Patents by Inventor Kenji Yokoshima

Kenji Yokoshima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6740171
    Abstract: A foreign-matter removal capacity is improved in a cleaning process. When a wafer is cleaned while a brush is moved from the center of the wafer toward the outer circumference thereof, a discharge flow rate of cleaning liquid flowing into the brush is regulated so that the interval between the brush and the wafer is kept constant.
    Type: Grant
    Filed: February 27, 2002
    Date of Patent: May 25, 2004
    Assignee: Renesas Technology Corp.
    Inventors: Yutaka Shimada, Yasuhiro Mori, Koyo Morita, Kenji Yokoshima
  • Publication number: 20030041878
    Abstract: A foreign-matter removal capacity is improved in a cleaning process. When a wafer is cleaned while a brush is moved from the center of the wafer toward the outer circumference thereof, a discharge flow rate of cleaning liquid flowing into the brush is regulated so that the interval between the brush and the wafer is kept constant.
    Type: Application
    Filed: February 27, 2002
    Publication date: March 6, 2003
    Applicant: Hitachi, Ltd.
    Inventors: Yutaka Shimada, Yasuhiro Mori, Koyo Morita, Kenji Yokoshima