Abstract: The present invention provides an improved method for electroplating chromium, using lead anodes, while achieving the advantages of using methanesulfonic acid without suffering the excessive anode-corrosion characteristics associated with that acid. Accordingly, chromium is electrodeposited from a bath containing chromic acid, sulfate ion and an alkylpolysulfonic acid containing from one to about three carbon atoms. The preferred alkylpolysulfonic acid is methanedisulfonic acid.

Abstract: A sulfate scavenger for chromium-plating baths consists of barium chromate or dichromate or mixtures of the two, added either directly to the bath or as part of a replenishment mixture with chromic acid.

Abstract: The present invention provides a process for electroplating chromium using lead anodes while achieving the advantages of using methanesolfonic acid without suffering the excessive anode-corrosion characteristics associated with that acid. Accordingly, chromium is electrodeposited from a bath containing chromic acid, sulfate and an alkylpolysulfonic acid containing from one to about three carbon atoms. The invention also provides a plating process for chromium electrodeposition, a plating bath for use in the inventive process, and a replenishment composition for existing plating baths.

Abstract: Weight loss of lead and lead alloy anodes is substantially reduced by including bismuth arsenic or antimony ions in the plating bath.

Abstract: What is described herein is a method of electroplating an adherent chromium deposit on a chromium substrate. The process is characterized by chemically oxidizing the chromium substrate before starting the electrodeposition of chromium thereon. A suitable chemical oxidizing agent is hydrogen ion, which can be furnished by a dilute acid solution. The invention is applicable to any chromium electroplating bath, including high energy efficient chromium baths, such as HEEF-40 baths, which are presently in commercial use.

Abstract: A chromium plating bath and process for producing a non-iridescent, adherent, bright chromium deposit at high efficiencies and high temperatures under conditions such that the process is substantially free of cathodic low current density etching. The bath consists essentially of chromic acid and sulfate in predetermined concentrations, and an organic sulfonic acid or salts thereof, where the ratio of S to C is .gtoreq.1/3, e.g. methyl, ethyl and propyl sulfonic acid, and methane and 1,2-ethane disulfonic acid. The bath is substantially free of carboxylic acids, phosphonic acids, perfluoroloweralkyl sulfonic acids, and halides.

Abstract: An electrochemical cell construction features a novel co-extruded plastic electrode in an interleaved construction with a novel integral separator-spacer. Also featured is a leak and impact resistant construction for preventing the spill of corrosive materials in the event of rupture.

Abstract: An electrochemical cell construction features a novel co-extruded plastic electrode in an interleaved construction with a novel integral separator-spacer. Also featured is a leak and impact resistant construction for preventing the spill of corrosive materials in the event of rupture.

Abstract: An electrochemical cell construction features a novel co-extruded plastic electrode in an interleaved construction with a novel integral separator-spacer. Also featured is a leak and impact resistant construction for preventing the spill of corrosive materials in the event of rupture.