Patents by Inventor Kenneth Raymond Carter

Kenneth Raymond Carter has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10894899
    Abstract: An anti-fogging composition is described herein. The composition includes a nanocellulose comprising cellulose nanofibrils, cellulose nanocrystals, or a combination thereof, and water. A method of preparing an anti-fogging coating includes applying the anti-fogging composition to at least a portion of a surface of a substrate to form a coating. An article including a coating formed from the anti-fogging composition is also disclosed. Coatings prepared from the anti-fogging compositions are water proof, and offer a cost-effective alternative to other anti-fogging coatings.
    Type: Grant
    Filed: February 18, 2020
    Date of Patent: January 19, 2021
    Assignee: THE UNIVERSITY OF MASSACHUSETTS
    Inventors: Yinyong Li, Kenneth Raymond Carter
  • Publication number: 20200181439
    Abstract: An anti-fogging composition is described herein. The composition includes a nanocellulose comprising cellulose nanofibrils, cellulose nanocrystals, or a combination thereof, and water. A method of preparing an anti-fogging coating includes applying the anti-fogging composition to at least a portion of a surface of a substrate to form a coating. An article including a coating formed from the anti-fogging composition is also disclosed. Coatings prepared from the anti-fogging compositions are water proof, and offer a cost-effective alternative to other anti-fogging coatings.
    Type: Application
    Filed: February 18, 2020
    Publication date: June 11, 2020
    Inventors: Yinyong Li, Kenneth Raymond Carter
  • Patent number: 10543476
    Abstract: Disclosed herein is a porous material comprising a biopolymer functionalized with a carbon dioxide capturing moiety; where the biopolymer is in the form of a foam or an aerogel having a bulk density of 500 grams per cubic meter to 2500 grams per cubic meter. Disclosed herein too is a method comprising functionalizing a biopolymer with a carbon dioxide capturing moiety; dissolving the biopolymer in an aqueous solution to form a first solution; reducing the temperature of the first solution to below the freezing point of the aqueous solution; displacing the aqueous solution with a first solvent that has a lower surface tension than a surface tension of the aqueous solution; and drying the first solvent to produce a porous biopolymer having a bulk density of 500 grams per cubic meter to 2500 grams per cubic meter.
    Type: Grant
    Filed: August 4, 2017
    Date of Patent: January 28, 2020
    Assignee: THE UNIVERSITY OF MASSACHUSETTS
    Inventors: Yinyong Li, Kenneth Raymond Carter, Kara Martin
  • Publication number: 20180291223
    Abstract: An anti-fogging composition is described herein. The composition includes a nanocellulose comprising cellulose nanofibrils, cellulose nanocrystals, or a combination thereof, and water. A method of preparing an anti-fogging coating includes applying the anti-fogging composition to at least a portion of a surface of a substrate to form a coating. An article including a coating formed from the anti-fogging composition is also disclosed. Coatings prepared from the anti-fogging compositions are water proof, and offer a cost-effective alternative to other anti-fogging coatings.
    Type: Application
    Filed: October 10, 2016
    Publication date: October 11, 2018
    Inventors: Yinyong Li, Kenneth Raymond Carter
  • Publication number: 20180036713
    Abstract: Disclosed herein is a porous material comprising a biopolymer functionalized with a carbon dioxide capturing moiety; where the biopolymer is in the form of a foam or an aerogel having a bulk density of 500 grams per cubic meter to 2500 grams per cubic meter. Disclosed herein too is a method comprising functionalizing a biopolymer with a carbon dioxide capturing moiety; dissolving the biopolymer in an aqueous solution to form a first solution; reducing the temperature of the first solution to below the freezing point of the aqueous solution; displacing the aqueous solution with a first solvent that has a lower surface tension than a surface tension of the aqueous solution; and drying the first solvent to produce a porous biopolymer having a bulk density of 500 grams per cubic meter to 2500 grams per cubic meter.
    Type: Application
    Filed: August 4, 2017
    Publication date: February 8, 2018
    Inventors: Yinyong Li, Kenneth Raymond Carter, Kara Martin
  • Publication number: 20170101738
    Abstract: A method for producing nanocellulose is described herein. The method includes contacting a cellulosic material with an oxidizing agent, and a compound selected from the group consisting of an alkali metal bromide, an alkali metal iodide, an alkali metal fluoride, an alkali metal chloride, or a combination thereof, in an aqueous solution to provide an oxidized cellulose mixture. The nanocellulose prepared according to the method is also described.
