Patents by Inventor Kenji Yao

Kenji Yao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20030099027
    Abstract: The present invention provides a display element, which is driven at a low voltage, displays a high-contrast image with few density irregularities, and has improved image holding property. In a display element, which displays an image by moving, between a first and second substrate, particles having different colors and charge polarities by an electric field applied between the first and second substrates, the surface roughness of at least one of the substrates is 1 nm to 1 &mgr;m, the coefficient of shape is 100 to 140, the width and depth of the recessed part are not identical to the diameter of the particles and the contacting parts of the recessed part and the particles do not form a surface.
    Type: Application
    Filed: August 20, 2002
    Publication date: May 29, 2003
    Applicant: FUJI XEROX CO., LTD.
    Inventors: Kiyoshi Shigehiro, Kiyokazu Mashimo, Kenji Yao, Hiroshi Miyamoto, Kyoko Nishikawa, Yasufumi Suwabe, Yoshinori Machida, Takeshi Matsunaga, Yoshiro Yamaguchi, Motohiko Sakamaki, Katsumi Nukada
  • Publication number: 20030094725
    Abstract: A polymer compound contains a cyclic structure represented by the following general formula (1): 1
    Type: Application
    Filed: December 14, 2001
    Publication date: May 22, 2003
    Applicant: FUJI XEROX CO., LTD.
    Inventor: Kenji Yao
  • Publication number: 20030054271
    Abstract: An electrophotographic photoreceptor that can sufficiently prevent occurrence of filming, whereby defects on an image can be sufficiently prevented, and an electrophotographic process cartridge and an electrophotographic apparatus using the electrophotographic photoreceptor are to be provided. The electrophotographic photoreceptor contains an electroconductive substrate having provided thereon a photosensitive layer, and an outermost layer of the photosensitive layer has a dynamic hardness of about from 13.0×109 to 100.0×109 N/m2. According to the invention, occurrence of flaws on the surface of the photoreceptor can be sufficiently prevented, and cracking of a member made in contact with the photoreceptor can also be sufficiently prevented. Therefore, occurrence of filming is sufficiently prevented, and occurrence of defects on an image is also sufficiently prevented.
    Type: Application
    Filed: December 13, 2001
    Publication date: March 20, 2003
    Applicant: FUJI XEROX CO., LTD.
    Inventors: Kenji Yao, Wataru Yamada, Kazuhiro Koseki, Katsumi Nukada
  • Patent number: 6255031
    Abstract: In a film or panel having excellent near-infrared absorbability and excellent near-infrared shieldability, and having a high degree of visible ray transmittance and good color tone, in order to produce the near-infrared-absorbing film or panel having good color tone while the near-infrared-absorbing dye disposed therein is kept stable, the dye and the binder resin for the dye are specifically selected, and the production method is also specifically selected. In addition, for the purpose of producing the film or panel while the dye disposed therein is kept stable and for the purpose of making the film or panel have additional functions such as electromagnetic radiation absorbability, the film or panel is made to have a multi-layered structure.
    Type: Grant
    Filed: March 10, 1999
    Date of Patent: July 3, 2001
    Assignee: Kanebo, Ltd.
    Inventors: Kenji Yao, Masahiro Koike, Yasuko Suzuki, Kazuo Sakurai, Takashi Indo, Kouei Igarashi
  • Patent number: 6136946
    Abstract: Provided are a process for producing a high-molecular-weight polycarbonate, which comprises polymerizing a diol and a carbonate diester through transesterification with heating in the presence of a basic oxide catalyst, and an electrophotographic photoreceptor containing this high-molecular-weight polycarbonate as a binder resin. This process can easily produce the high-molecular-weight polycarbonate safely without having an adverse effect on humans and environment. This electrophotographic photoreceptor can provide a high-quality image having a high stability at high speed over a long period of time.
    Type: Grant
    Filed: May 26, 1999
    Date of Patent: October 24, 2000
    Assignee: Fuji Xerox Co., Ltd.
