Abstract: The present invention provides doped titania-doped silica glass articles having low thermal expansions and low variations in thermal expansion. According to one embodiment of the invention, a titania-doped silica glass article has a titania content of between about 5 wt % and about 9 wt %; a coefficient of thermal expansion of between about ?30 ppb/° C. and about +30 ppb/° C. at a temperature between 15° C. and 30° C.; and a variation in coefficient of thermal expansion of less than about 5 ppb/° C. at a temperature between 15° C. and 30° C.

Abstract: Disclosed are high purity synthetic silica glass material having a high OH concentration homogeneity in a plane perpendicular to the optical axis, and process of making the same. The glass has high refractive index homogeneity. The glass can have high internal transmission of at least 99.65%/cm at 193 nm. The process does not require a post-sintering homogenization step. The controlling factors for high compositional homogeneity, thus high refractive index homogeneity, include high initial local soot density uniformity in the soot preform and slow sintering, notably isothermal treatment during consolidation.

Abstract: The present invention provides doped titania-doped silica glass articles having low thermal expansions and low variations in thermal expansion. According to one embodiment of the invention, a titania-doped silica glass article has a titania content of between about 5 wt % and about 9 wt %; a coefficient of thermal expansion of between about ?30 ppb/° C. and about +30 ppb/° C. at a temperature between 15° C. and 30° C.; and a variation in coefficient of thermal expansion of less than about 5 ppb/° C. at a temperature between 15° C. and 30° C.

Abstract: Titania-containing silica glass bodies and extreme ultraviolet elements having low levels of striae are disclosed. Methods and apparatus for manufacturing and measuring striae in glass elements and extreme ultraviolet elements are also disclosed.

Abstract: The invention discloses a method for forming substantially striae-free glass substrates that are suitable for optical applications, including use in forming optical elements or structures such as mirrors and platen stage structures that can be used, for example, in EUV lithography. The method includes forming a mixture of silica soot, binder, lubricant and solvent. The homogenized mixture is then extruded through a slit die or mask into a flat planar pre-form, and the extruded pre-form is then consolidated by heating into a substantially full density, substantially striae-free lithography glass substrate structure. The consolidated perform has a substantially uniform coefficient of thermal expansion and is also substantially void free.

Abstract: These glass bodies are light weight porous structures such as a boules of high purity fused silica (HPFS). More specifically, the porous structures are supports for HPFS mirror blanks. Porous glass is made utilizing flame deposition of pure silica or doped silica in a manner similar to the production of high purity fused silica. Bubbles or seeds are formed in the glass during laydown. Finely divided silicon carbide (SiC) particles are used to form the bubbles. At least one layer of porous glass is formed in the boule.

Abstract: A method for forming EUV LITHOGRAPHY GLASS STRUCTURES WITH VOIDS is disclosed which includes forming a slurry mixture including silica soot particles, and inserting the slurry mixture into a casting mold. The method provides low weight mass reduced rigid glass structures with beneficial thermal stability. The casting mold includes therein a casting form. The casting form is adapted to provide selected geometry void spaces within the glass lithography structure. The slurry mixture is dried to form a green ware object. The casting form is removed from the green ware and the green ware object is consolidated into a lithography glass structure with voids.

Abstract: The projection lithographic method for producing integrated circuits and forming patterns with extremely small feature dimensions includes an illumination sub-system (36) for producing and directing an extreme ultraviolet soft x-ray radiation ? from an extreme ultraviolet soft x-ray source (38); a mask stage (22) illuminated by the extreme ultraviolet soft x-ray radiation ? produced by illumination stage and the mask stage (22) includes a pattern when illuminated by radiation ?. A protection sub-system includes reflective multilayer coated Ti doped high purity SiO2 glass defect free surface (32) and printed media subject wafer which has a radiation sensitive surface.

Abstract: The present invention relates to a method for forming an optical device. The method includes providing a glass aggregate. Typically, the glass aggregate is a mixture of fine glass soot particles and coarser ground or milled glass powder. The glass particles are mixed with a liquid to form a slurry which is cast in a mold to form a porous pre-form. Subsequently, the porous pre-form is consolidated into a glass object by heating the pre-form at a relatively high temperature. The method of the present invention produces optical components having substantially no striae. As a result, scattering is substantially reduced when EUV light is reflected from a component produced from the optical blank.

