Abstract: One process used to remove material from a surface is ion etching. In certain cases, ion etching involves delivery of both ions and a reactive gas to a substrate. The disclosed embodiments permit local high pressure delivery of reactive gas to a substrate while maintaining a much lower pressure on portions of the substrate that are outside of the local high pressure delivery area. In many cases, the low pressure is achieved by providing an injection head that confines the high pressure reactant delivery to a small area and vacuums away excess reactants and byproducts as they leave this small area and before they enter the larger substrate processing region. The disclosed injection head may be used to increase throughput while minimizing deleterious collisions between ions and other species present in the substrate processing region. The disclosed injection head may also be used in other types of semiconductor wafer processing.

Abstract: One process used to remove material from a surface is ion etching. In certain cases, ion etching involves delivery of both ions and a reactive gas to a substrate. The disclosed embodiments permit local high pressure delivery of reactive gas to a substrate while maintaining a much lower pressure on portions of the substrate that are outside of the local high pressure delivery area. In many cases, the low pressure is achieved by providing an injection head that confines the high pressure reactant delivery to a small area and vacuums away excess reactants and byproducts as they leave this small area and before they enter the larger substrate processing region. The disclosed injection head may be used to increase throughput while minimizing deleterious collisions between ions and other species present in the substrate processing region. The disclosed injection head may also be used in other types of semiconductor wafer processing.

Abstract: One process that may be used to remove material from a surface is ion etching. In certain cases, ion etching involves delivery of both ions and a reactive gas to a substrate. The disclosed embodiments permit local high pressure delivery of reactive gas to a substrate while maintaining a much lower pressure on portions of the substrate that are outside of the local high pressure delivery area. The low pressure is achieved by confining the high pressure reactant delivery to a small area and vacuuming away excess reactants and byproducts as they leave this small area and before they enter the larger substrate processing region. The disclosed techniques may be used to increase throughput while minimizing deleterious collisions between ions and other species present in the substrate processing region.

Abstract: The cockroach bait station is an eradication system that is adapted for use with cockroaches. The cockroach bait station is comprises a bait and a bait station. The bait is a high energy, and therefore highly attractive, bait source that is laced with a poison that is known to be effective in: 1) limiting the future activities of cockroaches after ingestion; and, 2) is readily shared and transferred within a community of cockroaches.

Abstract: A substrate processing system that includes a substrate processing chamber having one or more sidewalls that at least partially define a substrate processing region and extend away from a bottom wall of the substrate processing chamber at an obtuse angle; a source material holder configured to hold a source material within the substrate processing region; a plasma gun operatively coupled to introduce a plasma beam into the substrate processing region; one or more magnets operatively arranged to generate a magnetic field that guides the plasma beam to the source material holder; and a substrate carrier configured to hold one or more substrates within the substrate processing region.

Abstract: Systems, methods, and devices are directed to an electronic device that includes a first wireless communication module configured to facilitate transmission and reception of data via a wireless communication link and a first secure element while a wireless communication device includes a processor, an operating system executed by the processor, a second wireless communication module configured to facilitate transmission and reception of data via the wireless communication link, and a second secure element. The second secure element exchanges information with the first secure element via the wireless communication link to establish a secure channel within the wireless communication link, and the wireless communication device employs logic configured to route the data to the second secure element for processing prior to forwarding the data to the operating system, upon establishing the secure channel.

Abstract: A substrate processing system that includes a substrate processing chamber having one or more sidewalls that at least partially define a substrate processing region and extend away from a bottom wall of the substrate processing chamber at an obtuse angle; a source material holder configured to hold a source material within the substrate processing region; a plasma gun operatively coupled to introduce a plasma beam into the substrate processing region; one or more magnets operatively arranged to generate a magnetic field that guides the plasma beam to the source material holder; and a substrate carrier configured to hold one or more substrates within the substrate processing region.

