Abstract: Disclosed are an exposure mask, a photolithography method, a method of manufacturing a substrate and a display panel which can reduce the number of exposure masks required. The photolithography method uses an exposure mask 1a having a semi-transmissive pattern 12a, which blocks the light energy of the first wavelength band, and a semi-transmissive pattern 13a, which blocks the light energy of the second wavelength band. The photolithography method includes the steps of: forming a first photoresist material film 27; conducting an exposure process on the first photoresist material film 27 using the exposure mask 1a and the light energy of the first wavelength band; conducting a development process on the photoresist material film 27; forming a second photoresist film 28; conducting an exposure process on the second photoresist film 28 using the exposure mask 1a and the light energy of the second wavelength band; and conducting a development process on the second photoresist film 28.