Patents by Inventor Keon Woo Lee

Keon Woo Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9034561
    Abstract: The present invention relates to a photosensitive composition including an acrylate-based compound having an adamantyl structure. It is possible to manufacture an organic thin film that is easily stripped without decreasing the strength of the thin film by using the photosensitive composition.
    Type: Grant
    Filed: November 17, 2011
    Date of Patent: May 19, 2015
    Assignee: LG CHEM, LTD.
    Inventors: Keon Woo Lee, Sang Kyu Kwak, Changsoon Lee, Hyehyeon Kim
  • Patent number: 8835521
    Abstract: Disclosed are a photosensitive composition and a compound used in the same. If the composition provided through the present application is used, it is possible to form a thin film having improved adhesion strength of a pattern.
    Type: Grant
    Filed: July 16, 2012
    Date of Patent: September 16, 2014
    Assignee: LG Chem, Ltd.
    Inventor: Keon Woo Lee
  • Patent number: 8828644
    Abstract: The present application relates to a novel compound, a photosensitive composition comprising the same and a photosensitive material.
    Type: Grant
    Filed: January 24, 2013
    Date of Patent: September 9, 2014
    Assignee: LG Chem, Ltd.
    Inventors: Keon Woo Lee, Sang Kyu Kwak, Changsoon Lee, Hyehyeon Kim, Saehee Kim
  • Patent number: 8822112
    Abstract: The present application relates to a siloxane-based compound, a photosensitive composition including the same, and a photosensitive material.
    Type: Grant
    Filed: January 25, 2013
    Date of Patent: September 2, 2014
    Assignee: LG Chem, Ltd.
    Inventors: Keon Woo Lee, Sang Kyu Kwak, Changsoon Lee, Hyehyeon Kim, Saehee Kim
  • Patent number: 8742005
    Abstract: The present invention relates to an acrylate-based compound that includes an organic acid having two or more acrylate groups and one or more phenolic acid structures in one molecule, and a photosensitive composition including the same. It is possible to shorten a developing time in a photolithography process without damaging photosensitivity by using the photosensitive composition according to the present invention.
    Type: Grant
    Filed: November 18, 2011
    Date of Patent: June 3, 2014
    Assignee: LG Chem, Ltd.
    Inventors: Keon Woo Lee, Sang Kyu Kwak, Changsoon Lee, Hyehyeon Kim
  • Publication number: 20140080043
    Abstract: The present application relates to a siloxane-based compound, a photosensitive composition including the same, and a photosensitive material.
    Type: Application
    Filed: January 25, 2013
    Publication date: March 20, 2014
    Inventors: Keon Woo Lee, Sang Kyu Kwak, Changsoon Lee, Hyehyeon Kim, Saehee Kim
  • Publication number: 20140065543
    Abstract: The present application relates to a novel compound, a photosensitive composition comprising the same and a photosensitive material.
    Type: Application
    Filed: January 24, 2013
    Publication date: March 6, 2014
    Applicant: LG CHEM, LTD.
    Inventors: Keon Woo Lee, Sang Kyu Kwak, Changsoon Lee, Hyehyeon Kim, Saehee Kim
  • Patent number: 8552082
    Abstract: A novel alkali-soluble polymer compound including a dehydrogenated pimaric acid and/or its isomer as a repeating unit, and a photosensitive resin composition including the alkali-soluble polymer compound as an effective binder matrix are provided. A photosensitive resin composition using the alkali-soluble polymer compound including a dehydrogenated resin acid has excellent photosensitivity and developing characteristics cause a less deformation in a firing process, has excellent elasticity. Thus, the photosensitive resin composition is advantageous for curing various transparent photosensitive materials, in particular, materials of column spacers, an overcoat, a passivation layer, or the like, used for fabricating color filters of an LCD.
    Type: Grant
    Filed: April 28, 2011
    Date of Patent: October 8, 2013
    Assignee: LG Chem, Ltd.
    Inventors: Keon Woo Lee, Sang Kyu Kwak, Chang Soon Lee, Hye Hyeon Kim
  • Publication number: 20130244182
    Abstract: The present invention relates to a photosensitive composition including an acrylate-based compound having an adamantyl structure. It is possible to manufacture an organic thin film that is easily stripped without decreasing the strength of the thin film by using the photosensitive composition.
    Type: Application
    Filed: November 17, 2011
    Publication date: September 19, 2013
    Applicant: LG CHEM, LTD.
    Inventors: Keon Woo Lee, Sang Kyu Kwak, Changsoon Lee, Hyehyeon Kim
  • Patent number: 8409782
    Abstract: A photoresist composition is provided. The photoresist composition comprises two or more kinds of photoinitiators having different activation wavelengths whose difference is at least 20 nm. The photoresist composition has high sensitivity and forms a pattern whose thickness is easy to control depending on the exposure intensity through a slit or transflective mask. Further provided are a transparent thin film formed using the photoresist composition and a liquid crystal display device comprising the thin film.
