Patents by Inventor Kensuke Watanabe

Kensuke Watanabe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190157046
    Abstract: An activated gas generation apparatus includes a gas jet flow straightener below an activated gas generating electrode group and a nozzle constituent part. The gas jet flow straightener receives a plurality of nozzle passing activated gases as a whole at an inlet part of a gas flow-straightening passage. The gas flow-straightening passage is formed so that the outlet opening area of an outlet part is set to be narrower than the inlet opening area of the inlet part, and the cylindrical gas jet of each of the plurality of nozzle passing activated gases is converted into a linear flow-straightened activated gas by the flow-straightening action of the gas flow-straightening passage.
    Type: Application
    Filed: May 27, 2016
    Publication date: May 23, 2019
    Applicant: TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION
    Inventors: Kensuke WATANABE, Shinichi NISHIMURA, Yoshihito YAMADA
  • Patent number: 10297423
    Abstract: A plasma generation apparatus according to the present invention includes an electrode cell and a housing that encloses an electrode cell. The electrode cell includes a first electrode, a second electrode facing the first electrode with interposition of a discharge space therebetween, and dielectrics arranged on main surfaces of the electrodes. The plasma generation apparatus further includes a pipe passage configured to directly supply a source gas from the outside of the housing to the discharge space without being connected to a space within the housing where the electrode cell is not arranged.
    Type: Grant
    Filed: April 23, 2012
    Date of Patent: May 21, 2019
    Assignee: TOSHIBA MITSUBISHI—ELECTRIC INDUSTRIAL SYSTEMS CORPORATION
    Inventors: Yoichiro Tabata, Kensuke Watanabe
  • Patent number: 10150085
    Abstract: A membrane-forming dope for carbon membranes, comprising polyphenylene oxide in an amount giving a concentration of 15 to 40 wt. % in the membrane-forming dope, and sulfur in an amount giving a ratio of 0.1 to 5.0 wt. %, preferably 0.2 to 3.0 wt. %, of the total weight of the polyphenylene oxide and the sulfur, both of which are dissolved in a solvent that can dissolve these components. A hollow fiber carbon membrane is produced by molding the membrane-forming dope for carbon membranes in a hollow shape by means of a wet or dry-wet spinning method using a double tubular nozzle, subjecting the molded product to an infusibilization treatment by heating at 150 to 350° C. in the air, and then subjecting it to a carbonization treatment by heating at 600 to 800° C. in an inert atmosphere or under vacuum. When the product molded in a hollow shape by means of a wet or dry-wet spinning method is subjected to an infusibilization treatment by heating in the air while stretching the product with a stress of 0.002 to 0.
    Type: Grant
    Filed: October 9, 2015
    Date of Patent: December 11, 2018
    Assignee: NOK Corporation
    Inventors: Masataka Kondo, Kensuke Watanabe, Hirokazu Yamamoto
  • Patent number: 10150086
    Abstract: A hollow fiber carbon membrane is produced by preparing a membrane-forming dope for carbon membranes by dissolving polyphenylene oxide in an amount giving a concentration of 15 to 40 wt. % in the membrane-forming dope, and sulfur in an amount giving a ratio of 0.2 to 3.0 wt. % based on the polyphenylene oxide, in a solvent capable of dissolving these components; preparing the membrane-forming dope for carbon membranes into a hollow shape by means of a spinning method in accordance with a non-solvent induced separation method using a double annular nozzle; performing a crosslinking treatment at 200 to 240° C. in the air; then performing an infusibilization treatment by heating at 250 to 350° C.; and further performing a carbonization treatment by heating at 450 to 850° C. in an inert atmosphere or under vacuum.
    Type: Grant
    Filed: December 11, 2015
    Date of Patent: December 11, 2018
    Assignee: NOK Corporation
    Inventors: Kensuke Watanabe, Hirokazu Yamamoto
  • Publication number: 20180291509
    Abstract: In an activated gas generation apparatus, metal electrodes are formed on a bottom surface of a dielectric electrode, and are disposed so as to face each other with a central region of the dielectric electrode interposed therebetween in plan view. The metal electrodes face each other along the Y direction. A wedge-shaped stepped part is provided so as to protrude upward in the central region on an upper surface of the dielectric electrode. The wedge-shaped stepped part is formed so as to have a shorter formation width in the Y direction as approaching each of a plurality of gas spray holes in plan view.