Abstract: The present invention relates to a method for forming an optical blank. The method includes providing a green body that has a non-porous exterior portion and a porous interior portion. The interior portion is evacuated to create a vacuum in the interior portion. The green body is then pressed using a hot isostatic pressing technique to densify the green body into a solid glass optical blank. This method produces homogeneous optical blanks having substantially no striae. The method also produces dense, inclusion free glass. As a result, scattering is substantially reduced when EUV light is reflected from a component produced from optical blank employing the method of the present invention.

Abstract: A method of making an EUV lithography stage structure includes depositing a layer of a Ti doped SiO2 glass powder in a confined region to provide an underlying layer; applying a binder to form a primitive with the binder bonding the glass powder together at one or more selected regions; depositing an above layer of the glass powder above the deposited layer; applying the binder to the above layer with the binder bonding the glass powder together at one or more selected regions; repeating the deposition and binding steps to produce a number of successive layers with the binder bonding the successive layers together; and removing the unbonded glass powder to provide a bonded glass powder lithography stage structure which is then sintered and densified into a densified nonpowder glass lithography stage.

Abstract: Methods and apparatus for manufacturing titania-containing fused silica bodies and optical elements are described. The titania-containing fused silica bodies can be subsequently processed to make extreme ultraviolet optical elements. The methods and apparatus involve providing a sol including a titania-containing silica powder, forming the sol into a shaped gel and drying and heating the gel to a glass body.

Abstract: Titania-containing silica glass bodies and extreme ultraviolet elements having low levels of striae are disclosed. Methods and apparatus for manufacturing and measuring striae in glass elements and extreme ultraviolet elements are also disclosed.

Abstract: Methods and apparatus for manufacturing titania-containing fused silica bodies are disclosed. The titania-containing fused silica bodies are subsequently processed to make extreme ultraviolet soft x-ray masks. The methods and apparatus involve providing powders external to a furnace cavity and depositing the powders in the furnace cavity to form a titania-containing fused silica body.

Abstract: A method for forming EUV LITHOGRAPHY GLASS STRUCTURES WITH VOIDS is disclosed which includes forming a slurry mixture including silica soot particles, and inserting the slurry mixture into a casting mold. The method provides low weight mass reduced rigid glass structures with beneficial thermal stability. The casting mold includes therein a casting form. The casting form is adapted to provide selected geometry void spaces within the glass lithography structure. The slurry mixture is dried to form a green ware object. The casting form is removed from the green ware and the green ware object is consolidated into a lithography glass structure with voids.

Abstract: A method for forming EUV Lithography straie-free glass structures is disclosed which includes forming a mixture of silica soot. The homogenized mixture is extruded into a flat planar pre-form, and the extruded pre-form is then consolidated by, heating into a substantially full density, substantially striae-free lithography glass substrate structure.

Abstract: The present invention is directed to a method for producing optical blanks for EUV microlithographic components. The method includes the step of providing soot particles and spray-drying the soot particles to form an agglomerate. The agglomerate is dry-pressed to form a green body. The green body is heated to form a glass object. The method of the present invention produces optical components having substantially no striae. Further, the method of the present invention produces optical blanks having substantially no low frequency thickness variation. As a result, scattering is substantially reduced when EUV light is reflected from a component produced from the optical blank.

Abstract: The present invention relates to a method for forming an optical device. The method includes providing a glass aggregate. Typically, the glass aggregate is a mixture of fine glass soot particles and coarser ground or milled glass powder. The glass particles are mixed with a liquid to form a slurry which is cast in a mold to form a porous pre-form. Subsequently, the porous pre-form is consolidated into a glass object by heating the pre-form at a relatively high temperature. The method of the present invention produces optical components having substantially no striae. As a result, scattering is substantially reduced when EUV light is reflected from a component produced from the optical blank.

Abstract: Titania-containing silica glass bodies and extreme ultraviolet elements having low levels of striae are disclosed. Methods and apparatus for manufacturing and measuring striae in glass elements and extreme ultraviolet elements are also disclosed.

Abstract: The projection lithographic method for producing integrated circuits and forming patterns with extremely small feature dimensions includes an illumination sub-system (36) for producing and directing an extreme ultraviolet soft x-ray radiation ? from an extreme ultraviolet soft x-ray source (38); a mask stage (22) illuminated by the extreme ultraviolet soft x-ray radiation ? produced by illumination stage and the mask stage (22) includes a pattern when illuminated by radiation ?. A protection sub-system includes reflective multilayer coated Ti doped high purity SiO2 glass defect free surface (32) and printed media subject wafer which has a radiation sensitive surface.