

Abstract: A chemical filter, which removes chemical pollutants from gas and controls temperature fluctuation of the gas before and after passing through the filter to within a predetermined range, is arranged in a portion of a ventilation path extending from a machine chamber housing at least a portion of an air conditioning unit to a main body chamber housing an exposure apparatus main body. Accordingly, the atmosphere around the exposure apparatus main body arranged downstream of the chemical filter is kept chemically clean, and the temperature fluctuation of the gas, of which the temperature is set to a target temperature by the air conditioner, after passing through the chemical filter is limited. That is, occurrence of a problem such as an illumination reduction caused by tarnish of optical members and an increase of the temperature fluctuation amount of the gas supplied into the main body chamber can be effectively limited.

Abstract: A chemical filter, which removes chemical pollutants from gas and controls temperature fluctuation of the gas before and after passing through the filter to within a predetermined range, is arranged in a portion of a ventilation path extending from a machine chamber housing at least a portion of an air conditioning unit to a main body chamber housing an exposure apparatus main body. Accordingly, the atmosphere around the exposure apparatus main body arranged downstream of the chemical filter is kept chemically clean, and the temperature fluctuation of the gas, of which the temperature is set to a target temperature by the air conditioner, after passing through the chemical filter is limited. That is, occurrence of a problem such as an illumination reduction caused by tarnish of optical members and an increase of the temperature fluctuation amount of the gas supplied into the main body chamber can be effectively limited.

Abstract: Thermal infrared sensors are disclosed for the detection of an incident infrared flux. The sensors include an absorber each including an absorption layer and a thermal sensing element. The incident infrared flux is absorbed by the absorption layer. Heat generated by the absorption is detected by the thermal sensing element such as a thermistor. The absorber is supported above a substrate by supports and bridges, reducing heat transfer from the absorber to the substrate. The supports and bridges include electrical connections to the absorber and the substrate. The supports and bridges are located beneath the absorber so that a large proportion of the area of the absorber is available to absorb the incident flux. Imaging devices including arrays of such sensors and fabrication methods for the sensors and imaging devices are also disclosed.