    Type: Application
    Filed: January 18, 2016
    Publication date: October 11, 2018
    Applicant: Toshiba Mitsubishi-Electric Industrial Systems Corporation
    Inventors: Kensuke WATANABE, Shinichi NISHIMURA, Yoichiro TABATA
  • Publication number: 20180243700
    Abstract: A membrane-forming dope for non-solvent induced phase separation methods, the membrane-forming dope comprising 15 to 40 wt. % of polysulfone-based resin, 5 to 60 wt. % of polyvinylpyrrolidone, and 0.1 to 10 wt. % of polyoxyethylene sorbitan fatty acid ester, all of which are dissolved in a water-soluble organic solvent solution. A porous hollow fiber membrane is produced by spinning the membrane-forming dope by a non-solvent induced phase separation method using an aqueous liquid as a core liquid. The obtained high-performance porous hollow fiber membrane can be used as a water vapor permeable membrane used in fuel cells, because its water vapor permeability is not significantly reduced even after use in a high temperature environment such as, for example, 100 to 120° C.
    Type: Application
    Filed: August 5, 2016
    Publication date: August 30, 2018
    Inventors: Takatoshi SATO, Kensuke WATANABE
  • Publication number: 20180223433
    Abstract: The present invention has an object to provide, as a film formation process system of remote plasma type, a radical gas generation system in which a process can be performed evenly on, for example, a target object having a large area through the use of a radical gas. In a radical gas generation system (500) according to the present invention, a process chamber apparatus (200) includes a table (201) that causes a target object (202) to rotate. A radical gas generator (100) includes a plurality of discharge cells (70). Each of the plurality of discharge cells (70) includes an opening (102). The opening (102) is connected to the inside of the process chamber apparatus (200) and faces the target object (202). Through the opening (102), a radical gas (G2) is output.
    Type: Application
    Filed: October 29, 2014
    Publication date: August 9, 2018
    Applicant: Toshiba Mitsubishi-Electric Industrial Systems Corporation
    Inventors: Kensuke WATANABE, Yoichiro TABATA, Shinichi NISHIMURA
  • Publication number: 20180200687
    Abstract: A gas jetting apparatus capable of uniformly jetting, even onto a treatment-target object having a high-aspect-ratio groove, a gas into the groove. The gas jetting apparatus includes a gas jetting cell unit for jetting a gas toward a treatment-target object. The gas jetting cell unit includes a first cone-shaped member and a second cone-shaped member. A gap is formed between a side surface of a first cone shape and a side surface of the second cone-shaped member. Apex sides of the cone-shaped members face the treatment-target object.
    Type: Application
    Filed: October 29, 2014
    Publication date: July 19, 2018
    Applicant: Toshiba Mitsubishi-Electric Industrial Systems Corporation
    Inventors: Yoichiro TABATA, Kensuke WATANABE, Shinichi NISHIMURA
  • Publication number: 20170320020
    Abstract: A hollow fiber carbon membrane is produced by preparing a membrane-forming dope for carbon membranes by dissolving polyphenylene oxide in an amount giving a concentration of 15 to 40 wt. % in the membrane-forming dope, and sulfur in an amount giving a ratio of 0.2 to 3.0 wt. % based on the polyphenylene oxide, in a solvent capable of dissolving these components; preparing the membrane-forming dope for carbon membranes into a hollow shape by means of a spinning method in accordance with a non-solvent induced separation method using a double annular nozzle; performing a crosslinking treatment at 200 to 240° C. in the air; then performing an infusibilization treatment by heating at 250 to 350° C.; and further performing a carbonization treatment by heating at 450 to 850° C. in an inert atmosphere or under vacuum.
    Type: Application
    Filed: December 11, 2015
    Publication date: November 9, 2017
    Inventors: Kensuke WATANABE, Hirokazu YAMAMOTO
  • Publication number: 20170296978
    Abstract: A membrane-forming dope for carbon membranes, comprising polyphenylene oxide in an amount giving a concentration of 15 to 40 wt. % in the membrane-forming dope, and sulfur in an amount giving a ratio of 0.1 to 5.0 wt. %, preferably 0.2 to 3.0 wt. %, of the total weight of the polyphenylene oxide and the sulfur, both of which are dissolved in a solvent that can dissolve these components. A hollow fiber carbon membrane is produced by molding the membrane-forming dope for carbon membranes in a hollow shape by means of a wet or dry-wet spinning method using a double tubular nozzle, subjecting the molded product to an infusibilization treatment by heating at 150 to 350° C. in the air, and then subjecting it to a carbonization treatment by heating at 600 to 800° C. in an inert atmosphere or under vacuum. When the product molded in a hollow shape by means of a wet or dry-wet spinning method is subjected to an infusibilization treatment by heating in the air while stretching the product with a stress of 0.002 to 0.
