Abstract: A skate (e.g., an ice skate) for a user (e.g., a hockey player). The skate comprises a skate boot for receiving a foot of the user and a skating device (e.g., a blade and a blade holder) disposed beneath the skate boot to engage a skating surface. The skate boot may be constructed by molding (e.g., injection molding) so as to have useful performance and/or characteristics (e.g., reduced weight; enhanced fit, comfort and range of motion; enhanced appearance; etc.) while being cost-effectively manufactured.

Abstract: A skate (e.g., an ice skate) for a user (e.g., a hockey player). The skate comprises a skate boot for receiving a foot of the user and a skating device (e.g., a blade and a blade holder) disposed beneath the skate boot to engage a skating surface. The skate boot may be constructed by molding (e.g., injection molding) so as to have useful performance and/or characteristics (e.g., reduced weight; enhanced fit, comfort and range of motion; enhanced appearance; etc.) while being cost-effectively manufactured.

Abstract: A skate (e.g., an ice skate) for a user (e.g., a hockey player). The skate comprises a skate boot for receiving a foot of the user and a skating device (e.g., a blade and a blade holder) disposed beneath the skate boot to engage a skating surface. The skate boot may be constructed by molding (e.g., injection molding) so as to have useful performance and/or characteristics (e.g., reduced weight; enhanced fit, comfort and range of motion; enhanced appearance; etc.) while being cost-effectively manufactured.

Abstract: A skate (e.g., an ice skate) for a user (e.g., a hockey player). The skate comprises a skate boot for receiving a foot of the user and a skating device (e.g., a blade and a blade holder) disposed beneath the skate boot to engage a skating surface. The skate boot may be constructed by molding (e.g., injection molding) so as to have useful performance and/or characteristics (e.g., reduced weight; enhanced fit, comfort and range of motion; enhanced appearance; etc.) while being cost-effectively manufactured.

Abstract: A method of fabricating a memory device is described. During the process of forming the memory cell area and the periphery area of a semiconductor device a photoresist layer is formed on the memory cell area before the spacers are formed on the sidewalls of the gates. Therefore, the memory cell area is prevented from being damaged to mitigate the leakage current problem during the process of forming spacers in the periphery circuit area.

Abstract: This invention describes methods for producing gate oxide regions in periphery regions of semiconductor chips, wherein the gate oxide regions have improved electrical properties. The methods involve the deposition of a barrier layer over the periphery of the semiconductor chip to prevent the introduction of contaminating nitrogen atoms into the periphery during a nitridation step in the core region of the semiconductor chip. By preventing the contamination of the gate areas of the periphery, the gate oxide regions so produced have increased breakdown voltages and increased reliability. This invention describes methods for etching the barrier layers used to protect the periphery from tunnel oxide nitridation. Semiconductor devices made with the methods of this invention have longer expected lifetimes and can be manufactured with higher device density.