Patents by Inventor Kenneth A. P. Meyer
Kenneth A. P. Meyer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12208483Abstract: An article includes a polishing layer that includes a plurality of raised cells separated by a plurality of channels. Each of the plurality of raised cells includes a microstructured working surface, a substantially vertical channel surface, and an offset surface between an edge of the working surface and an upper edge of the channel surface. The microstructured working surface includes a plurality of microstructures. Tops of the plurality of microstructures define a top plane and bases of the plurality of microstructures define a base plane. The substantially vertical channel surface defines a wall of a channel of the plurality of channels and the channel surface defines a channel plane. The offset surface includes a nonplanar portion of displaced material. The displaced material defines a displacement plane that is below the base plane or within a tolerance of the top plane.Type: GrantFiled: August 2, 2018Date of Patent: January 28, 2025Assignee: 3M INNOVATIVE PROPERTIES COMPANYInventors: Kenneth A. P. Meyer, John J. Sullivan, Brian W. Lueck, Duy K. Lehuu, David J. Muradian, David F. Slama
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Publication number: 20250016916Abstract: A patterned article includes a unitary polymeric layer and a plurality of electrically conductive elements embedded at least partially in the unitary polymeric layer. Each electrically conductive element includes a conductive seed layer having a top major surface and an opposite bottom major surface in direct contact with the unitary polymeric layer, and includes a metallic body disposed on the top major surface of the conductive seed layer. The metallic body has a bottom major surface and at least one sidewall. The bottom major surface contacts the conductive seed layer. Each sidewall is in direct contact with the unitary polymeric layer and extends from the bottom major surface of the metallic body toward or to, but not past, a top major surface of the unitary polymeric layer. The conductive elements may be electrically isolated from one another. Processes for making the patterned article are described.Type: ApplicationFiled: September 23, 2024Publication date: January 9, 2025Inventors: Raymond P. Johnston, John J. Sullivan, Matthew C. Messina, Charles D. Hoyle, Jaewon Kim, Haiyan Zhang, Matthew S. Stay, Robert A. Sainati, Kevin W. Gotrik, Kenneth A.P. Meyer, Gregory L. Abraham, Joseph C. Carls, Douglas S. Dunn
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Publication number: 20240411061Abstract: A light control film includes a two-dimensional array of projections arranged across the light control film. A square of a magnitude of a Fourier transform frequency spectrum of the projections includes a plurality of distinct peaks separated by one or more valleys. The peaks and the one or more valleys have respective averages Pavg and Vavg, Pavg/Vavg?5, such that when light from a substantially Lambertian light source is incident on the light control film, the light control film transmits the incident light with the transmitted light propagating along a transmission axis and having an intensity profile having a full width at half maximum of less than about 120 degrees in each cross-section of the intensity profile that comprises the transmission axis.Type: ApplicationFiled: October 17, 2022Publication date: December 12, 2024Inventors: Raymond J. Kenney, Yehuda E. Altabet, John M. DeSutter, Kenneth A.P. Meyer, Nicholas C. Erickson, Martin B. Wolk, James M. Nelson, Daniel J. Schmidt, Caleb T. Nelson
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Patent number: 12133327Abstract: A patterned article includes a unitary polymeric layer and a plurality of electrically conductive elements embedded at least partially in the unitary polymeric layer. Each electrically conductive element includes a conductive seed layer having a top major surface and an opposite bottom major surface in direct contact with the unitary polymeric layer, and includes a metallic body disposed on the top major surface of the conductive seed layer. The metallic body has a bottom major surface and at least one sidewall. The bottom major surface contacts the conductive seed layer. Each sidewall is in direct contact with the unitary polymeric layer and extends from the bottom major surface of the metallic body toward or to, but not past, a top major surface of the unitary polymeric layer. The conductive elements may be electrically isolated from one another. Processes for making the patterned article are described.Type: GrantFiled: May 5, 2020Date of Patent: October 29, 2024Assignee: 3M INNOVATIVE PROPERTIES COMPANYInventors: Raymond P. Johnston, John J. Sullivan, Matthew C. Messina, Charles D. Hoyle, Jaewon Kim, Haiyan Zhang, Matthew S. Stay, Robert A. Sainati, Kevin W. Gotrik, Kenneth A. P. Meyer, Gregory L. Abraham, Joseph C. Carls, Douglas S. Dunn
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Publication number: 20240306290Abstract: A patterned conductive article includes a substrate having a first groove therein; a conductive seed layer disposed in the first groove; and a unitary conductive body disposed at least partially in the first groove. The conductive seed layer covers at least a majority of a bottom surface of the first groove, and the unitary conductive body covers the conductive seed layer and at least a majority of side surfaces of the first groove. In a plane through the unitary conductive body that is parallel to and separate from the conductive seed layer, the unitary conductive body has a lower first line edge roughness at a first interface with the side surfaces and the conductive seed layer has a higher second line edge roughness at an edge of the conductive seed layer.Type: ApplicationFiled: May 14, 2024Publication date: September 12, 2024Inventors: Raymond P. Johnston, Kevin W. Gotrik, John J. Sullivan, Kenneth A.P. Meyer, Joseph C. Carls, Haiyan Zhang, Gregory L. Abraham, Matthew S. Stay
