Abstract: A cleaning method of an immersion liquid includes supplying an immersion liquid on a surface of a cleaning substrate. The immersion liquid is to be used in a liquid immersion lithography apparatus. The cleaning substrate has a substrate and an organic film laminated on a top face side of the substrate. The immersion liquid is allowed to move on the substrate to remove contaminants from the immersion liquid.

Abstract: A ruthenium sputtering target, wherein a Si content is 10 to 100 wtppm, a total content of unavoidable impurities excluding gas components is 50 wtppm or less, and a remainder is Ru. By suppressing the crystal growth of ruthenium or a ruthenium alloy and reducing the generation of coarse crystal grains, arcing that occurs during sputtering is minimized, particle generation is reduced, and yield is improved.

Abstract: A ruthenium sputtering target, wherein a Si content is 10 to 100 wtppm, a total content of unavoidable impurities excluding gas components is 50 wtppm or less, and a remainder is Ru. By suppressing the crystal growth of ruthenium or a ruthenium alloy and reducing the generation of coarse crystal grains, arcing that occurs during sputtering is minimized, particle generation is reduced, and yield is improved.

Abstract: A variable displacement pump includes: a first pressure control chamber; a second pressure control chamber; a spring arranged to urge the cam ring in a second swing direction; a hydraulic pressure supply valve arranged to be opened by a predetermined hydraulic pressure, and thereby to introduce a control hydraulic pressure to the first control chamber; a connection passage formed in the housing or the cam ring, and arranged to connect the first pressure control chamber and the second pressure control chamber; and a relief circuit arranged to connect the second pressure control chamber and a low pressure side, to be opened or closed in accordance with a swing position of the cam ring, and to be closed when the cam ring is swung by a predetermined amount in the first direction.

Abstract: A cleaning method of an immersion liquid includes supplying an immersion liquid on a surface of a cleaning substrate. The immersion liquid is to be used in a liquid immersion lithography apparatus. The cleaning substrate has a substrate and an organic film laminated on a top face side of the substrate. The immersion liquid is allowed to move on the substrate to remove contaminants from the immersion liquid.

Abstract: A variable displacement pump includes: a first pressure control chamber; a second pressure control chamber; a spring arranged to urge the cam ring in a second swing direction; a hydraulic pressure supply valve arranged to be opened by a predetermined hydraulic pressure, and thereby to introduce a control hydraulic pressure to the first control chamber; a connection passage formed in the housing or the cam ring, and arranged to connect the first pressure control chamber and the second pressure control chamber; and a relief circuit arranged to connect the second pressure control chamber and a low pressure side, to be opened or closed in accordance with a swing position of the cam ring, and to be closed when the cam ring is swung by a predetermined amount in the first direction.

Abstract: This disclosure relates to an organic zener diode having one electrode and one counter electrode, and an organic layer arrangement formed between the electrode and the counter electrode, wherein the organic layer arrangement includes the following organic layers: an electrically n-doped charge carrier injection layer on the electrode side, made from a mixture of an organic matrix material and an n-dopant, an electrically p-doped charge carrier injection layer on the counter electrode side, made from a mixture of another organic matrix material and a p-dopant, and an electrically undoped organic intermediate layer that is arranged between the electrically n-doped charge carrier injection layer on the electrode side and the electrically p-doped charge carrier injection layer on the counter electrode side. An electronic circuit arrangement with an organic zener diode and method for operating an organic zener diode are also provided.

Abstract: A cleaning method of an immersion liquid includes supplying an immersion liquid on a surface of a cleaning substrate. The immersion liquid is to be used in a liquid immersion lithography apparatus. The cleaning substrate has a substrate and an organic film laminated on a top face side of the substrate. The immersion liquid is allowed to move on the substrate to remove contaminants from the immersion liquid.

Abstract: A ruthenium sputtering target, wherein a Si content is 10 to 100 wtppm, a total content of unavoidable impurities excluding gas components is 50 wtppm or less, and a remainder is Ru. By suppressing the crystal growth of ruthenium or a ruthenium alloy and reducing the generation of coarse crystal grains, arcing that occurs during sputtering is minimized, particle generation is reduced, and yield is improved.

Abstract: This disclosure relates to an organic zener diode having one electrode and one counter electrode, and an organic layer arrangement formed between the electrode and the counter electrode, wherein the organic layer arrangement includes the following organic layers: an electrically n-doped charge carrier injection layer on the electrode side, made from a mixture of an organic matrix material and an n-dopant, an electrically p-doped charge carrier injection layer on the counter electrode side, made from a mixture of another organic matrix material and a p-dopant, and an electrically undoped organic intermediate layer that is arranged between the electrically n-doped charge carrier injection layer on the electrode side and the electrically p-doped charge carrier injection layer on the counter electrode side. An electronic circuit arrangement with an organic zener diode and method for operating an organic zener diode are also provided.