Abstract: One process that may be used to remove material from a surface is ion etching. In certain cases, ion etching involves delivery of both ions and a reactive gas to a substrate. The disclosed embodiments permit local high pressure delivery of reactive gas to a substrate while maintaining a much lower pressure on portions of the substrate that are outside of the local high pressure delivery area. The low pressure is achieved by confining the high pressure reactant delivery to a small area and vacuuming away excess reactants and byproducts as they leave this small area and before they enter the larger substrate processing region. The disclosed techniques may be used to increase throughput while minimizing deleterious collisions between ions and other species present in the substrate processing region.

Abstract: Systems, methods, and devices are directed to an electronic device that includes a first wireless communication module configured to facilitate transmission and reception of data via a wireless communication link and a first secure element while a wireless communication device includes a processor, an operating system executed by the processor, a second wireless communication module configured to facilitate transmission and reception of data via the wireless communication link, and a second secure element. The second secure element exchanges information with the first secure element via the wireless communication link to establish a secure channel within the wireless communication link, and the wireless communication device employs logic configured to route the data to the second secure element for processing prior to forwarding the data to the operating system, upon establishing the secure channel.

Abstract: This invention relates to flame retardant compositions which have utility for coating substrates. In particular, this invention relates to flame-retardant plastisol compositions based on polyvinylchloride (PVC), plasticizer and zeolites that are useful as coatings, backings and adhesives for flexible substrates such as woven and non-woven fabrics, carpets and the like.

Abstract: A spit holder assembly comprises a longitudinally oriented hollow body having a triangular cross section and opposite ends, and an outwardly directed transverse flange connected to the body between the opposite ends thereof. A lower portion of the body on one side of the transverse flange comprises a base constructed and arranged to fit within an opening in a worktable with the flange functioning as a stop. An upper portion of the body on the other side of the flange includes at least a pair of spaced apart longitudinally oriented slots constructed and arranged to receive and hold a spit.

Abstract: A method and apparatus for delivering a polishing fluid to a chemical mechanical polishing surface is provided. In one embodiment, an apparatus for delivering a polishing fluid to a chemical mechanical polishing surface includes an arm having a plurality of holes formed in the arm for retaining a plurality of polishing fluid delivery tubes. Each of the tubes are disposed through one of the holes and coupled to the arm. The number of holes exceeds the number of tubes, thereby allowing the distribution of polishing fluid to a polishing surface and correspondingly the local polishing rates across a diameter of a substrate being polished to be controlled.

Abstract: A slotted torque wrench has an elongated stem that extends between a handle and a socket for a nut. The slot extends through one face of the socket and at least partially along the stem. A torque limiter couples the socket to the handle.

Abstract: A method and apparatus for delivering a polishing fluid to a chemical mechanical polishing surface is provided. In one embodiment, an apparatus for delivering a polishing fluid to a chemical mechanical polishing surface includes an arm having a plurality of holes formed in the arm for retaining a plurality of polishing fluid delivery tubes. Each of the tubes are disposed through one of the holes and coupled to the arm. The number of holes exceeds the number of tubes, thereby allowing the distribution of polishing fluid to a polishing surface and correspondingly the local polishing rates across a diameter of a substrate being polished to be controlled.

Abstract: An aquaculture system comprising a water retaining aquaculture vessel with a bottom wall and side walls along with an air lift system being provided for aerating the water. Particulate material is removed from the bottom of the vessel through conventional extraction apparatus. In addition, a plurality of discrete open-cell foam substrate members are provided with substantial surface contact area for substantially continuous circulation through the aquaculture vessel, with the substrate members comprising an open cell foam member having a density of between about 1.1 to 1.7 pounds per cubic foot, and fabricated from a matrix material having a specific gravity of between about 1.8 and 2.2. The surface area as well as the bulk of the foam substrate members have typically between about 25 and 100 individual cells per inch. The aquaculture vessel is provided with water recirculation as well as introduction of oxygen into the water through recirculation or recycling of the foam substrate members.