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Patent number: 12048092Abstract: A patterned conductive article 200 includes a substrate 210 including a unitary layer 210-1 and includes a micropattern of conductive traces 220 embedded at least partially in the unitary layer. Each conductive trace extends along a longitudinal direction (y-direction) of the conductive trace and includes a conductive seed layer 230 having a top major surface 232 and an opposite bottom major surface 234 in direct contact with the unitary layer; and a unitary conductive body 240 disposed on the top major surface of the conductive seed layer. The unitary conductive body and the conductive seed layer differ in at least one of composition or crystal morphology. The unitary conductive body has lateral sidewalls 242, 244 and at least a majority of a total area of the lateral sidewalls is in direct contact with the unitary layer.Type: GrantFiled: May 5, 2020Date of Patent: July 23, 2024Assignee: 3M INNOVATIVE PROPERTIES COMPANYInventors: Raymond P. Johnston, Kevin W. Gotrik, John J. Sullivan, Kenneth A. P. Meyer, Joseph C. Carls, Haiyan Zhang, Gregory L. Abraham, Matthew S. Stay
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Publication number: 20220221624Abstract: Light control films comprise a light input surface and alight output surface opposite the light input surface and alternating transmissive regions and absorptive regions disposed between the light input surface and the light output surface. The absorptive regions have an aspect ratio of at least 30 and are canted in the same direction. The alternating transmissive regions and absorbing regions have a maximum relative transmission at a viewing angle other than 0 degrees.Type: ApplicationFiled: June 11, 2020Publication date: July 14, 2022Inventors: Raymond J. Kenney, Owen M. Anderson, Kevin W. Gotrik, Nicholas A. Johnson, Kenneth A. P. Meyer, Caleb T. Nelson, Daniel J. Schmidt
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Publication number: 20220183153Abstract: A patterned article includes a unitary polymeric layer and a plurality of electrically conductive elements embedded at least partially in the unitary polymeric layer. Each electrically conductive element includes a conductive seed layer having a top major surface and an opposite bottom major surface in direct contact with the unitary polymeric layer, and includes a metallic body disposed on the top major surface of the conductive seed layer. The metallic body has a bottom major surface and at least one sidewall. The bottom major surface contacts the conductive seed layer. Each sidewall is in direct contact with the unitary polymeric layer and extends from the bottom major surface of the metallic body toward or to, but not past, a top major surface of the unitary polymeric layer. The conductive elements may be electrically isolated from one another. Processes for making the patterned article are described.Type: ApplicationFiled: May 5, 2020Publication date: June 9, 2022Inventors: Raymond P. Johnston, John J. Sullivan, Matthew C. Messina, Charles D. Hoyle, Jaewon Kim, Haiyan Zhang, Matthew S. Stay, Robert A. Sainati, Kevin W. Gotrik, Kenneth A.P. Meyer, Gregory L. Abraham, Joseph C. Carls, Douglas S. Dunn
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Publication number: 20220167499Abstract: A patterned conductive article 200 includes a substrate 210 including a unitary layer 210-1 and includes a micropattern of conductive traces 220 embedded at least partially in the unitary layer. Each conductive trace extends along a longitudinal direction (y-direction) of the conductive trace and includes a conductive seed layer 230 having a top major surface 232 and an opposite bottom major surface 234 in direct contact with the unitary layer; and a unitary conductive body 240 disposed on the top major surface of the conductive seed layer. The unitary conductive body and the conductive seed layer differ in at least one of composition or crystal morphology. The unitary conductive body has lateral sidewalls 242, 244 and at least a majority of a total area of the lateral sidewalls is in direct contact with the unitary layer.Type: ApplicationFiled: May 5, 2020Publication date: May 26, 2022Inventors: Raymond P. Johnston, Kevin W. Gotrik, John J. Sullivan, Kenneth A.P. Meyer, Joseph C. Carls, Haiyan Zhang, Gregory L. Abraham, Matthew S. Stay
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Publication number: 20210271003Abstract: An optical element including an array of microlenses, a pinhole mask, and a wavelength selective filter is described. The pinhole mask includes an array of pinholes with each pinhole in the array of pinholes aligned with a microlens in the first array of microlenses. The wavelength selective filter is adapted to transmit a first light ray having a first wavelength and transmitted from a first microlens in the array of microlenses through a first pinhole in the array of pinholes aligned with the first microlens, and to attenuate a second light ray having the first wavelength and transmitted from the first microlens through a second pinhole in the array of pinholes aligned with a second microlens in the first array of microlenses adjacent to the first microlens.Type: ApplicationFiled: August 8, 2019Publication date: September 2, 2021Inventors: Zhaohui Yang, Przemyslaw P. Markowicz, John A. Wheatley, Qingbing Wang, Mark A. Roehrig, Tri D. Pham, Serena L. Schleusner, Kenneth A.P. Meyer, Levent Biyikli, Thomas V. Weigman
