Patents by Inventor Kenneth J. Muroski, Jr.

Kenneth J. Muroski, Jr. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma CVD apparatus and processes
    Patent number: 5443686
    Abstract: Processes for producing and using a novel CVD apparatus for depositing silicon layers onto suitable substrates and for the in-situ etching removal of background silicon deposits from the interior walls of the apparatus. The invention comprises using an apparatus having a fused quartz reaction chamber and precoating the interior wall of the reaction chamber with a thin continuous barrier layer of Al.sub.2 O.sub.3 which is inert to the etching gas introduced for the removal of the background silicon deposits.
    Type: Grant
    Filed: January 15, 1992
    Date of Patent: August 22, 1995
    Assignee: International Business Machines Corporation Inc.
    Inventors: Fletcher Jones, Kenneth J. Muroski, Jr., Bennett Robinson