Abstract: The present invention relates to a process for removing volatile organic compounds (VOCs) from a liquid stream using multiple membranes that are permeable to the VOCs but impermeable to the liquid.

Abstract: A process for continuously stripping a polymer dispersion comprising a heat exchanger with minimal internal obstructions for the stripper. The process is particularly adapted to dispersions that are heat and shear sensitive. The process is able to extract hydrophobic VOC's more efficiently than a single, jacketed tube design.

Abstract: An effluent gas stream treatment system for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations. The effluent gas stream treatment system comprises a pre-oxidation treatment unit, which may for example comprise a scrubber, an oxidation unit such an electrothermal oxidizer, and a post-oxidation treatment unit, such as a wet or dry scrubber. The effluent gas stream treatment system of the invention may utilize an integrated oxidizer, quench and wet scrubber assembly, for abatement of hazardous or otherwise undesired components from the effluent gas stream. Gas or liquid shrouding of gas streams in the treatment system may be provided by high efficiency inlet structures.

Abstract: A process for stabilizing biocide compounds in a polymer dispersion requiring stripping of the dispersion using steam or an inert gas.

Abstract: An effluent gas stream treatment system for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations. The effluent gas stream treatment system comprises a pre-oxidation treatment unit, which may for example comprise a scrubber, an oxidation unit such an electrothermal oxidizer, and a post-oxidation treatment unit, such as a wet or dry scrubber. The effluent gas stream treatment system of the invention may utilize an integrated oxidizer, quench and wet scrubber assembly, for abatement of hazardous or otherwise undesired components from the effluent gas stream. Gas or liquid shrouding of gas streams in the treatment system may be provided by high efficiency inlet structures.

Abstract: A process for continuously stripping a polymer dispersion comprising a heat exchanger with minimal internal obstructions for the stripper. The process is particularly adapted to dispersions that are heat and shear sensitive. The process is able to extract hydrophobic VOC's more efficiently than a single, jacketed tube design.

Abstract: An effluent gas stream treatment system for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations. The effluent gas stream treatment system comprises a pre-oxidation treatment unit, which may for example comprise a scrubber, an oxidation unit such an electrothermal oxidizer, and a post-oxidation treatment unit, such as a wet or dry scrubber. The effluent gas stream treatment system of the invention may utilize an integrated oxidizer, quench and wet scrubber assembly, for abatement of hazardous or otherwise undesired components from the effluent gas stream. Gas or liquid shrouding of gas streams in the treatment system may be provided by high efficiency inlet structures.

Abstract: An effluent gas stream treatment system for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations. The effluent gas stream treatment system comprises a pre-oxidation treatment unit, which may for example comprise a scrubber, an oxidation unit such an electrothermal oxidizer, and a post-oxidation treatment unit, such as a wet or dry scrubber. The effluent gas stream treatment system of the invention may utilize an integrated oxidizer, quench and wet scrubber assembly, for abatement of hazardous or otherwise undesired components from the effluent gas stream. Gas or liquid shrouding of gas streams in the treatment system may be provided by high efficiency inlet structures.

Abstract: An effluent gas stream treatment system for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations. The effluent gas stream treatment system comprises a pre-oxidation treatment unit, which may for example comprise a scrubber, an oxidation unit such an electrothermal oxidizer, and a post-oxidation treatment unit, such as a wet or dry scrubber. The effluent gas stream treatment system of the invention may utilize an integrated oxidizer, quench and wet scrubber assembly, for abatement of hazardous or otherwise undesired components from the effluent gas stream. Gas or liquid shrouding of gas streams in the treatment system may be provided by high efficiency inlet structures.

Abstract: This invention relates to a process for cleaning reactors. The process utilizes a solvent fed from multiple pressure sources to clean reactors of residual polymers. The reactors are equipped with agitators and stationary nozzles aimed at the agitator blades. The agitator is rotated during cleaning. The process may also utilize heated aqueous base to clean heat exchangers in external loops. In one aspect, a mixture of at least one organic solvent and aqueous base are utilized to clean certain reactors.

