Patents by Inventor Kenta KAWAMURA

Kenta KAWAMURA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240058579
    Abstract: A catheter device includes a first catheter. The first catheter includes a first catheter shaft and an operating part that is attached to a proximal end portion of the first catheter shaft and operates the first catheter shaft. The operating part includes a rotary operation section that rotates the first catheter shaft about a central axis of the first catheter shaft, and a bending operation section that bends a distal end portion of the first catheter shaft.
    Type: Application
    Filed: October 30, 2023
    Publication date: February 22, 2024
    Applicant: Asahi Intecc Co., Ltd.
    Inventors: Yuta KUBO, Kenta KAWAMURA
  • Publication number: 20230329782
    Abstract: A catheter includes a hollow shaft; a distal end electrode provided on a distal end portion of the hollow shaft; a proximal end electrode provided on a proximal end portion of the hollow shaft, and which is electrically connected to the distal end electrode via the hollow shaft; and a connection portion which is capable of being attached to and detached from the proximal end electrode and which, by being attached to the proximal end electrode, electrically connects an external voltage output device and the proximal end electrode via a lead wire.
    Type: Application
    Filed: June 23, 2023
    Publication date: October 19, 2023
    Applicant: ASAHI INTECC CO., LTD.
    Inventors: Kenta KAWAMURA, Shota MIHARA, Kei SUGAWARA, Kensuke SAKATA
  • Publication number: 20230014792
    Abstract: To provide a sintered body with improved impact resistance due to impact absorption through plastic deformation before brittle fracture for an impact exceeding the fracture resistance of the sintered body, and/or a method for producing the sintered body. A sintered body including: zirconia containing a stabilizer; and a region in which an impact mark is formed when an impact force is applied.
    Type: Application
    Filed: December 8, 2020
    Publication date: January 19, 2023
    Applicant: TOSOH CORPORATION
    Inventors: Taku FUKIAGE, Hitoshi NAGAYAMA, Kenta KAWAMURA, Takashi TSUKIMORI, Hiroyuki FUJISAKI
  • Patent number: 11521873
    Abstract: According to one embodiment, a processing information management system includes: an abnormality analyzer configured to generate abnormality occurrence data of a target wafer based on processing location information, the processing location information collected based on a first sensor outputting a first sensor signal according to a detected processing state, the first sensor provided in a wafer processing apparatus; and an integration system configured to integrate the abnormality occurrence data into wafer map data corresponding to the target wafer.
    Type: Grant
    Filed: February 14, 2020
    Date of Patent: December 6, 2022
    Assignee: KIOXIA CORPORATION
    Inventors: Hidekazu Saeki, Kenta Kawamura
  • Publication number: 20220332649
    Abstract: A sintered body that includes zirconia containing a stabilizing element; and a plastic deformation region, wherein the stabilizing element includes at least one rare-earth element other than yttrium, and the stabilizing element content is 1.5% or more by mole and less than 3.0% by mole.
    Type: Application
    Filed: April 11, 2022
    Publication date: October 20, 2022
    Applicant: TOSOH CORPORATION
    Inventors: Kenta KAWAMURA, Taku FUKIAGE, So NISHIYAMA, Hitoshi NAGAYAMA
  • Publication number: 20210090921
    Abstract: According to one embodiment, a processing information management system includes: an abnormality analyzer configured to generate abnormality occurrence data of a target wafer based on processing location information, the processing location information collected based on a first sensor outputting a first sensor signal according to a detected processing state, the first sensor provided in a wafer processing apparatus; and an integration system configured to integrate the abnormality occurrence data into wafer map data corresponding to the target wafer.
    Type: Application
    Filed: February 14, 2020
    Publication date: March 25, 2021
    Applicant: KIOXIA CORPORATION
    Inventors: Hidekazu SAEKI, Kenta KAWAMURA