    Inventors: Kenji Yao, Masahiko Miyamoto, Ichiro Takegawa, Michiko Aida
  • Patent number: 6066711
    Abstract: A polyester polymer includes a dicarboxylic acid or its ester-forming derivative and a dihydroxy compound, in which the dicarboxylic acid contains an alicyclic dicarboxylic acid and optionally an aromatic dicarboxylic acid, and the dihydroxy compound contains a compound of formula (1): ##STR1## wherein R.sub.1 represents a C.sub.1-4 alkylene group; and R.sub.2, R.sub.3, R.sub.4 and R.sub.5 each represents a hydrogen atom, a C.sub.1-4 alkyl group, an aryl group or an aralkyl group which may be the same or different. Also, polyester moldings of disc substrates, lenses, sheets, films, tubes or fibers are produced by molding the polyester polymer. The polyester polymer has excellent transparency, excellent heat resistance, extremely low optical anisotropy and excellent moldability.
    Type: Grant
    Filed: August 4, 1998
    Date of Patent: May 23, 2000
    Assignee: Kanebo, Ltd.
    Inventors: Makoto Hanazawa, Michiaki Fuji, Kazuo Sakurai, Kenji Yao
  • Patent number: 5970722
    Abstract: An air conditioning apparatus includes a compressor, an interior side heat exchanger, an exterior side heat exchanger, an expansion device provided between the interior side heat exchanger and the exterior side heat exchanger, a four-way valve provided between the compressor and the interior side heat exchanger and between the compressor and the exterior side heat exchanger, an oil separator provided between a delivery outlet of the compressor and the four-way valve, a first restrictor and a second restrictor provided between the oil separator and a suction inlet of the compressor, and an open-close valve provided between the second restrictor and the suction inlet of the compressor.
    Type: Grant
    Filed: December 11, 1997
    Date of Patent: October 26, 1999
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Etsuo Shibata, Katsuhiro Wakahara, Kenji Yao
  • Patent number: 5530086
    Abstract: Provided is a polyester from 9,9-bis[4-(2-hydroxyethoxy)phenyl]fluorenes as a diol component, and this novel polymer is excellent in transparency and heat resistance, has small optical anisotropy, is excellent in moldability, dimensional stability and chemical resistance and is industrially suitable for use in the fields of optical materials, fibers, films and sheets.
    Type: Grant
    Filed: January 25, 1995
    Date of Patent: June 25, 1996
    Assignee: Kanebo, Ltd.
    Inventors: Michiaki Fuji, Kenji Yao, Koei Igarashi, Toshihiro Kushimoto
  • Patent number: 5192989
    Abstract: A lateral DMOS FET device which has a small on resistance. The device includes a cell structure formed by a plurality of unit cells, each unit cell including: a source region of first conduction type formed on one side of a substrate of first conduction type; a channel region of second conduction type formed around the source region; and a plurality of drain contact regions of first conduction type located around the channel region; and a source electrode, a gate electrode, and a drain electrode, all of which are formed on the same one side of the substrate. Alternatively, each unit cell may includes: a drain contact region of first conduction type formed on one side of a substrate of first conduction type; a channel region of second conduction type formed around the drain contact region; and a plurality of source regions of first conduction type located around the channel region.
    Type: Grant
    Filed: November 27, 1990
    Date of Patent: March 9, 1993
    Assignee: Nissan Motor Co., Ltd.
    Inventors: Tsutomu Matsushita, Teruyoshi Mihara, Masakatsu Hoshi, Kenji Yao
  • Patent number: 5184204
    Abstract: A semiconductor device in which the breakdown voltages of the cell unit and the guard ring can easily be matched, and the surge endurance of the device can be improved. This semiconductor device includes a guard ring region surrounding the cell diffusion layers which is formed from an array of a plurality of guard ring cells, where each of the guard ring cells is identical to each of the cell diffusion layers and the guard ring cells are electrically connected mutually, so that the diffusion depths of each of the cells of the guard ring region and the cell diffusion layers are identical, and consequently the breakdown voltages for the guard ring region and the cell diffusion layers can be made equal to each other.
    Type: Grant
    Filed: January 24, 1991
    Date of Patent: February 2, 1993
    Assignee: Nissan Motor Co., Ltd.
