Abstract: Two-stage bake photoresists with releasable quenchers for fabricating back end of line (BEOL) interconnects are described. In an example, a photolyzable composition includes an acid-deprotectable photoresist material having substantial transparency at a wavelength, a photo-acid-generating (PAG) component having substantial transparency at the wavelength, and a base-generating component having substantial absorptivity at the wavelength.

Abstract: An adjustable armature assembly device is disclosed where the assembled armature may be adjusted rotationally and longitudinally during figure modeling when a sculptor desires to alter the original figure composition and size. In addition, a means for detaching sections of a work during and after the sculpting process is disclosed. An embodiment of the invention comprises a plurality of appendage members, of hand and feet members, a torso member, a head member and inner surface threaded or unthreaded tubular sleeve segments used to assemble, adjust and disassemble armature appendages. Also, the head member is adjusted rotationally and longitudinally and can be removed by screw means and the armature is removed from a support structure by screw means using a threaded connector segment so that no unwanted armature protrusion extends from a completed work of art.