Patents by Inventor Kenneth George Delfin

Kenneth George Delfin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Systems and Methods for In-Situ Wafer Edge and Backside Plasma Cleaning
    Publication number: 20170256393
    Abstract: A lower electrode plate receives radiofrequency power. A first upper plate is positioned parallel to and spaced apart from the lower electrode plate. A grounded second upper plate is positioned next to the first upper plate. A dielectric support provides support of a workpiece within a region between the lower electrode plate and the first upper plate. A purge gas is supplied at a central location of the first upper plate. A process gas is supplied to a periphery of the first upper plate. The dielectric support positions the workpiece proximate and parallel to the first upper plate, such that the purge gas flows over a top surface of the workpiece so as to prevent the process gas from flowing over the top surface of the workpiece, and so as to cause the process gas to flow around a peripheral edge of the workpiece and below the workpiece.
    Type: Application
    Filed: May 17, 2017
    Publication date: September 7, 2017
    Inventors: Keechan Kim, Jack Chen, Yunsang Kim, Kenneth George Delfin
  • Systems and Methods for In-Situ Wafer Edge and Backside Plasma Cleaning
    Publication number: 20150020848
    Abstract: A lower electrode plate receives radiofrequency power. A first upper plate is positioned parallel to and spaced apart from the lower electrode plate. A grounded second upper plate is positioned next to the first upper plate. A dielectric support provides support of a workpiece within a region between the lower electrode plate and the first upper plate. A purge gas is supplied at a central location of the first upper plate. A process gas is supplied to a periphery of the first upper plate. The dielectric support positions the workpiece proximate and parallel to the first upper plate, such that the purge gas flows over a top surface of the workpiece so as to prevent the process gas from flowing over the top surface of the workpiece, and so as to cause the process gas to flow around a peripheral edge of the workpiece and below the workpiece.
    Type: Application
    Filed: September 19, 2013
    Publication date: January 22, 2015
    Applicant: LAM RESEARCH CORPORATION
    Inventors: Keechan Kim, Jack Chen, Yunsang Kim, Kenneth George Delfin