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Publication number: 20200164484Abstract: An article includes a polishing layer that includes a plurality of raised cells separated by a plurality of channels. Each of the plurality of raised cells includes a microstructured working surface, a substantially vertical channel surface, and an offset surface between an edge of the working surface and an upper edge of the channel surface. The microstructured working surface includes a plurality of microstructures. Tops of the plurality of microstructures define a top plane and bases of the plurality of microstructures define a base plane. The substantially vertical channel surface defines a wall of a channel of the plurality of channels and the channel surface defines a channel plane. The offset surface includes a nonplanar portion of displaced material. The displaced material defines a displacement plane that is below the base plane or within a tolerance of the top plane.Type: ApplicationFiled: August 2, 2018Publication date: May 28, 2020Inventors: Kenneth A.P. Meyer, John J. Sullivan, Brian W. Lueck, Duy K. Lehuu, David J. Muradian, David F. Slama
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Patent number: 10252396Abstract: The present disclosure relates to polishing pads which include a polishing layer, wherein the polishing layer includes a working surface and a second surface opposite the working surface. The working surface includes at least one of a plurality of precisely shaped pores and a plurality of precisely shaped asperities. The present disclosure further relates to a polishing system, the polishing system includes the preceding polishing pad and a polishing solution. The present disclosure relates to a method of polishing a substrate, the method of polishing including: providing a polishing pad according to any one of the previous polishing pads; providing a substrate, contacting the working surface of the polishing pad with the substrate surface, moving the polishing pad and the substrate relative to one another while maintaining contact between the working surface of the polishing pad and the substrate surface, wherein polishing is conducted in the presence of a polishing solution.Type: GrantFiled: March 31, 2015Date of Patent: April 9, 2019Assignee: 3M INNOVATIVE PROPERTIES COMPANYInventors: Duy K. Lehuu, Kenneth A. P. Meyer, Moses M. David
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Patent number: 10105524Abstract: The present application provides articles (10) having a polymeric substrate (12) with a plurality of solid and/or hollow microneedles (20) extending therefrom. Each solid microneedle is formed by a molding process and the microneedle has body with first (30) and second cavities (40) extending therein. The hollow microneedles are formed by removing a portion of the polymeric material disposed between the first cavity and the second cavity. A method for determining the location of a microneedle in an article comprising solid microneedles is also provided. The method comprises directing electromagnetic radiation toward an article comprising a plurality of microneedles and imaging the article.Type: GrantFiled: December 13, 2013Date of Patent: October 23, 2018Assignee: 3M Innovative Properties CompanyInventors: Kenneth A. P. Meyer, Przemyslaw P. Markowicz, Stanley Rendon, Robert L. W. Smithson, Ryan Patrick Simmers
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Patent number: 10071461Abstract: The present disclosure relates to polishing pads which include a polishing layer, wherein the polishing layer includes a working surface and a second surface opposite the working surface. The working surface includes a plurality of precisely shaped pores, a plurality of precisely shaped asperities and a land region. The present disclosure further relates to a polishing system, the polishing system includes the preceding polishing pad and a polishing solution. The present disclosure relates to a method of polishing a substrate, the method of polishing including: providing a polishing pad according to any one of the previous polishing pads; providing a substrate, contacting the working surface of the polishing pad with the substrate surface, moving the polishing pad and the substrate relative to one another while maintaining contact between the working surface of the polishing pad and the substrate surface, wherein polishing is conducted in the presence of a polishing solution.Type: GrantFiled: March 31, 2015Date of Patent: September 11, 2018Assignee: 3M INNOVATIVE PROPERTIES COMPANYInventors: Duy K. Lehuu, Kenneth A. P. Meyer, Moses M. David
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Publication number: 20180032181Abstract: Force-sensing capacitor elements and deformable membranes useful in electronic devices that include touch screen displays or other touch sensors. The deformable membranes, generally, include a first, second, and third layers with a first arrangement of a plurality of first structures interposed between the first and third layers and a second arrangement of one or more second structures interposed between the second and third layers. Electrodes may be included proximate to or in contact with one or more of the major surfaces of the first, second, and third layers or embedded within one or more of the second and third layers of the deformable membranes, yielding force-sensing capacitor elements. The electrodes proximate to or in contact with the one or more of the major surfaces of the first and second layers or embedded within one or more of the second and third layers may be one or more plurality of electrodes.Type: ApplicationFiled: October 9, 2017Publication date: February 1, 2018Inventors: Matthew H. Frey, Brian W. Lueck, Kenneth A. P. Meyer
