Abstract: A method, circuit and system for determining burn-in reliability from wafer level burn-in are disclosed. The method includes recording the number of failures in each IC die in nonvolatile elements on-chip at points in time over the duration of wafer level burn-in testing. Methods may also include using a supervoltage level to signal a transition between cycles of burn-in testing. The number of failures in each IC die, along with their associated points in time, may be used to create burn-in reliability curves which are conventionally derived using other processes that may be less cost effective or not possible to effect with unpackaged IC dice. Unused registers of nonvolatile elements may also be determined by reading the nonvolatile element registers on a semiconductor die on the wafer. Circuits and systems associated with the method of the present invention are also disclosed.

Abstract: A memory device compares, within the memory device, a signal indicative of a current drawn by one or more select lines to a reference signal, and indicates whether the signal indicative of the current drawn by the one or more select lines exceeds the reference signal.

Abstract: According to embodiments of the present invention, circuits have elements to protect a high-voltage transistor in a gate dielectric antifuse circuit. An antifuse has a layer of gate dielectric between a first terminal coupled to receive an elevated voltage and a second terminal, and a high-voltage transistor is coupled to the antifuse and has a gate terminal. An intermediate voltage between the supply voltage and the elevated voltage is coupled to the gate terminal of the high-voltage transistor to protect the high-voltage transistor.

Abstract: A threshold detection circuit for developing a mode trigger signal includes an input that receives an input signal. In response to the input signal having approximately an input threshold value for a triggering time, the threshold detection circuit activates the mode trigger signal on an output. In response to the input signal being substantially different from the input threshold value or the input signal not having the input threshold value for the triggering time, the circuit deactivates the mode trigger signal. The threshold detection circuit may be contained in a variety of different mode detection circuits for detecting when an integrated circuit is to be placed in a test mode or other desired mode of operation, and such mode detection circuits may be contained in a variety of different types of integrated circuits, such as memory devices generally and SRAMs specifically.

Abstract: A combination of a current limiting resistor and a clamping Schottky diode prevent substantial forward biasing of a pn junction associated with a pad in a snapback device during normal operation, but do not substantially affect triggering of the device during an unbiased electrostatic discharge event.

Abstract: A number of antifuse support circuits and methods for operating them are disclosed according to embodiments of the present invention. An external pin is coupled to a common bus line in an integrated circuit to deliver an elevated voltage to program antifuses in a programming mode. An antifuse having a first terminal coupled to the common bus line is selected to be programmed by a control transistor in a program driver circuit coupled to a second terminal of the antifuse. The program driver circuit has a high-voltage transistor with a diode coupled to its gate to bear a portion of the elevated voltage after the antifuse has been programmed. The program driver circuit also has an impedance transistor between the high-voltage transistor and the control transistor to reduce leakage current and the possibility of a snap-back condition in the control transistor. A read circuit includes a transistor coupled between a read voltage source and the second terminal to read the antifuse in an active mode.

Abstract: A method, circuit and system for determining burn-in reliability from wafer level burn-in are disclosed. The method according to the present invention includes recording the number of failures in each IC die in nonvolatile elements on-chip at points in time over the duration of wafer level burn-in testing. The number of failures in each IC die, along with their associated points in time, may be used to create burn-in reliability curves which are conventionally derived using other processes that may be less cost effective or not possible to effect with unpackaged IC dice. Circuits and systems associated with the method of the present invention are also disclosed.

Abstract: A method, circuit and system for determining burn-in reliability from wafer level burn-in are disclosed. The method according to the present invention includes recording the number of failures in each IC die in nonvolatile elements on-chip at points in time over the duration of wafer level burn-in testing. The number of failures in each IC die, along with their associated points in time, may be used to create burn-in reliability curves which are conventionally derived using other processes that may be less cost effective or not possible to effect with unpackaged IC dice. Circuits and systems associated with the method of the present invention are also disclosed.

Abstract: A large-scale support carries semiconductor devices and at least one pair of common conductive regions in communication therewith. Each common conductive region is configured to be electrically connected with both a force contact and a sense contact of stress or test equipment. Such equipment includes at least one pair of force contacts for applying a force voltage across a pair of common conductive regions and, thus, across the support. A corresponding pair of sense contacts facilitates monitoring of a voltage applied across each of the semiconductor devices by the force contacts. Methods and systems for evaluating a voltage that has been applied to two or more semiconductor devices by way of a single pair of force contacts are also disclosed, as are methods and systems for, in response to a measured voltage, modifying the force voltage so that a desired voltage may be applied across each of the semiconductor devices.

Abstract: A fuse for use in a semiconductor device includes spaced-apart terminals with at least two layers of conductive material and a single-layer conductive link joining the spaced-apart terminals and including a single layer of conductive material. A first, lower layer of the terminals of each fuse may be formed from conductively doped polysilicon. The second, upper layer of each fuse terminal may be formed from a polycide, a metal silicide, a metal, or a conductive alloy. The conductive link of each fuse may be formed from either the material of the first layer or the material of the second layer. Methods for fabricating the fuse include forming the first and second layers and patterning the first and second layers so as to form a fuse with the desired structure.

Abstract: An antifuse structure and method of use are disclosed. According to one embodiment of the present invention a first programming voltage is coupled to a well of a first conductivity type in a substrate of a second conductivity type in an antifuse. A second programming voltage is coupled to a conductive terminal of the second conductivity type in the antifuse to create a current path through an insulator between the conductive terminal and the well to program the antifuse. The first programming voltage may be coupled to an ohmic contact in the well in the antifuse.

Abstract: According to embodiments of the present invention, circuits have elements to protect a high-voltage transistor in a gate dielectric antifuse circuit. An antifuse has a layer of gate dielectric between a first terminal coupled to receive an elevated voltage and a second terminal, and a high-voltage transistor is coupled to the antifuse and has a gate terminal. An intermediate voltage between the supply voltage and the elevated voltage is coupled to the gate terminal of the high-voltage transistor to protect the high-voltage transistor.

Abstract: An apparatus for determining burn-in reliability from wafer level burn-in is disclosed. The apparatus according td the present invention includes nonvolatile elements on an integrated circuit for recording the number of failures at various points in time over the duration of wafer level burn-in testing. The number of failures in each IC die, along with their associated points in time, may be used to create burn-in reliability curves which are conventionally derived using other processes that may be less cost effective or not possible to effect with unpackaged IC dice. A memory device associated with the method of the present invention is also disclosed.

Abstract: A memory device has a number of memory segments connected to a supply source through a supply control circuit. If one of the memory segments is defective, the supply control circuit isolates the defective memory segment from the supply source. The memory device replaces the defective memory segment with a redundant segment.