    Type: Application
    Filed: October 9, 2015
    Publication date: October 19, 2017
    Inventors: Masataka KONDO, Kensuke WATANABE, Hirokazu YAMAMOTO
  • Publication number: 20170275758
    Abstract: The present invention provides a gas jetting apparatus for a film formation apparatus. The gas jetting apparatus is capable of uniformly jetting, even onto a treatment-target object having a high-aspect-ratio groove, a gas into the groove. The gas jetting apparatus (100) according to the present invention includes a gas jetting cell unit (23) for rectifying a gas and jetting the rectified gas into the film formation apparatus (200). The gas jetting cell unit (23) has a fan shape internally formed with a gap (d0) serving as a gas route. A gas in a gas dispersion supply unit (99) enters from a wider-width side of the fan shape into the gap (d0), and, due to the fan shape, the gas is rectified, accelerated, and output from a narrower-width side of the fan shape into the film formation apparatus (200).
    Type: Application
    Filed: October 29, 2014
    Publication date: September 28, 2017
    Applicant: Toshiba Mitsubishi-Electric Industrial Systems Corporation
    Inventors: Yoichiro TABATA, Kensuke WATANABE, Shinichi NISHIMURA
  • Publication number: 20170241021
    Abstract: An electric discharge generator and power supply device of electric discharge generator includes a radical gas generation apparatus, a process chamber apparatus, and an n-phase inverter power supply device. The radical gas generation apparatus is located adjacent to the process chamber apparatus. The radical gas generation apparatus includes a plurality of (n) discharge cells. The n-phase inverter power supply device includes a power supply circuit configuration offering a means to control output of n-phase alternating current voltages and variably controls, according to positions of the plurality of discharge cells, the alternating current voltages of different phases.
    Type: Application
    Filed: October 29, 2014
    Publication date: August 24, 2017
    Applicant: Toshiba Mitsubishi-Electric Industrial Systems Corporation
    Inventors: Yoichiro TABATA, Kensuke WATANABE, Shinichi NISHIMURA
  • Patent number: 9348740
    Abstract: A memory access controller includes a semiconductor circuit configured to classify into a first group of cores having made an exclusive access request to shared memory and a second group of cores not having made an exclusive access request to the shared memory, multiple cores capable of accessing the shared memory; detect a core having completed the exclusive access among the first group of cores; and send to a core among the first group of cores and standing by for the exclusive access, a notification of release from a standby state, when detecting a core having completed the exclusive access.
    Type: Grant
    Filed: December 6, 2012
    Date of Patent: May 24, 2016
    Assignee: FUJITSU LIMITED
    Inventors: Takahisa Suzuki, Koichiro Yamashita, Hiromasa Yamauchi, Koji Kurihara, Kensuke Watanabe
  • Patent number: 8857371
    Abstract: An apparatus for generating a dielectric-barrier discharge gas including a high-energy radical gas, at a high density and with high efficiency. A flat-plate-like first electrode and a flat-plate-like second electrode are arranged in opposite positions, and a dielectric body is arranged between the two electrodes. A discharge space is located between the first electrode and the dielectric body, within a gap between the first electrode and the dielectric body. The discharge space has three sides which are gas shielded and a fourth side which opens to end surfaces of the first electrode and the dielectric body. A cooling section cools at least the first electrode and a gas supply section supplies a raw material gas to the discharge space part. A dielectric-barrier discharge is generated in the discharge space part by applying an AC voltage to the first electrode and the second electrode.
    Type: Grant
    Filed: August 31, 2007
    Date of Patent: October 14, 2014
    Assignee: Toshiba Mitsubishi-Electric Industrial Systems Corporation
    Inventors: Yoichiro Tabata, Kensuke Watanabe
  • Publication number: 20140174359
    Abstract: A plasma generation apparatus according to the present invention includes an electrode cell and a housing that encloses the electrode cell. The electrode cell includes a first electrode, a discharge space, a second electrode, dielectrics, and a pass-through formed in a central portion in a plan view. An insulating tube having a cylindrical shape is arranged within the pass-through. Ejection holes are formed in a side surface of the cylindrical shape. The plasma generation apparatus further includes a precursor supply part that is connected to a hollow portion of the insulating tube and configured to supply a metal precursor.
