Patents by Inventor Kenneth J. McCullough
Kenneth J. McCullough has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 8828143Abstract: A surface cleaning apparatus comprising a chamber, and a thermal transfer device. The chamber is capable of holding a semiconductor structure therein. The thermal transfer device is connected to the chamber. The thermal transfer device has a surface disposed inside the chamber for contacting the semiconducting structure and controlling a temperature of the semiconductor structure in contact with the surface. The thermal transfer device has a thermal control module connected to the surface for heating and cooling the surface to thermally cycle the surface. The thermal control module effects a substantially immediate thermal response of the surface when thermally recycling the surface.Type: GrantFiled: October 2, 2007Date of Patent: September 9, 2014Assignee: International Business Machines CorporationInventors: John P. Simons, Kenneth J. McCullough, Wayne M. Moreau, John M. Cotte, Keith R. Pope, Charles J. Taft, Dario L. Goldfarb
-
Publication number: 20130210235Abstract: A surface cleaning apparatus comprising a chamber, and a thermal transfer device. The chamber is capable of holding a semiconductor structure therein. The thermal transfer device is connected to the chamber. The thermal transfer device has a surface disposed inside the chamber for contacting the semiconducting structure and controlling a temperature of the semiconductor structure in contact with the surface. The thermal transfer device has a thermal control module connected to the surface for heating and cooling the surface to thermally cycle the surface. The thermal control module effects a substantially immediate thermal response of the surface when thermally recycling the surface.Type: ApplicationFiled: October 2, 2007Publication date: August 15, 2013Applicant: International Business Machines CorporationInventors: John P. Simons, Kenneth J. McCullough, Wayne M. Moreau, John M. Cotte, Keith R. Pope, Charles J. Taft, Dario L. Goldfarb
-
Patent number: 8388758Abstract: A surface cleaning apparatus comprising a chamber, and a thermal transfer device. The chamber is capable of holding a semiconductor structure therein. The thermal transfer device is connected to the chamber. The thermal transfer device has a surface disposed inside the chamber for contacting the semiconducting structure and controlling a temperature of the semiconductor structure in contact with the surface. The thermal transfer device has a thermal control module connected to the surface for heating and cooling the surface to thermally cycle the surface. The thermal control module effects a substantially immediate thermal response of the surface when thermally recycling the surface.Type: GrantFiled: October 2, 2007Date of Patent: March 5, 2013Assignee: International Business Machines CorporationInventors: John P. Simons, Kenneth J. McCullough, Wayne M. Moreau, John M. Cotte, Keith R. Pope, Charles J. Taft, Dario L. Goldfarb
-
Publication number: 20090235955Abstract: A surface cleaning apparatus comprising a chamber, and a thermal transfer device. The chamber is capable of holding a semiconductor structure therein. The thermal transfer device is connected to the chamber. The thermal transfer device has a surface disposed inside the chamber for contacting the semiconducting structure and controlling a temperature of the semiconductor structure in contact with the surface. The thermal transfer device has a thermal control module connected to the surface for heating and cooling the surface to thermally cycle the surface. The thermal control module effects a substantially immediate thermal response of the surface when thermally recycling the surface.Type: ApplicationFiled: October 2, 2007Publication date: September 24, 2009Applicant: International Business Machines CorporationInventors: John P. Simons, Kenneth J. McCullough, Wayne M. Moreau, John M. Cotte, Keith R. Pope, Charles J. Taft, Dario L. Goldfarb
-
Patent number: 7288155Abstract: A method for cleaning a semiconductor structure including providing a chamber for holding the semiconductor structure and a dense phase fluid, providing a thermal transfer device having a thermal transfer surface, connecting the thermal transfer device to the chamber, placing the semiconductor structure in the chamber in contact with the thermal transfer surface and thermally cycling the thermal transfer surface.Type: GrantFiled: May 12, 2005Date of Patent: October 30, 2007Assignee: International Business Machines CorporationInventors: John P. Simons, Kenneth J. McCullough, Wayne M. Moreau, John M. Cotte, Keith R. Pope, Charles J. Taft, Dario Goldfarb
