Patents by Inventor Kenneth R. Week, Jr.

Kenneth R. Week, Jr. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • MOS rear end processing
    Patent number: 4620986
    Abstract: A process for the reduction of defect formation in conductive layers of semiconductor bodies during patterning, alloying and passivation. A film of low temperature spin-on-glass containing dye is formed on the conductive layer prior to patterning and any high temperature process greater than 200 degrees C. Hermetic passivation is achieved by depositing on the conductive layer a composite film consisting of a lower, tensile layer and an upper, compressive layer with the net force of the passivation film being tensile.
    Type: Grant
    Filed: October 15, 1985
    Date of Patent: November 4, 1986
    Assignee: Intel Corporation
    Inventors: Leopoldo D. Yau, Robert A. Gasser, Jr., Kenneth R. Week, Jr., Jick M. Yu, David D. Chin
  • MOS rear end processing
    Patent number: 4587138
    Abstract: A process for the reduction of defect formation in conductive layers of semiconductor bodies during patterning, alloying and passivation. A film of low temperature spin-on-glass containing dye is formed on the conductive layer prior to patterning and any high temperature process greater than 200 degrees C. Hermetic passivation is achieved by depositing on the conductive layer a composite film consisting of a lower, tensile layer and an upper, compressive layer with the net force of the passivation film being tensile.
    Type: Grant
    Filed: November 9, 1984
    Date of Patent: May 6, 1986
    Assignee: Intel Corporation
    Inventors: Leopoldo D. Yau, Robert A. Gasser, Jr., Kenneth R. Week, Jr., Jick M. Yu, David D. Chin