Abstract: A syringe holder includes a base plate portion, and a tube portion which is formed in a tubular shape having an axis direction being provided along a plate thickness direction of the base plate portion and through which a syringe is capable of being inserted from one side to another side in the axis direction. The syringe includes a tubular syringe body and a flange portion which protrudes from the syringe body to a radially outer side. The tube portion includes a flange support portion which supports the flange portion of the inserted syringe from the other side in the axis direction and a flange abutting portion which is arranged on the one side in the axis direction and on a radially outer side, relative to the flange support portion, and which is capable of abutting, in the radial direction, the flange portion supported by the flange support portion.

Abstract: A method of plasma processing includes cyclically performing a cycle that includes a first phase followed by a second phase. The first phase includes applying a first source power (SP) pulse to an SP electrode to generate plasma in a processing chamber. The first SP pulse has a first SP power level for the duration of the first phase and terminates at the end of the first phase. The second phase includes applying a bias power (BP) pulse to a BP electrode coupled to a target substrate in the processing chamber. The BP pulse has a first BP power level for the duration of the second phase and terminates at the end of the second phase. A third phase may be included between the first and second phases during which no bias power is applied to the BP electrode.

Abstract: An object of the present invention is to remove particles from a liquid formulation filled in a syringe immediately before administration. The present invention provides a formulation for injection in which a solution is filled in a syringe, wherein the syringe comprises: a barrel formed in a cylindrical shape having a leading end portion and a base end portion, wherein the leading end portion is provided with a nozzle hole for externally ejecting a solution held therein; and a filter disposed within the barrel in a position on a base end side of the nozzle hole, the filter is provided in such a manner as to allow the solution to flow from the base end side to a leading end side through the filter, the filter is a membrane, and a material of the membrane includes one or more selected from polyether sulfone (PES), polyvinylidene fluoride (PVDF), polysulfone (PS), and an acrylic copolymer.

Abstract: A method of plasma processing includes cyclically performing a cycle including the steps of performing a glow phase and performing an afterglow phase. The glow phase includes providing a first SP pulse comprising a first SP power level for a first duration to an SP electrode to generate a capacitively coupled plasma in a plasma processing chamber. The first SP pulse terminates at the end of the glow phase. The afterglow phase is performed after the glow phase and includes providing a BP pulse train to a BP electrode coupled to a target substrate within the plasma processing chamber in an afterglow of the capacitively coupled plasma for a second duration between about 10 ?s and about 100 ?s. The BP pulse train includes a plurality of BP spikes. Each of the plurality of BP spikes is a DC pulse that has a first BP power level.

Abstract: A syringe is provided, the syringe includes a rod side member having a lock part configured to be locked to the rod in the first state; a first pushing part configured to be pushed against the rod toward the distal side in the first state; and a second pushing part configured to be pushed against the rod toward the distal side in the second state; the rod including a first lock part; a first pushed part; and a second pushed part, the barrel side member including: a lock-release part configured to release lock between the lock part and the first lock part of the rod with the rod pushed to the predetermined position in the barrel in the first state.

Abstract: Provided is a syringe including: a barrel; and a partitioning device, the partitioning device including: a cylindrical housing; and an inner plug, the housing including an engaging part configured to engage with the inner plug in an out-of-communication state, the inner plug including an engaged part configured to engage with the engaging part from a proximal side in the out-of-communication state, and the partitioning device being configured so that, when a pressing force is applied from the proximal side, one of the engaging part and the engaged part rides over an other one thereof and release engagement between the engaging part and the engaged part, thereby allowing the inner plug to have the proximal side space inside the housing and the distal side space inside the housing communicating with each other to achieve communication between the proximal side space inside the barrel and the distal side space inside the barrel.

Abstract: A syringe is provided with a barrel having a distal end part provided with an outlet opening; a filter disposed closer to a proximal side than the outlet opening inside the barrel; and a holding member. A proximal side part disposed closer to the proximal side than the filter of the holding member has a flow path, a proximal side space into which the medicine flows through the flow path is provided on the proximal side of the filter, a distal side space into which the medicine flows from the proximal side space via the filter is provided on the distal side of the filter, and an area of the outlet opening is smaller than an area of the proximal side space, smaller than an area of the distal side space, and smaller than an area of the flow path.

Abstract: Provided is a syringe cap including a projection extending in the circumferential direction of a cap body, wherein the projection includes an apex located radially outward of the cap body from the outer circumferential surface of the cap body, a first inclined surface having a starting end located at the apex and having a terminal end located at a position on the side closer to the proximal end of the cap body than the starting end is, and a second inclined surface having a starting end located at the apex and on the outer circumferential surface of the cap body having a terminal end located at a position on the side closer to the distal end of the cap body than the starting end is, on the outer circumferential surface of the cap body, and the shortest distance from the starting end to the terminal end of the first inclined surface is smaller than the shortest distance from the starting end to the terminal end of the second inclined surface.

Abstract: A treatment method is provided that includes an embedding step of embedding an organic film in an undercoat film in which a depression is formed; and an etching step of performing etching, after the embedding step, until at least a portion of a top of the undercoat film is exposed.

Abstract: A method of plasma processing includes cyclically performing a cycle including the steps of performing a glow phase and performing an afterglow phase. The glow phase includes providing a first SP pulse comprising a first SP power level for a first duration to an SP electrode to generate a capacitively coupled plasma in a plasma processing chamber. The first SP pulse terminates at the end of the glow phase. The afterglow phase is performed after the glow phase and includes providing a BP pulse train to a BP electrode coupled to a target substrate within the plasma processing chamber in an afterglow of the capacitively coupled plasma for a second duration between about 10 ?s and about 100 ?s. The BP pulse train includes a plurality of BP spikes. Each of the plurality of BP spikes is a DC pulse that has a first BP power level.

Abstract: A plasma processing apparatus which forms a first film on a pattern formed on a substrate having dense and coarse areas, and then performs sputtering or etching on the first film.

Abstract: A method includes performing a first on phase including applying an SP pulse to an SP electrode to generate plasma, performing a second on phase after the first on phase, performing a corner etch phase after the second on phase, and performing a by-product management phase after the corner etch phase. The SP pulse terminates at the end of the first on phase. The second on phase includes applying a first BP pulse to a BP electrode coupled to a target substrate. The first BP pulse includes a first BP power level and accelerates ions of the plasma toward to target substrate. The corner etch phase includes applying a BP spike including a second BP power level greater than the first BP power level. The duration of the BP spike is less than the duration of the first BP pulse.