Abstract: This invention relates to a process for cleaning reactors. The process utilizes a solvent fed from multiple pressure sources to clean reactors of residual polymers. The reactors are equipped with agitators and stationary nozzles aimed at the agitator blades. The agitator is rotated during cleaning. The process may also utilize heated aqueous base to clean heat exchangers in external loops. In one aspect, a mixture of at least one organic solvent and aqueous base are utilized to clean certain reactors.

Abstract: An auto-switching sub-atmospheric pressure gas delivery system, for dispensing gas to a gas-consuming process unit, e.g., a semiconductor manufacturing tool, without the occurrence of pressure spikes or flow perturbations.

Abstract: An effluent gas stream treatment system for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations. The effluent gas stream treatment system comprises a pre-oxidation treatment unit, which may for example comprise a scrubber, an oxidation unit such an electrothermal oxidizer, and a post-oxidation treatment unit, such as a wet or dry scrubber. The effluent gas stream treatment system of the invention may utilize an integrated oxidizer, quench and wet scrubber assembly, for abatement of hazardous or otherwise undesired components from the effluent gas stream. Gas or liquid shrouding of gas streams in the treatment system may be provided by high efficiency inlet structures.

Abstract: An effluent gas stream treatment system for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations. The effluent gas stream treatment system comprises a pre-oxidation treatment unit, which may for example comprise a scrubber, an oxidation unit such an electrothermal oxidizer, and a post-oxidation treatment unit, such as a wet or dry scrubber. The effluent gas stream treatment system of the invention may utilize an integrated oxidizer, quench and wet scrubber assembly, for abatement of hazardous or otherwise undesired components from the effluent gas stream. Gas or liquid shrouding of gas streams in the treatment system may be provided by high efficiency inlet structures.

Abstract: An effluent gas stream treatment system for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations. The effluent gas stream treatment system comprises an oxidation unit to which an oxygen-containing gas such as ozone may be added, with input of energy (e.g., thermal, radio frequency, electrical, microwave, etc.), to effect oxidation of oxidizable species in the effluent, such as halocompounds (e.g., chlorofluorocarbons, perfluorocarbons), CO, NF3, nitrogen oxides, and sulfur oxides). The effluent gas stream treatment system may include a wet scrubber associated with the oxygen-containing gas source, so that the gas stream is contacted with the oxygen-containing gas during the wet scrubbing operation, to enhance removal of oxidizable species in the gas stream during treatment.

Abstract: An effluent gas stream treatment system for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations. The effluent gas stream treatment system comprises a pre-oxidation treatment unit, which may for example comprise a scrubber, an oxidation unit such an electrothermal oxidizer, and a post-oxidation treatment unit, such as a wet or dry scrubber. The effluent gas stream treatment system of the invention may utilize an integrated oxidizer, quench and wet scrubber assembly, for abatement of hazardous or otherwise undesired components from the effluent gas stream. Gas or liquid shrouding of gas streams in the treatment system may be provided by high efficiency inlet structures.

Abstract: A gas/liquid interface structure for transport of a gas stream from an upstream source of same to a downstream processing unit, comprising first and second flow passage members defining an annular volume therebetween, with the second flow passage member extending downwardly to a lower elevation than the lower end of the first flow passage member, with an outer wall member enclosingly circumscribing the second flow passage member and defining therewith an enclosed interior annular volume, and with a liquid flow port in the outer wall member for introducing liquid into the enclosed interior annular volume. The second flow passage member includes an upper liquid-permeable portion in liquid flow communication with the enclosed interior annular volume, whereby liquid from such volume can "weep" through the permeable portion and form a falling liquid film on interior surface portions of the second flow passage member, as a protective liquid interface for the second flow passage member.