Patents by Inventor Kentaro Motohara

Kentaro Motohara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Optical filtering device, defect inspection method and apparatus therefor
    Patent number: 9182592
    Abstract: An optical filtering device and an optical inspection apparatus for detecting a defect in a high sensitivity using an optical filtering device which includes a shutter array formed in a two-dimensionally on an optically opaque thin film produced on a SOI wafer and the SOI wafer is removed at portions thereof on the lower side of the shutter patterns to form perforation portions while working electrodes are formed at the remaining portion of the SOI wafer, a glass substrate having electrode patterns formed on the surface thereof and having the shutter array mounted thereon, and a power supply section for supplying electric power to the electrode patterns formed on the glass substrate and the working electrodes of the SOI wafer. And the working electrodes is controlled to cause the shutter patterns to carry out opening and closing movements with respect to the perforation portions to carry out optical filtering.
    Type: Grant
    Filed: February 3, 2012
    Date of Patent: November 10, 2015
    Assignees: HITACHI, LTD., THE UNIVERSITY OF TOKYO
    Inventors: Taketo Ueno, Toshihiko Nakata, Yukihiro Shibata, Shun'ichi Matsumoto, Atsushi Taniguchi, Hiroshi Toshiyoshi, Takuya Takahashi, Kentaro Motohara
  • Optical Filtering Device, Defect Inspection Method and Apparatus Therefor
    Publication number: 20140160471
    Abstract: An optical filtering device and an optical inspection apparatus for detecting a defect in a high sensitivity using an optical filtering device which includes a shutter array formed in a two-dimensionally on an optically opaque thin film produced on a SOI wafer and the SOI wafer is removed at portions thereof on the lower side of the shutter patterns to form perforation portions while working electrodes are formed at the remaining portion of the SOI wafer, a glass substrate having electrode patterns formed on the surface thereof and having the shutter array mounted thereon, and a power supply section for supplying electric power to the electrode patterns formed on the glass substrate and the working electrodes of the SOI wafer. And the working electrodes is controlled to cause the shutter patterns to carry out opening and closing movements with respect to the perforation portions to carry out optical filtering.
    Type: Application
    Filed: February 3, 2012
    Publication date: June 12, 2014
    Inventors: Taketo Ueno, Toshihiko Nakata, Yukihiro Shibata, Shun'ichi Matsumoto, Atsushi Taniguchi, Hiroshi Toshiyoshi, Takuya Takahashi, Kentaro Motohara