-
Patent number: 7081208Abstract: Methods are provided for making microfilters by subtractive techniques which remove a component or part of a filter material to form pores in the filter material and additive techniques which deposit a filter material onto a porous underlying substrate. All the methods employ a supercritical fluid or mixture which have very high solvency properties and low viscosity and CO2 is the preferred supercritical fluid.Type: GrantFiled: December 16, 2002Date of Patent: July 25, 2006Assignee: International Business Machines CorporationInventors: Kenneth J McCullough, Wayne M Moreau, Keith R Pope, Robert J Purtell, John P Simons, William A Syverson, Charles J Taft
-
Patent number: 6997197Abstract: A surface cleaning apparatus comprising a chamber, and a thermal transfer device. The chamber is capable of holding a semiconductor structure therein. The thermal transfer device is connected to the chamber. The thermal transfer device has a surface disposed inside the chamber for contacting the semiconducting structure and controlling a temperature of the semiconductor structure in contact with the surface. The thermal transfer device has a thermal control module connected to the surface for heating and cooling the surface to thermally cycle the surface. The thermal control module effects a substantially immediate thermal response of the surface when thermally recycling the surface.Type: GrantFiled: December 13, 2002Date of Patent: February 14, 2006Assignee: International Business Machines CorporationInventors: John P. Simons, Kenneth J. McCullough, Wayne M. Moreau, John M. Cotte, Keith R. Pope, Charles J. Taft, Dario L. Goldfarb
-
Patent number: 6953042Abstract: The present invention provides an apparatus for cleaning a workpiece with a cleaning medium that is maintained at a single fluid phase. The apparatus comprises means for providing the cleaning medium; a pressurizable cleaning vessel for receiving the cleaning medium and the workpiece; and means for maintaining a single fluid phase of the cleaning medium in the cleaning vessel. The present invention further provides a process for cleaning the workpiece with cleaning medium under conditions such that the workpiece is exposed to a single fluid phase of the cleaning medium. The present invention further includes a process for a storage media that includes instructions for controlling a processor for the process of the present invention. The storage media comprises means for controlling the processor to control contacting conditions of the workpiece and the cleaning medium such that the workpiece is exposed to a single fluid phase of the cleaning medium.Type: GrantFiled: November 15, 2002Date of Patent: October 11, 2005Assignee: International Business Machines CorporationInventors: Jesse Stephen Jur, Kenneth J. McCullough, Wayne Martin Moreau, John Patrick Simons, Charles Jesse Taft
-
Patent number: 6927393Abstract: A method and apparatus are provided for in situ monitoring and analyzing of process parameters for semiconductor fabrication processes including cleaning semiconductor wafers utilizing a supercritical fluid or a high pressure liquid such as CO2. The method and apparatus utilize a spectrometer having a reflective mirror proximate the vessel holding the high pressure fluid. NIR radiation transmitted into the vessel through a window and out of the vessel through an opposed window is reflected and detected and measured and the composition of the fluid in the pressure vessel is determined allowing the user to control process parameters based on the measured composition.Type: GrantFiled: December 16, 2002Date of Patent: August 9, 2005Assignee: International Business Machines CorporationInventors: John M. Cotte, Kenneth J. McCullough, Wayne M. Moreau, Keith R. Pope, Robert J. Purtell, John P. Simons, Charles J. Taft
-