    Type: Application
    Filed: April 19, 2012
    Publication date: June 26, 2014
    Applicant: TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION
    Inventors: Yoichiro Tabata, Kensuke Watanabe
  • Publication number: 20140123897
    Abstract: The present invention provides a plasma generation apparatus that, even when a source gas is supplied into a housing where an electrode cell is arranged, does not cause a problem of corrosion of a power feed part and an electrode surface arranged in the housing and a problem of deposition of a metal in a place within the housing other than a discharge part of the electrode cell. A plasma generation apparatus (100) according to the present invention includes an electrode cell and a housing (16) that encloses the electrode cell. The electrode cell includes a first electrode (3), a second electrode (1) facing the first electrode (3) with interposition of a discharge space (6) therebetween, and dielectrics (2a, 2b) arranged on main surfaces of the electrodes (1, 3).
    Type: Application
    Filed: April 23, 2012
    Publication date: May 8, 2014
    Applicant: TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION
    Inventors: Yoichiro Tabata, Kensuke Watanabe
  • Publication number: 20100193129
    Abstract: An apparatus for generating a dielectric-barrier discharge gas including a high-energy radical gas, at a high density and with high efficiency. A flat-plate-like first electrode and a flat-plate-like second electrode are arranged in opposite positions, and a dielectric body is arranged between the two electrodes. A discharge space is located between the first electrode and the dielectric body, within a gap between the first electrode and the dielectric body. The discharge space has three sides which are gas shielded and a fourth side which opens to end surfaces of the first electrode and the dielectric body. A cooling section cools at least the first electrode and a gas supply section supplies a raw material gas to the discharge space part. A dielectric-barrier discharge is generated in the discharge space part by applying an AC voltage to the first electrode and the second electrode.
    Type: Application
    Filed: August 31, 2007
    Publication date: August 5, 2010
    Inventors: Yoichiro Tabata, Kensuke Watanabe
  • Publication number: 20090242474
    Abstract: Case 10 is characterized by providing a pair of mutually facing surfaces, and a pair of side surfaces which join that pair of surfaces, opening 11 which is the entrance is formed on one of the surfaces 10a of the opposing pair of surfaces, while the opening 12 which is the exit is formed on the other surface 10b, and spaces S1 and S2 are provided between one surface 10a and the hollow fiber membrane stack 20, and between the other surface 10b and the hollow fiber membrane stack 20 in the entire domain in the direction from one side extreme of case 10 to the other side extreme, with the exception of the part where sealing and fixing devices 31 and 32 are provided, moreover, no space is configured between the pair of side surfaces and the hollow fiber membrane stack 20.
    Type: Application
    Filed: April 1, 2008
    Publication date: October 1, 2009
    Applicant: NOK Corporation
    Inventors: Hiroyasu Shirakawa, Kensuke Watanabe
  • Publication number: 20080108758
    Abstract: A thermoplastic elastomer blend, which comprises 15 to 85% by weight of a cross-linked acrylic rubber-dispersed polyamide-based thermoplastic elastomer, and 85 to 15% by weight of a polyester-based thermoplastic elastomer, or which comprises 20 to 90% by weight of a cross-linked acrylic rubber-dispersed polyamide-based thermoplastic elastomer, and 80 to 10% by weight of a polyamide-based thermoplastic elastomer. The cross-linked acrylic rubber-dispersed polyamide-based thermoplastic elastomer is used also as a blend with both of the polyester-based thermoplastic elastomer and the polyamide-based thermoplastic elastomer. The thermoplastic elastomer blend is effectively used as joint boot-molding material, etc., having distinguished heat resistance and low temperature characteristics, applicable also to the joint boot inboard side.
    Type: Application
    Filed: August 30, 2005
    Publication date: May 8, 2008
    Inventors: Kensuke Watanabe, Yoshifumi Kojima, Yoshiyuki Takeishi
  • Patent number: 7182555
    Abstract: An object of the invention is to reliably control chip, particularly that produced in profiling.
    Type: Grant
    Filed: November 19, 2002
    Date of Patent: February 27, 2007
    Assignee: Mitsubishi Materials Corporation
    Inventors: Yoshihiro Kitagawa, Kensuke Watanabe, Osamu Ichinoseki, Kenji Sugawara