Patents by Inventor Kenneth Weible

Kenneth Weible has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Illumination system for a microlithographic projection exposure apparatus
    Patent number: 9575414
    Abstract: Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.
    Type: Grant
    Filed: November 19, 2015
    Date of Patent: February 21, 2017
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Johannes Wangler, Heiko Siekmann, Kenneth Weible, Ralf Scharnweber, Manfred Maul, Markus Deguenther, Michael Layh, Axel Scholz, Uwe Spengler, Reinhard Voelkel
  • ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    Publication number: 20160077446
    Abstract: Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.
    Type: Application
    Filed: November 19, 2015
    Publication date: March 17, 2016
    Inventors: Johannes Wangler, Heiko Siekmann, Kenneth Weible, Ralf Scharnweber, Manfred Maul, Markus Deguenther, Michael Layh, Axel Scholz, Uwe Spengler, Reinhard Voelkel
  • Illumination system for a microlithographic projection exposure apparatus
    Patent number: 9217930
    Abstract: Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.
    Type: Grant
    Filed: February 6, 2013
    Date of Patent: December 22, 2015
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Johannes Wangler, Heiko Siekmann, Kenneth Weible, Ralf Scharnweber, Manfred Maul, Markus Deguenther, Michael Layh, Axel Scholz, Uwe Spengler, Reinhard Voelkel
  • Optical beam deflecting element, illumination system including same, and related method
    Patent number: 9025131
    Abstract: An optical beam deflecting element may be used effectively as an energy distribution manipulator in an illumination system to vary the energy distribution within a given spatial intensity distribution in a pupil plane of the illumination system substantially without changing the shape and size and position of illuminated areas in the pupil plane.
    Type: Grant
    Filed: January 25, 2012
    Date of Patent: May 5, 2015
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Daniel Runde, Florian Doll, Reinhard Voelkel, Kenneth Weible, Gundula Weiss, Michael Gerhard
  • ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    Publication number: 20130148092
    Abstract: Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.
    Type: Application
    Filed: February 6, 2013
    Publication date: June 13, 2013
    Applicant: Carl Zeiss SMT GmbH
    Inventors: Johannes Wangler, Heiko Siekmann, Kenneth Weible, Ralf Scharnweber, Manfred Maul, Markus Deguenther, Michael Layh, Axel Scholz, Uwe Spengler, Reinhard Voelkel
  • Illumination system for a microlithographic projection exposure apparatus
    Patent number: 8395756
    Abstract: Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.
    Type: Grant
    Filed: August 12, 2008
    Date of Patent: March 12, 2013
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Johannes Wangler, Heiko Siekmann, Kenneth Weible, Ralf Scharnweber, Manfred Maul, Markus Deguenther, Michael Layh, Axel Scholz, Uwe Spengler, Reinhard Voelkel
  • OPTICAL BEAM DEFLECTING ELEMENT, ILLUMINATION SYSTEM INCLUDING SAME, AND RELATED METHOD
    Publication number: 20120249988
    Abstract: An optical beam deflecting element may be used effectively as an energy distribution manipulator in an illumination system to vary the energy distribution within a given spatial intensity distribution in a pupil plane of the illumination system substantially without changing the shape and size and position of illuminated areas in the pupil plane.
    Type: Application
    Filed: January 25, 2012
    Publication date: October 4, 2012
    Applicant: CARL ZEISS SMT GMBH
    Inventors: Daniel Runde, Florian Doll, Reinhard Voelkel, Kenneth Weible, Gundula Weiss, Michael Gerhard
  • ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    Publication number: 20090021716
    Abstract: Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.
    Type: Application
    Filed: August 12, 2008
    Publication date: January 22, 2009
    Applicant: CARL ZEISS SMT AG
    Inventors: Johannes Wangler, Heiko Siekmann, Kenneth Weible, Ralf Scharnweber, Manfred Maul, Markus Deguenther, Michael Layh, Axel Scholz, Uwe Spengler, Reinhard Voelkel