Abstract: An optical sheet 5 is an optical sheet, at least a first surface of the optical sheet has unevenness. A sparkle contrast of the first surface measured in conformity with JIS C 1006: 2019 is 4% or less. An arithmetic average roughness Ra of the first surface measured in conformity with JIS B 0601: 2001 (with an assessment length set to 290 ?m) may be 0.6 ?m or less. A peak count RPc of the first surface measured in conformity with JIS B 0601: 2001 (with an assessment length set to 290 ?m) may be 16 or more.

Abstract: An optical sheet 5 is an optical sheet, at least a first surface of the optical sheet has unevenness. A sparkle contrast of the first surface measured in conformity with JIS C 1006: 2019 is 4% or less. An arithmetic average roughness Ra of the first surface measured in conformity with JIS B 0601: 2001 (with an assessment length set to 290 ?m) may be 0.6 ?m or less. A peak count RPc of the first surface measured in conformity with JIS B 0601: 2001 (with an assessment length set to 290 ?m) may be 16 or more.

Abstract: An optical sheet 5 is an optical sheet, at least a first surface of the optical sheet has unevenness. A sparkle contrast of the first surface measured in conformity with JIS C 1006: 2019 is 4% or less. An arithmetic average roughness Ra of the first surface measured in conformity with JIS B 0601: 2001 (with an assessment length set to 290 µm) may be 0.6 µm or less. A peak count RPc of the first surface measured in conformity with JIS B 0601: 2001 (with an assessment length set to 290 µm) may be 16 or more.

Abstract: An adjusting method for adjusting an imprint apparatus includes a preparation step of preparing a sample for evaluating a state in which a contact region of a test mold is in contact with an imprint material supplied on a substrate; an evaluation step of evaluating the sample; and an adjustment step of adjusting the imprint apparatus based on a result of evaluation obtained in the evaluation step. The contact region includes a flat region which does not include a pattern, the evaluation in the evaluation step includes a first evaluation, which is an evaluation of a state of the imprint material in the flat region, and the imprint apparatus is adjusted based on a result of the first evaluation in the adjustment step.

Abstract: An adjusting method for adjusting an imprint apparatus includes a preparation step of preparing a sample for evaluating a state in which a contact region of a test mold is in contact with an imprint material supplied on a substrate; an evaluation step of evaluating the sample; and an adjustment step of adjusting the imprint apparatus based on a result of evaluation obtained in the evaluation step. The contact region includes a flat region which does not include a pattern, the evaluation in the evaluation step includes a first evaluation, which is an evaluation of a state of the imprint material in the flat region, and the imprint apparatus is adjusted based on a result of the first evaluation in the adjustment step.