Abstract: A moving device (70) determines an obstacle virtual existence region (72) of a simple graphic approximating a detected obstacle (71) to detect the obstacle (71) in a real time and determine a smooth avoidance path by calculation, thereby performing collision prediction.

Abstract: A moving device (70) determines an obstacle virtual existence region (72) of a simple graphic approximating a detected obstacle (71) to detect the obstacle (71) in a real time and determine a smooth avoidance path by calculation, thereby performing collision prediction.

Abstract: A charged particle beam scanning inspecting apparatus for irradiating a charged particle beam, fetching information of a subject to be inspected at a predetermined beam scanning position and performing an inspection by processing the information. The apparatus is a measurer which measures a scanning position of the beam and an inspection position on said inspection subject to calculate beam target coordinates corrected for an apparatus error, an error correction constant and a deflected distortion correction constant, and a deflection controller for scanning the beam. The deflection controller includes a deflection position operating circuit for performing an operation of the inspection position in a deflection coordinate system, a deflected distortion operating circuit. The deflection position operating circuit and deflected distortion operating circuit are constructed in a pipe line fashion.

Abstract: In order that the deflection scanning position can be corrected at a time point within a period for fetching information from a subject to be inspected and improvements in accuracy of chip comparison inspection and an inspection near the wafer outer periphery where distortion is large can be assured by correcting the inspection position and biased distortion at a high speed with high accuracy, a digital deflection control scheme is employed in which the deflection scanning signal and correction are all calculated digitally in a deflection controller for deflecting and controlling a charged particle beam irradiated onto a subject to be inspected and the digital value is sequentially converted into an analog value by a time-series train of digital control signal to form a deflection scanning waveform.

Abstract: In order that the deflection scanning position can be corrected at a time point within a period for fetching information from a subject to be inspected and improvements in accuracy of chip comparison inspection and an inspection near the wafer outer periphery where distortion is large can be assured by correcting the inspection position and biased distortion at a high speed with high accuracy, a digital deflection control scheme is employed in which the deflection scanning signal and correction are all calculated digitally in a deflection controller for deflecting and controlling a charged particle beam irradiated onto a subject to be inspected and the digital value is sequentially converted into an analog value by a time-series train of digital control signal to form a deflection scanning waveform.

Abstract: The present invention aims to prevent degradation in performance due to a change in image quality and deflection distortions or the like in the vicinity of both ends of a scan area and detect a defect in a sample such as a semiconductor wafer or the like with high accuracy when the defect is inspected by use of an electron beam image, and allow a monitor to confirm an image area to be checked. The present invention is provided with means for comparing and checking defects in the sample, based on an image signal in which the neighborhoods of both ends of horizontal and vertical scan areas are respectively deleted under control of a blanking signal and a vertical synchronizing signal.

Abstract: The present invention aims to prevent degradation in performance due to a change in image quality and deflection distortions or the like in the vicinity of both ends of a scan area and detect a defect in a sample such as a semiconductor wafer or the like with high accuracy when the defect is inspected by use of an electron beam image, and allow a monitor to confirm an image area to be checked. The present invention is provided with means for comparing and checking defects in the sample, based on an image signal in which the neighborhoods of both ends of horizontal and vertical scan areas are respectively deleted under control of a blanking signal and a vertical synchronizing signal.

Abstract: Crystals of 3-?2-?4-(3-chloro-2-methylphenyl)-1-piperazinyl!ethyl!-5,6-dimethoxy-1-(4- imidazolylmethyl)-1H-indazole dihydrochloride which is a hydrate for pharmaceutical use having excellent characteristics as a pharmaceutical material that has high storage stability and which substantially has specified X-ray diffraction characteristics, more particularly, the dihydrochloride is 3.5-hydrate.

Abstract: A compound represented by formula (I): ##STR1## wherein Q represents an aryl group, a heterocyclic group, a diarylmethyl group, an aralkyl group composed of an aryl group and an alkylene group, an alkyl group or a cycloalkyl group, in which the aryl group, heterocyclic group, and the aryl moiety of the diarylmethyl group and aralkyl group may be substituted with one or more substituents; R represents a bicyclic, substituted, nitrogen-containing heterocyclic group or a substituted phenyl group, in which the nitrogen-containing heterocyclic group is composed of a 5-membered, substituted, aromatic or saturated ring containing one or two nitrogen atoms and a 6-membered ring; and Z represents an alkylene group, an alkenylene group, an alkylene group, a carbonyl group, an alkylene group containing a carbonyl group or an oxalyl group, or a salt thereof.