    Inventors: Teruyoshi Mihara, Tsutomu Matsushita, Kenji Yao, Masakatsu Hoshi, Yutaka Enokido, Yukitsugu Hirota
  • Patent number: 5049953
    Abstract: A semiconductor device includes a semiconductor substrate of a first conductivity type, in which a drain region is formed in the substrate, and a gate electrode is formed on the surface of the substrate via an insulating film formed thereon. A Schottky metal as a source region is formed in the surface of the substrate away from the drain region, the Schottky metal and the substrate constituting a Schottky junction at an interface therebetween near the gate electrode. A shield layer of a second conductivity type is interposed between the Schottky metal and the substrate except in the Schottky junction. The gate electrode controls tunnel current at the Schottky junction.
    Type: Grant
    Filed: January 18, 1990
    Date of Patent: September 17, 1991
    Assignee: Nissan Motor Co., Ltd.
    Inventors: Teruyoshi Mihara, Kenji Yao, Tsutomu Matsushita, Yoshinori Murakami
  • Patent number: 5040034
    Abstract: A semiconductor device includes a semiconductor substrate as a drain region. A metal source region is located on a first surface of the substrate. The metal and the substrate constitute a Schottky junction. An insulated gate, including a gate electrode and an insulating film surrounding the gate electrode, is adjacent to the Schottky junction, such that angle formed by the Schottky junction and the insulated gate in the substrate is an acute angle. A part of the Schottky metal can be buried in the form of a pillar in the substrate, and a channel region of the Schottky junction can be formed on the pillar near the insulated gate.
    Type: Grant
    Filed: January 18, 1990
    Date of Patent: August 13, 1991
    Assignee: Nissan Motor Co., Ltd.
    Inventors: Yoshinori Murakami, Teruyoshi Mihara, Tsutomu Matsushita, Kenji Yao, Norihiko Kiritani
  • Patent number: 4937639
    Abstract: An input protector device for a semiconductor device such as a CMOS device, in which a first resistor is formed on an insulating film of a semiconductor substrate, and a second resistor is formed of an impurity diffusion region in the substrate, the first and second resistors and a capacitor being coupled to one another in series to constitute a filter circuit, and in which first and second diodes each cooperated with at least one of the first and second resistors, by-passing noises having low and high voltages, respectively, and a high frequency noise is cut by the filter circuit, thereby effectively preventing latchup.
    Type: Grant
    Filed: October 14, 1988
    Date of Patent: June 26, 1990
    Assignee: Nissan Motor Company, Limited
    Inventors: Kenji Yao, Teruyoshi Mihara, Noriyuki Abe, Tsutomu Matsushita
  • Patent number: 4920396
    Abstract: In order to improve latchup withstanding capability, a CMOS device is provided with at least one recombination layer which is buried in either or both substrate regions of a pMOS and a nMOS at such a position that a depletion layer formed at a pn junction between both substrate regions of the pMOS and nMOS does not reach the recombination layer. The recombination layer is a polycrystalline silicon or amorphous silicon layer having plentiful carrier recombination centers, or a layer having plentiful traps formed by ion implantation, or a layer of a compound semiconductor having a small band gap.
    Type: Grant
    Filed: April 8, 1988
    Date of Patent: April 24, 1990
    Assignee: Nissan Motor Company, Limited
    Inventors: Toshiro Shinohara, Teruyoshi Mihara, Kenji Yao
  • Patent number: 4805008
    Abstract: A semiconductor device such as a CMOS is provided with highly doped polycrystalline silicon regions for preventing undesired operations of parasitic transistors. Each polycrystalline region is extended deeper from a top surface of the silicon chip than source and drain regions of MOS transistors. In a substrate region of each MOS, one polycrystalline region of the same conductivity type as the substrate region is formed near the source region, and connected with said source region so that the polycrystalline region is held equipotential with the source region.
    Type: Grant
    Filed: June 22, 1987
    Date of Patent: February 14, 1989
    Assignee: Nissan Motor Co., Ltd.
    Inventors: Kenji Yao, Teruyoshi Mihara