Abstract: Provided is a Fe—Al alloy sputtering target having an Al content of 1 to 23 at %, an oxygen content of 100 wt ppm or less, and the balance being Fe and inevitable impurities. Also, provided is a method of producing a Fe—Al alloy sputtering target having an Al content of 1 to 23 at %, an oxygen content of 100 wt ppm or less, and the balance being Fe and inevitable impurities, the method in which: a Fe raw material and an Al raw material, i.e., 1 to 23 at % of Al and the balance being Fe and inevitable impurities, are melted at a melting temperature of 1200 to 1600° C. and an average rate of raising temperature of 300° C./hr or more (wherein, when the Al content is 15 to 23 at %, the melting is performed at a melting temperature in the range of 1400 to 1600° C. and an average rate of raising temperature of 320° C./hr or more or at a melting temperature from 1200° C. to less than 1400° C.

Abstract: A pattern-forming method includes applying a photoresist composition to a substrate to form a resist film. The photoresist composition includes an acid generator and a first polymer that includes an acid-dissociable group. The resist film is exposed. The resist film is developed using a developer having an organic solvent content of 80 mass % or more to form a prepattern of the resist film. A polymer film having a phase separation structure in a space defined by the prepattern is formed using a composition that includes a plurality of second polymers. A part of the phase separation structure of the polymer film is removed.

Abstract: In a screw installation structure in which a first member, made of an iron-based material and having a male screw-threaded portion, is fixed to a second member, made of an aluminum-based material and having a screw hole, by screw-threaded connection between the male screw-threaded portion and the screw hole, a non-circular deformed portion is partly formed on an outer periphery of a portion of the first member, exposed from the screw hole of the second member. Also provided is an anti-rotation and anti-loosening member configured to be brought into fitted-engagement with the non-circular deformed portion. The anti-rotation and anti-loosening member, in fitted-engagement with the non-circular deformed portion, is brazed onto a surface of the second member in wall contact with a contact surface of the anti-rotation and anti-loosening member, so as to prevent loosening of the first member relative to the second member.

Abstract: A cleaning method of an immersion liquid includes supplying an immersion liquid on a surface of a cleaning substrate. The immersion liquid is to be used in a liquid immersion lithography apparatus. The cleaning substrate has a substrate and an organic film laminated on a top face side of the substrate. The immersion liquid is allowed to move on the substrate to remove contaminants from the immersion liquid.

Abstract: The invention relates to an electroluminescent light-emitting device comprising an arrangement of organic layers which are applied to a substrate, and also to a method for its production. The arrangement of organic layers comprises the following layers: at least one charge carrier transport layer consisting of organic material, and at least one light-emitting layer consisting of organic material. The arrangement of organic layers furthermore comprises at least one doped fullerene layer which has a doping that increases the electrical conductivity.

Abstract: A pattern-forming method includes applying a photoresist composition to a substrate to form a resist film. The photoresist composition includes an acid generator and a first polymer that includes an acid-dissociable group. The resist film is exposed. The resist film is developed using a developer having an organic solvent content of 80 mass % or more to form a prepattern of the resist film. A polymer film having a phase separation structure in a space defined by the prepattern is formed using a composition that includes a plurality of second polymers. A part of the phase separation structure of the polymer film is removed.

Abstract: An image display method for displaying images in layouts having a hierarchic structure of each layout is disclosed. The each layout is geometrically similar each other. A lower layer layout is enlarged to cover and hide an upper layer layout. At least one region of the lowest layout is divided by applying the layout to generate new regions and images are displayed in the new regions. The above process is repeated more than once.

Abstract: An image display apparatus includes an image generation unit and a display unit. The image generation unit generates an image in which subject shape images shaped along the outer shapes of subjects are superimposed on a parallel image includes an array of multiple images to hide the borders or spaces between the multiple images. The display unit scrolls the image generated by the image generation unit in a direction in which the multiple images are arrayed and continuously and sequentially scroll-displays the multiple images.

Abstract: A technology is disclosed for easily executing a compositional analysis to obtain a preferred composition. Image data is acquired, the image data is analyzed, and a plurality of composition lines expressing the feature of the image data on the composition are acquired. On the composition formed of the plurality of acquired composition lines, the ratio of lengths of two sides selected from the plurality of sides in the region partitioned by the plurality of composition lines is detected to be a specified value (for example, the golden ratio).

Abstract: A method of using a metal complex as an n-dopant for doping an organic semiconducting matrix material in order to alter the latter's electrical characteristics is provided. In order to provide n-doped organic semiconductors with matrix materials having a low reduction potential, while achieving high conductivities, the n-dopant is a neutral electron-rich metal complex with a neutral or charged transition metal atom as a central atom and having at least 16 valence electrons. The complex can be polynuclear and can possess at least one metal-metal bond. At least one ligand can form a ? complex with the central atom, which can be a bridge ligand, or it can contain at least one carbanion-carbon atom or a divalent atom. Methods for providing the novel n-dopants are provided.