Patents by Inventor Kenya Ohashi

Kenya Ohashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5729409
    Abstract: A highly corrosive-resistant metal having a high purity and a specific plane index is manufactured by ion beam deposition (IBD). A thin film having less defects and impurities is obtained. A magnetoresistant effect film for a magnetoresistant effect type magnetic head which is highly corrosion-resistant and exhibits excellent characteristics can be formed. In IBD according to the present invention, metal ions are provided with adjusted ion energy of 10 to 100 eV, and a metal having a particular mass number is selected by a mass separation electromagnet.
    Type: Grant
    Filed: January 19, 1996
    Date of Patent: March 17, 1998
    Assignee: Hitachi, Ltd.
    Inventors: Kenya Ohashi, Kiyoshi Miyake, Noriyuki Ohnaka, Moriaki Fuyama
  • Patent number: 5514477
    Abstract: A highly corrosive-resistant metal having a high purity and a specific plane index is manufactured by ion beam deposition (IBD). A thin film having less defects and impurities is obtained. A magnetoresistant effect film for a magnetoresistant effect type magnetic head which is highly corrosion-resistant and exhibits excellent characteristics can be formed. In IBD according to the present invention, metal ions are provided with adjusted ion energy of 10 to 100 eV, and a metal having a particular mass number is selected by a mass separation electromagnet.
    Type: Grant
    Filed: September 10, 1993
    Date of Patent: May 7, 1996
    Assignee: Hitachi, Ltd.
    Inventors: Kenya Ohashi, Kiyoshi Miyake, Noriyuki Ohnaka, Moriaki Fuyama
  • Patent number: 5456736
    Abstract: This invention provides a lap capable of reducing the pole recession produced between the substrate and the magnetic film when the air-bearing surface of a thin-film magnetic head is lapped, a lapping liquor used for such lapping, and a thin-film magnetic head having its air-bearing surface lapped by using them. Lapping is carried out by using a lap made of a material having both a phase of tin and a phase of brass with a greater rigidity in supporting the abrasive grains than tin, and a lapping liquor prepared by mixing an anionic surfactant (15) and an ampholytic surfactant (16). According to the present invention, it is possible to reduce the pole recession in the thin-film magnetic heads and to accordingly shorten the recording bit length of the magnetic discs.
    Type: Grant
    Filed: March 5, 1993
    Date of Patent: October 10, 1995
    Assignee: Hitachi, Ltd.
    Inventors: Yoshiharu Waki, Masayasu Fujisawa, Shigeo Aikawa, Kenya Ohashi, Yukihiro Isono
  • Patent number: 4828790
    Abstract: A nuclear power plant wherein surfaces of components contacting with nuclear reactor cooling water containing radioactive substances are coated with an oxide film, preferably being charged positively and/or containing chromium in an amount of 12% by weight or more, is prevented effectively from the deposition of radioactive substances thereon.
    Type: Grant
    Filed: November 6, 1987
    Date of Patent: May 9, 1989
    Assignee: Hitachi, Ltd.
    Inventors: Takashi Honda, Yasumasa Furutani, Kenya Ohashi, Eiji Kashimura, Akira Minato, Katsumi Ohsumi, Hisao Itou
  • Patent number: 4820473
    Abstract: The present invention is concerned with a method of reducing radioactivity in a nuclear plant by preliminarily forming oxide films on the surfaces of metallic structural members to be in contact with high-temperature and high-pressure reactor water containing radioactive substances before said metallic members are exposed to said reactor water. The method is characterized by the steps of subjecting said structural members to a first-step oxidation treatment of heating said structural members in an environment of a high temperature, and further subjecting the thus treated structural members to a second step oxidation treatment of heating said treated structural members in an environment having a higher oxidizing capacity than that of said environment in said first-step oxidation treatment to form a denser oxide film than an oxide film obtained in said first step oxidation treatment. According to the present invention, radioactivity in the nuclear plant can be reduced remarkably.
    Type: Grant
    Filed: November 6, 1985
    Date of Patent: April 11, 1989
    Assignee: Hitachi, Ltd.
    Inventors: Kenya Ohashi, Takashi Honda, Yasumasa Furutani, Eizi Kashimura, Akira Minato, Katsumi Ohsumi