Abstract: An enhanced optical delay line device for providing multiple degree of freedom active control, including first and second actively-controlled mirrors, each of the actively-controlled mirrors having two rotational degrees of freedom and one translational degree of freedom. The first actively-controlled mirror is mounted substantially orthogonally to the second actively-controlled mirror. The system also includes a closed-loop control system, the control system providing six mechanical degrees of freedom of active control for the enhanced optical delay line device by controlling the first and second actively-controlled mirrors based upon a command input and mirror position signals. The present invention is smaller than conventional optical delay line devices, has better performance, and eliminates the need for one of the FSMs, bringing the total number of mechanisms down to two from three.

Abstract: Transport apparatus for semiconductor wafers which have been subject to chemical mechanical polishing (CMP). The risk of malfunction of an articulated arm fitted with a vacuum chuck can be reduced in a number of different ways. The end effector can be constructed so that it can be easily removed from the arm for cleaning and can be easily replaced in the desired position without the need for adjustment. The arm can include one or more catch chambers into which materials drawn into the vacuum chuck will be deposited, but which will not interrupt the vacuum. The near end of the vacuum passage can be coupled to a source of a cleaning fluid, so that the cleaning fluid can be passed outwards through the vacuum passage to flush out materials drawn into the vacuum passage through the chuck.