    Type: Application
    Filed: October 10, 2016
    Publication date: April 13, 2017
    Inventors: Kenneth Raymond Carter, Yinyong Li
  • Patent number: 8163188
    Abstract: A method of forming a patterned functional layer on a substrate using a poly(hydroxyethyl methacrylate) lift-off layer is described. The method can be used with substrates that would not tolerate the organic solvents required for processing of known poly(methyl methacrylate) lift-off layers. When used in combination with known nanoimprint lithography and step-and-flash imprint lithography techniques, the method can be used to generate patterned functional structures with dimensions as small as five nanometers.
    Type: Grant
    Filed: April 3, 2008
    Date of Patent: April 24, 2012
    Assignee: The University of Massachusetts
    Inventors: Kenneth Raymond Carter, Sarav Bharat Jhaveri
  • Patent number: 7982312
    Abstract: The process of producing a dual damascene structure used for the interconnect architecture of semiconductor chips. More specifically the use of imprint lithography to fabricate dual damascene structures in a dielectric and the fabrication of dual damascene structured molds.
    Type: Grant
    Filed: August 7, 2008
    Date of Patent: July 19, 2011
    Assignee: International Business Machines Corporation
    Inventors: Matthew E. Colburn, Kenneth Raymond Carter, Gary M. McClelland, Dirk Pfeiffer
  • Patent number: 7947801
    Abstract: A method of synthesizing a poly(9,9-disubstituted-fluorene) includes reacting a 9,9-disubstituted-fluorene with an alkyl lithium in the presence of a catalytic amount of a nickel amine complex. The 9,9-disubstituted-fluorene includes solubility-enhancing substituents in the 9-position and leaving groups in the 2-position and the 7-position. The product poly(9,9-disubstituted-fluorene)s are fluorescent conjugated polymers that are useful as, for example, blue light-emitting materials.
    Type: Grant
    Filed: April 3, 2008
    Date of Patent: May 24, 2011
    Assignee: The University of Massachusetts
    Inventors: Kenneth Raymond Carter, Sarav Bharat Jhaveri
  • Patent number: 7862989
    Abstract: The process of producing a dual damascene structure used for the interconnect architecture of semiconductor chips. More specifically the use of imprint lithography to fabricate dual damascene structures in a dielectric and the fabrication of dual damascene structured molds.
    Type: Grant
    Filed: August 7, 2008
    Date of Patent: January 4, 2011
    Assignee: International Business Machines Corporation
    Inventors: Matthew E. Colburn, Kenneth Raymond Carter, Gary M. McClelland, Dirk Pfeiffer
  • Patent number: 7837459
    Abstract: The process of producing a dual damascene structure used for the interconnect architecture of semiconductor chips. More specifically the use of imprint lithography to fabricate dual damascene structures in a dielectric and the fabrication of dual damascene structured molds.
    Type: Grant
    Filed: August 7, 2008
    Date of Patent: November 23, 2010
    Assignee: International Business Machines Corporation
    Inventors: Matthew E. Colburn, Kenneth Raymond Carter, Gary M. McClelland, Dirk Pfeiffer
  • Publication number: 20090264317
    Abstract: Disclosed is a method comprising disposing a functionalized patternable material on a substrate, wherein the functionalized patternable material comprises a first click chemical moiety; patterning the functionalized patternable material; and reacting the first click chemical moiety with a complementary reactant to form an functionalized patterned surface, the complementary reactant comprising a second click chemical moiety that reacts with the first click chemical moiety; the complementary reactant comprising an functional group.
    Type: Application
    Filed: April 9, 2009
    Publication date: October 22, 2009
    Applicant: UNIVERSITY OF MASSACHUSETTS
    Inventors: Yuval Ofir, Vincent Martin Rotello, Brian John Jordan, Kenneth Raymond Carter
  • Publication number: 20090023083
    Abstract: The process of producing a dual damascene structure used for the interconnect architecture of semiconductor chips. More specifically the use of imprint lithography to fabricate dual damascene structures in a dielectric and the fabrication of dual damascene structured molds.
    Type: Application
    Filed: August 7, 2008
    Publication date: January 22, 2009
    Inventors: Matthew E. Colburn, Kenneth Raymond Carter, Gary M. McClelland, Dirk Pfeiffer
  • Publication number: 20090011141
    Abstract: A method of forming a patterned functional layer on a substrate using a poly(hydroxyethyl methacrylate) lift-off layer is described. The method can be used with substrates that would not tolerate the organic solvents required for processing of known poly(methyl methacrylate) lift-off layers. When used in combination with known nanoimprint lithography and step-and-flash imprint lithography techniques, the method can be used to generate patterned functional structures with dimensions as small as five nanometers.
