Abstract: Compositions and methods for developing quinone diazide positive-working photoresists. The compositions consist essentially of an aqueous solution of a tetraalkylammonium hydroxide and an adjunct having a structure selected from: ##STR1## wherein n is 0 or 1; m is 1 or 2; and each R.sup.1 and R.sup.2 is independently selected from hydrogen, methyl, or ethyl, but in Structure I the two R.sup.2 's are not both ethyl. The methods involve use of this composition to develop the indicated photoresists. The addition of an adjunct of the indicated type prevents the formation of irregular deposits on the edges of unexposed portions of the photoresist lines when the photoresist is developed. Selection of these adjuncts also increases the uniformity of line widths of photoresist lines developed according to the present invention, and increases the process latitude of the developer.

Abstract: Compositions and methods for developing quinone diazide positive-working photoresists. The compositions consist essentially of an aqueous solution of a tetraalkylammonium hydroxide and an adjunct having a structure selected from: ##STR1## wherein n is 0 or 1; m is 1 or 2; and each R.sup.1 and R.sup.2 is independently selected from hydrogen, methyl, or ethyl, but in Structure I the two R.sup.2 's are not both ethyl. The methods involve use of this composition to develop the indicated photoresists. The addition of an adjunct of the indicated type prevents the formation of irregular deposits on the edges of unexposed portions of the photoresist lines when the photoresist is developed. Selection of these adjuncts also increases the uniformity of line widths of photoresist lines developed according to the present invention, and increases the process latitude of the developer.

Abstract: Compositions and methods for developing quinone diazide positive-working photoresists. The compositions consist essentially of an aqueous solution of a tetraalkylammonium hydroxide primary alkali and an alkanolamine having the following structure: ##STR1## wherein n is zero or 1, and each R is independently selected from hydrogen, methyl, or ethyl. The methods involve use of this composition to develop the indicated photoresists. The addition of an alkanolamine of the indicated type prevents the formation of irregular deposits on the edges of unexposed portions of the photoresist lines when the photoresist is developed. Selection of these alkanolamines also increases the uniformity of line widths of photoresist lines developed according to the present invention, and increases the process latitude of the developer.