Abstract: The present disclosure relates to a semiconductor device manufacturing system. The semiconductor device manufacturing system can include a chamber, a slit valve configured to provide access to the chamber, a chuck disposed in the chamber and configured to hold a substrate, and a gas curtain device disposed between the chuck and the slit valve and configured to flow an inert gas to form a gas curtain. An example benefit of the gas curtain is to block an inflow of oxygen or moisture from entering the chamber to ensure a yield and reliability of the semiconductor manufacturing processes conducted in the chamber.

Abstract: The present disclosure relates to a semiconductor device manufacturing system. The semiconductor device manufacturing system can include a chamber, a slit valve configured to provide access to the chamber, a chuck disposed in the chamber and configured to hold a substrate, and a gas curtain device disposed between the chuck and the slit valve and configured to flow an inert gas to form a gas curtain. An example benefit of the gas curtain is to block an inflow of oxygen or moisture from entering the chamber to ensure a yield and reliability of the semiconductor manufacturing processes conducted in the chamber.

Abstract: The present disclosure relates to a semiconductor device manufacturing system. The semiconductor device manufacturing system can include a chamber, a slit valve configured to provide access to the chamber, a chuck disposed in the chamber and configured to hold a substrate, and a gas curtain device disposed between the chuck and the slit valve and configured to flow an inert gas to form a gas curtain. An example benefit of the gas curtain is to block an inflow of oxygen or moisture from entering the chamber to ensure a yield and reliability of the semiconductor manufacturing processes conducted in the chamber.

Abstract: The present disclosure relates to a semiconductor device manufacturing system. The semiconductor device manufacturing system can include a chamber, a slit valve configured to provide access to the chamber, a chuck disposed in the chamber and configured to hold a substrate, and a gas curtain device disposed between the chuck and the slit valve and configured to flow an inert gas to form a gas curtain. An example benefit of the gas curtain is to block an inflow of oxygen or moisture from entering the chamber to ensure a yield and reliability of the semiconductor manufacturing processes conducted in the chamber.

Abstract: An electronic form system and a method thereof. The method includes receiving a first business electronic form submitted by a user, reading a second business electronic form previously submitted by the user, and determining whether a first business time recorded by the first business electronic form is continuous and a second business time recorded by the second business electronic form and the first business time are at least partially overlapped. The first business electronic form is not stored if the first business time is not continuous and the second business time and the first business time are at least partially overlapped.

Abstract: A curtain assembly includes an elongated horizontal holding frame, a pair of spaced-apart hanging units, a curtain sheet, and an elongated horizontal plastic strip. The holding frame has an upper portion with a dovetail groove formed along the entire length thereof, and a hollow lower portion which is integrally formed with the upper portion and which has a bottom wall unit through which a slit is formed along the entire length of the frame. The hanging units are sleeved respectively around the holding frame and are adapted to be mounted on a wall so as to suspend the holding frame above a window that is formed through the wall. Each of the hanging units has a dovetail tongue engaged slidably in the groove of the holding frame. The sheet extends through the slit of the frame and has a folded annular upper end portion accommodated in the lower portion of the holding frame.