Patent number: 6892741Abstract: The present invention provides an apparatus for cleaning a workpiece with a cleaning medium that is maintained at a single fluid phase. The apparatus comprises means for providing the cleaning medium; a pressurizable cleaning vessel for receiving the cleaning medium and the workpiece; and means for maintaining a single fluid phase of the cleaning medium in the cleaning vessel. The present invention further provides a process for cleaning the workpiece with cleaning medium under conditions such that the workpiece is exposed to a single fluid phase of the cleaning medium. The present invention further includes a process for a storage media that includes instructions for controlling a processor for the process of the present invention. The storage media comprises means for controlling the processor to control contacting conditions of the workpiece and the cleaning medium such that the workpiece is exposed to a single fluid phase of the cleaning medium.Type: GrantFiled: January 21, 2004Date of Patent: May 17, 2005Assignee: International Business Machines CorporationInventors: Jesse Stephen Jur, Kenneth J. McCullough, Wayne Martin Moreau, John Patrick Simons, Charles Jesse Taft
-
Patent number: 6875286Abstract: A method and apparatus are provided for removing solid and/or liquid residues from electronic components such as semiconductor wafers utilizing liquid or supercritical carbon dioxide which is solidified on the surface of the wafer and then vaporized and removed from the system. In a preferred embodiment the solidification and vaporizing steps are repeated (cycled) before removal of the CO2 from the vessel. The residues are carried away with the vaporized carbon dioxide.Type: GrantFiled: December 16, 2002Date of Patent: April 5, 2005Assignee: International Business Machines CorporationInventors: John M. Cotte, Catherine Ivers, Kenneth J. McCullough, Wayne M. Moreau, Robert J. Purtell, John P. Simons, William A. Syverson, Charles J. Taft
-
Patent number: 6821488Abstract: A chuck assembly for holding a sample includes a shaft; a generally circular chuck member, the shaft extending from a first surface of the chuck member; and a sample holder associated with a second surface of the chuck member. The second surface is opposite the first surface. A sample receiving assembly holds the sample on the sample holder so that the sample remains fixed to the sample holder when the shaft rotates and causes the chuck member and the sample holder to rotate with the shaft. The chuck assembly may be used in a reactor assembly including a reactor chamber for receiving the chuck assembly; a spindle assembly for receiving an end of the shaft distal from the chuck member; and a motor for rotating the spindle assembly and the shaft so that fluid in the chamber flows generally along the shaft in a first direction and through the openings in the chuck member, around the sample holder, and then along a wall of the chamber in a second direction generally opposite to the first direction.Type: GrantFiled: May 30, 2000Date of Patent: November 23, 2004Assignee: International Business Machines CorporationInventors: Kenneth J McCullough, Wayne M Moreau, John P Simons, Charles J Taft
-
Publication number: 20040149317Abstract: The present invention provides an apparatus for cleaning a workpiece with a cleaning medium that is maintained at a single fluid phase. The apparatus comprises means for providing the cleaning medium; a pressurizable cleaning vessel for receiving the cleaning medium and the workpiece; and means for maintaining a single fluid phase of the cleaning medium in the cleaning vessel. The present invention further provides a process for cleaning the workpiece with cleaning medium under conditions such that the workpiece is exposed to a single fluid phase of the cleaning medium. The present invention further includes a process for a storage media that includes instructions for controlling a processor for the process of the present invention. The storage media comprises means for controlling the processor to control contacting conditions of the workpiece and the cleaning medium such that the workpiece is exposed to a single fluid phase of the cleaning medium.Type: ApplicationFiled: January 21, 2004Publication date: August 5, 2004Applicant: International Business Machines CorporationInventors: Jesse Stephen Jur, Kenneth J. McCullough, Wayne Martin Moreau, John Patrick Simons, Charles Jesse Taft
-
Publication number: 20040112406Abstract: A method and apparatus are provided for removing solid and/or liquid residues from electronic components such as semiconductor wafers utilizing liquid or supercritical carbon dioxide which is solidified on the surface of the wafer and then vaporized and removed from the system. In a preferred embodiment the solidification and vaporizing steps are repeated (cycled) before removal of the CO2 from the vessel. The residues are carried away with the vaporized carbon dioxide.Type: ApplicationFiled: December 16, 2002Publication date: June 17, 2004Applicant: International Business Machines CorporationInventors: John M. Cotte, Catherine Ivers, Kenneth J. McCullough, Wayne M. Moreau, Robert J. Purtell, John P. Simons, William A. Syverson, Charles J. Taft