    Type: Application
    Filed: April 3, 2008
    Publication date: January 8, 2009
    Inventors: Kenneth Raymond Carter, Sarav Bharat Jhaveri
  • Publication number: 20080305197
    Abstract: The process of producing a dual damascene structure used for the interconnect architecture of semiconductor chips. More specifically the use of imprint lithography to fabricate dual damascene structures in a dielectric and the fabrication of dual damascene structured molds.
    Type: Application
    Filed: August 7, 2008
    Publication date: December 11, 2008
    Inventors: Matthew E. Colburn, Kenneth Raymond Carter, Gary M. McClelland, Dirk Pfeiffer
  • Publication number: 20080303160
    Abstract: The process of producing a dual damascene structure used for the interconnect architecture of semiconductor chips. More specifically the use of imprint lithography to fabricate dual damascene structures in a dielectric and the fabrication of dual damascene structured molds.
    Type: Application
    Filed: August 7, 2008
    Publication date: December 11, 2008
    Inventors: Matthew E. Colburn, Kenneth Raymond Carter, Gary M. McClelland, Dirk Pfeiffer
  • Patent number: 7435074
    Abstract: The process of producing a dual damascene structure used for the interconnect architecture of semiconductor chips. More specifically the use of imprint lithography to fabricate dual damascene structures in a dielectric and the fabrication of dual damascene structured molds.
    Type: Grant
    Filed: March 13, 2004
    Date of Patent: October 14, 2008
    Assignee: International Business Machines Corporation
    Inventors: Matthew E. Colburn, Kenneth Raymond Carter, Gary M. McClelland, Dirk Pfeiffer
  • Publication number: 20080249282
    Abstract: A method of synthesizing a poly(9,9-disubstituted-fluorene) includes reacting a 9,9-disubstituted-fluorene with an alkyl lithium in the presence of a catalytic amount of a nickel amine complex. The 9,9-disubstituted-fluorene includes solubility-enhancing substituents in the 9-position and leaving groups in the 2-position and the 7-position. The product poly(9,9-disubstituted-fluorene)s are fluorescent conjugated polymers that are useful as, for example, blue light-emitting materials.
    Type: Application
    Filed: April 3, 2008
    Publication date: October 9, 2008
    Inventors: Kenneth Raymond Carter, Sarav Bharat Jhaveri
  • Patent number: 7151029
    Abstract: A multi-stable memory or data storage element is used in crosspoint data-storage arrays, as a switch, a memory device, or as a logical device. The general structure of the multi-stable element comprises a layered, composite medium that both transports and stores charge disposed between two electrodes. Dispersed within the composite medium are discrete charge storage particles that trap and store charge. The multi-stable element achieves an exemplary bi-stable characteristic, providing a switchable device that has two or more stable states reliably created by the application of a voltage to the device. The voltages applied to achieve the “on” state, the “off” state, any intermediate state, and to read the state of the multi-stable element are all of the same polarity.
    Type: Grant
    Filed: June 14, 2005
    Date of Patent: December 19, 2006
    Assignee: International Business Machines Corporation
    Inventors: Luisa Dominica Bozano, Kenneth Raymond Carter, John Campbell Scott
  • Patent number: 6987689
    Abstract: A multi-stable memory or data storage element is used in crosspoint data-storage arrays, as a switch, a memory device, or as a logical device. The general structure of the multi-stable element comprises a layered, composite medium that both transports and stores charge disposed between two electrodes. Dispersed within the composite medium are discrete charge storage particles that trap and store charge. The multi-stable element achieves an exemplary bi-stable characteristic, providing a switchable device that has two or more stable states reliably created by the application of a voltage to the device. The voltages applied to achieve the “on” state, the “off” state, any intermediate state, and to read the state of the multi-stable element are all of the same polarity. The multi-stable element is stable, cyclable, and reproducible in both the “on” state and the “off” state. The storage medium has a relatively high resistance in both its on and off states.
    Type: Grant
    Filed: August 20, 2003
    Date of Patent: January 17, 2006
    Assignee: International Business Machines Corporation
    Inventors: Luisa Dominica Bozano, Kenneth Raymond Carter, John Campbell Scott