Patents by Inventor Kensuke Tsuchiya

Kensuke Tsuchiya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Sealant discharge nozzle and sealant discharge apparatus
    Patent number: 11491507
    Abstract: An object is to suppress a variation in amount of a sealant that is applied on an object to be sealed. There is provided a sealant discharge nozzle configured such that a sealant from a cartridge is discharged from a discharge hole of the sealant discharge nozzle. The sealant discharge nozzle has a leading end portion comprising a pair of side wall portions; and a connecting wall portion configured to connect the pair of side wall portions with each other and provided in cooperation with the pair of side wall portions to form a first recess that is open on one side in a first direction perpendicular to an axial direction of the sealant discharge nozzle, and on a leading end side. The discharge hole has an opening formed on a first recess side of the connecting wall portion.
    Type: Grant
    Filed: June 19, 2020
    Date of Patent: November 8, 2022
    Assignee: THE UNIVERSITY OF TOKYO
    Inventors: Masayoshi Okamoto, Tadamichi Mawatari, Kensuke Tsuchiya, Masayoshi Zaitsu, Naohiro Otsuki, Junji Tsuchiya, Youhei Matsumoto
  • SEALANT DISCHARGE NOZZLE AND SEALANT DISCHARGE APPARATUS
    Publication number: 20200406289
    Abstract: An object is to suppress a variation in amount of a sealant that is applied on an object to be sealed. There is provided a sealant discharge nozzle configured such that a sealant from a cartridge is discharged from a discharge hole of the sealant discharge nozzle. The sealant discharge nozzle has a leading end portion comprising a pair of side wall portions; and a connecting wall portion configured to connect the pair of side wall portions with each other and provided in cooperation with the pair of side wall portions to form a first recess that is open on one side in a first direction perpendicular to an axial direction of the sealant discharge nozzle, and on a leading end side. The discharge hole has an opening formed on a first recess side of the connecting wall portion.
    Type: Application
    Filed: June 19, 2020
    Publication date: December 31, 2020
    Applicant: THE UNIVERSITY OF TOKYO
    Inventors: Masayoshi OKAMOTO, Tadamichi MAWATARI, Kensuke TSUCHIYA, Masayoshi ZAITSU, Naohiro OTSUKI, Junji TSUCHIYA, Youhei MATSUMOTO
  • Pattern correction method, exposure mask, manufacturing method of exposure mask, and manufacturing method of semiconductor device
    Patent number: 8221942
    Abstract: A pattern correction method includes: a correction step of performing pattern correction on a semiconductor circuit pattern having plural transistors as component elements; an order of priority recognition step of recognizing an order of priority set with respect to the plural transistors prior to the pattern correction at the correction step; and a condition adjustment step of adjusting correction conditions for the pattern correction with reference to the transistor having a high priority recognized at the order of priority recognition step in the pattern correction at the correction step.
    Type: Grant
    Filed: January 15, 2010
    Date of Patent: July 17, 2012
    Assignee: Sony Corporation
    Inventors: Mikio Oka, Kaoru Koike, Kensuke Tsuchiya, Hidetoshi Ohnuma
  • PATTERN CORRECTION METHOD, EXPOSURE MASK, MANUFACTURING METHOD OF EXPOSURE MASK, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
    Publication number: 20100183960
    Abstract: A pattern correction method includes: a correction step of performing pattern correction on a semiconductor circuit pattern having plural transistors as component elements; an order of priority recognition step of recognizing an order of priority set with respect to the plural transistors prior to the pattern correction at the correction step; and a condition adjustment step of adjusting correction conditions for the pattern correction with reference to the transistor having a high priority recognized at the order of priority recognition step in the pattern correction at the correction step.
    Type: Application
    Filed: January 15, 2010
    Publication date: July 22, 2010
    Applicant: SONY CORPORATION
    Inventors: Mikio Oka, Kaoru Koike, Kensuke Tsuchiya, Hidetoshi Ohnuma