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Publication number: 20170182629Abstract: The present disclosure relates to polishing pads which include a polishing layer, wherein the polishing layer includes a working surface and a second surface opposite the working surface. The working surface includes a plurality of precisely shaped pores, a plurality of precisely shaped asperities and a land region. The present disclosure further relates to a polishing system, the polishing system includes the preceding polishing pad and a polishing solution. The present disclosure relates to a method of polishing a substrate, the method of polishing including: providing a polishing pad according to any one of the previous polishing pads; providing a substrate, contacting the working surface of the polishing pad with the substrate surface, moving the polishing pad and the substrate relative to one another while maintaining contact between the working surface of the polishing pad and the substrate surface, wherein polishing is conducted in the presence of a polishing solution.Type: ApplicationFiled: March 31, 2015Publication date: June 29, 2017Inventors: Duy K. Lehuu, Kenneth A.P. Meyer, Moses M. David
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Publication number: 20170173758Abstract: The present disclosure relates to polishing pads which include a polishing layer, wherein the polishing layer includes a working surface and a second surface opposite the working surface. The working surface includes at least one of a plurality of precisely shaped pores and a plurality of precisely shaped asperities. The present disclosure further relates to a polishing system, the polishing system includes the preceding polishing pad and a polishing solution. The present disclosure relates to a method of polishing a substrate, the method of polishing including: providing a polishing pad according to any one of the previous polishing pads; providing a substrate, contacting the working surface of the polishing pad with the substrate surface, moving the polishing pad and the substrate relative to one another while maintaining contact between the working surface of the polishing pad and the substrate surface, wherein polishing is conducted in the presence of a polishing solution.Type: ApplicationFiled: March 31, 2015Publication date: June 22, 2017Applicant: 3M INNOVATIVE PROPERTIES COMPANYInventors: Duy K. Lehuu, Kenneth A.P. Meyer, Moses M. David
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Publication number: 20170177114Abstract: Force-sensing capacitor elements and deformable membranes useful in electronic devices that include touch screen displays or other touch sensors. The deformable membranes, generally, include a first, second, and third layers with a first arrangement of a plurality of first structures interposed between the first and third layers and a second arrangement of one or more second structures interposed between the second and third layers. Electrodes may be included proximate to or in contact with one or more of the major surfaces of the first, second, and third layers or embedded within one or more of the second and third layers of the deformable membranes, yielding force-sensing capacitor elements. The electrodes proximate to or in contact with the one or more of the major surfaces of the first and second layers or embedded within one or more of the second and third layers may be one or more plurality of electrodes.Type: ApplicationFiled: August 6, 2015Publication date: June 22, 2017Inventors: Matthew H. Frey, Brian W. Lueck, Kenneth A. P. Meyer
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Publication number: 20160245486Abstract: The present disclosure describes advanced lighting elements, in particular solid-state lighting elements, and luminaires that include an array of lighting elements. The lighting elements, and luminaires including the lighting elements can exhibit benefits that include high optical efficiency and therefore high luminous efficacy; extraordinary directional control and therefore extraordinary glare control and efficacy of delivered lumens; and exceptional mixing of individual-device emission providing exceptional suppression of punch-through and color breakup. In many cases, the architecture can be amenable to low-cost manufacturing in a modular format.Type: ApplicationFiled: October 15, 2014Publication date: August 25, 2016Inventors: David G. Freier, Michael A. Meis, Thomas R. Hoffend, Jr., Anthony J. Piekarczyk, Scott E. Simons, Matthew M. Philippi, Kenneth A. P. Meyer
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Patent number: 9329311Abstract: The present disclosure provides a light control film that is capable of transmitting light, or allowing a viewer to observe information, only within a viewing region centered around the normal (perpendicular line) to a surface. The light control film generally blocks information or light outside of this viewing region, and provides security in all directions including right-and-left and up-and-down of the film. The light control film includes a plurality of light-transmissive cavities that are surrounded by a light absorbing material, such that each of the plurality of cavities is optically isolated from adjacent cavities. Each of the light-transmissive cavities effectively block light which enters the cavity outside of a viewing (that is, cutoff) angle.Type: GrantFiled: May 24, 2012Date of Patent: May 3, 2016Assignee: 3M INNOVATIVE PROPERTIES COMPANYInventors: Kurt J. Halverson, Raymond J. Kenney, Brian W. Lueck, Kenneth A.P. Meyer, Scott M. Tapio, Michael E. Lauters, Olester Benson, Jr., Gary E. Gaides