-
Publication number: 20040112402Abstract: A surface cleaning apparatus comprising a chamber, and a thermal transfer device. The chamber is capable of holding a semiconductor structure therein. The thermal transfer device is connected to the chamber. The thermal transfer device has a surface disposed inside the chamber for contacting the semiconducting structure and controlling a temperature of the semiconductor structure in contact with the surface. The thermal transfer device has a thermal control module connected to the surface for heating and cooling the surface to thermally cycle the surface. The thermal control module effects a substantially immediate thermal response of the surface when thermally recycling the surface.Type: ApplicationFiled: December 13, 2002Publication date: June 17, 2004Inventors: John P. Simons, Kenneth J. McCullough, Wayne M. Moreau, John M. Cotte, Keith R. Pope, Charles J. Taft, Dario Goldfarb
-
Publication number: 20040112865Abstract: Methods are provided for making microfilters by subtractive techniques which remove a component or part of a filter material to form pores in the filter material and additive techniques which deposit a filter material onto a porous underlying substrate. All the methods employ a supercritical fluid or mixture which have very high solvency properties and low viscosity and CO2 is the preferred supercritical fluid.Type: ApplicationFiled: December 16, 2002Publication date: June 17, 2004Applicant: International Business Machines CorporationInventors: Kenneth J. McCullough, Wayne M. Moreau, Keith R. Pope, Robert J. Purtell, John P. Simons, William A. Syverson, Charles J. Taft
-
Publication number: 20040113079Abstract: A method and apparatus are provided for in situ monitoring and analyzing of process parameters for semiconductor fabrication processes including cleaning semiconductor wafers utilizing a supercritical fluid or a high pressure liquid such as CO2. The method and apparatus utilize a spectrometer having a reflective mirror proximate the vessel holding the high pressure fluid. NIR radiation transmitted into the vessel through a window and out of the vessel through an opposed window is reflected and detected and measured and the composition of the fluid in the pressure vessel is determined allowing the user to control process parameters based on the measured composition.Type: ApplicationFiled: December 16, 2002Publication date: June 17, 2004Applicant: International Business Machines CorporationInventors: John M. Cotte, Kenneth J. McCullough, Wayne M. Moreau, Keith R. Pope, Robert J. Purtell, John P. Simons, Charles J. Taft
-
Patent number: 6736906Abstract: A workpiece holder for processing a workpiece in a chamber of a liquified fluid. In one embodiment, the workpiece holder includes a cylindrically shaped rotator having an exterior wall and at least one fluid guide on the exterior wall. The rotator is adapted to rotate and provide fluid flow across a first end of the rotator, and is adapted to provide fluid flow and mixing perpendicular to a surface of the first end of the rotator. A fixture is coupled to the first end of the rotator for securing the workpiece to the first end of the rotator.Type: GrantFiled: April 10, 2002Date of Patent: May 18, 2004Assignee: International Business Machines CorporationInventors: John M. Cotte, Matteo Flotta, Kenneth J. McCullough, Wayne M. Moreau, Keith R. Pope, John P. Simons, Charles J. Taft
-
Publication number: 20040038155Abstract: The invention relates generally to photolithographic techniques, and particularly, but not by way of limitation, to a method for preventing the collapse of the image pattern during the stage of drying the image. The invention also relates to structures fabricated using the inventive method.Type: ApplicationFiled: August 25, 2003Publication date: February 26, 2004Inventors: Jphn P. Simons, Kenneth J. McCullough, Wayne M. Moreau, Charles J. Taft
-
Patent number: 6673521Abstract: A process of silylation of object surfaces using a mixture of a silylation agent in admixture with an inert liquified gas, such as carbon dioxide.Type: GrantFiled: December 12, 2000Date of Patent: January 6, 2004Assignee: lnternational Business Machines CorporationInventors: Wayne M. Moreau, Kenneth J. McCullough, David R. Medeiros, John P. Simons, Charles J. Taft