    Type: Grant
    Filed: June 22, 2009
    Date of Patent: April 2, 2013
    Assignee: LG Chem, Ltd
    Inventors: Keon Woo Lee, Sung Hyun Kim, Sang Kyu Kwak, Dong Kung Oh, Chang Soon Lee, Chang Ho Cho, Kyoung Hoon Min
  • Patent number: 8389593
    Abstract: A composition for forming column spacers is provided. The composition comprises a radical polymerization inhibitor. The use of the composition enables simultaneous formation of a saturated pattern and a semi-transmissive pattern as column spacer patterns having different shapes, whose difference in thickness is controllable as desired although the sensitivity is slightly reduced, through a slit or semi-transmissive mask by varying the kind and amount of the radical polymerization inhibitor. Further provided are column spacers formed using composition and a liquid crystal display using the column spacers.
    Type: Grant
    Filed: December 23, 2009
    Date of Patent: March 5, 2013
    Assignee: LG Chem, Ltd.
    Inventors: Chang Ho Cho, Keon Woo Lee, Sung Hyun Kim, Sang Kyu Kwak, Dong Kung Oh, Chang Soon Lee
  • Publication number: 20130029271
    Abstract: Disclosed are a photosensitive composition and a compound used in the same. If the composition provided through the present application is used, it is possible to form a thin film having improved adhesion strength of a pattern.
    Type: Application
    Filed: July 16, 2012
    Publication date: January 31, 2013
    Applicant: LG CHEM, LTD.
    Inventor: Keon Woo Lee
  • Patent number: 8361696
    Abstract: The present invention relates to a polymer resin compound including a new polycyclic compound, and a photosensitive resin composition including the polymer resin compound as an effective binder matrix. In particular, the photosensitive resin composition according to the present invention uses a polymer resin compound, which includes a compound having double cyclic structure in one molecule as a monomer, as a binder matrix. Accordingly, the photosensitive resin composition has an excellent photosensitivity and an excellent developing property, and has a low distortion property during plastic processing. For this reason, the photosensitive resin composition has an advantage of curing various transparent photosensitive materials used to manufacture a color filter of a liquid crystal display, for example, a column spacer, an overcoat, a passivation material, and the like.
    Type: Grant
    Filed: January 15, 2008
    Date of Patent: January 29, 2013
    Assignee: LG Chem, Ltd.
    Inventors: Keon-Woo Lee, Sung-Hyun Kim, Chang-Ho Cho, Dong-Kung Oh, Min-Young Lim, Ji-Heum Yoo, Sang-Kyu Kwak
  • Patent number: 8300184
    Abstract: A color filter substrate is provided. In the color filter substrate, transparent protective films are formed on respective sub-pixels of a color filter. The color filter substrate has improved electric field characteristics without the need for additional optical or circuit compensation to achieve an improvement in contrast and a reduction in color difference.
    Type: Grant
    Filed: November 5, 2008
    Date of Patent: October 30, 2012
    Assignee: LG Chem, Ltd.
    Inventors: Keon Woo Lee, Sang Kyu Kwak, Jong Hwi Hwang, Beom Su Park, Chang Ho Cho, Sung Hyun Kim, Seung Hee Lee, Bog Ki Hong, Dong Kung Oh, Chang Soon Lee, Kyoung Hoon Min
  • Patent number: 8252507
    Abstract: A novel photoactive compound is provided. The photoactive compound has a structure represented by Formula 1: wherein R1, R2, R3, A, X, Y, n and m are as defined in the specification. The photoactive compound efficiently absorbs UV light. Accordingly, the photoactive compound has an improved ability to generate radicals and is efficiently photopolymerized with unsaturated bonds. Further provided is a photosensitive resin composition comprising the photoactive compound. The photosensitive resin composition has good sensitivity because it efficiently absorbs UV light. In addition, the photosensitive resin composition has excellent characteristics in terms of residual film ratio, mechanical strength and resistance to heat, chemicals and development. Therefore, the photosensitive resin composition is advantageously used in curing materials for column spacers, overcoats and passivation films of liquid crystal display devices.
    Type: Grant
    Filed: April 1, 2009
    Date of Patent: August 28, 2012
    Assignee: LG Chem, Ltd.
    Inventors: Chang Ho Cho, Sung Hyun Kim, Raisa Kharbash, Keon Woo Lee, Sang Kyu Kwak, Dong Kung Oh, Chang Soon Lee, Kyoung Hoon Min
  • Patent number: 8212979
    Abstract: The present invention provides a method of manufacturing a spacer for a liquid crystal display device that includes a step a) of forming a spacer body on a substrate body and a step b) forming a passivation film on the spacer body, a substrate for a liquid crystal display device having the spacer manufactured by the method, and a liquid crystal display device having the substrate for the liquid crystal display device.
    Type: Grant
    Filed: April 4, 2008
    Date of Patent: July 3, 2012
    Assignee: LG Chem, Ltd.
    Inventors: Keon-Woo Lee, Sang-Kyu Kwak, Dong-Kung Oh, Chang-Ho Cho, Sung-Hyun Kim
  • Publication number: 20120156619
    Abstract: The present invention relates to an acrylate-based compound that includes an organic acid having two or more acrylate groups and one or more phenolic acid structures in one molecule, and a photosensitive composition including the same. It is possible to shorten a developing time in a photolithography process without damaging photosensitivity by using the photosensitive composition according to the present invention.
    Type: Application
    Filed: November 18, 2011
    Publication date: June 21, 2012
    Applicant: LG CHEM, LTD.
    Inventors: Keon Woo LEE, Sang Kyu KWAK, Changsoon LEE, Hyehyeon KIM
  • Patent number: 8198462
    Abstract: The present invention relates to a dendritic photoactive compound that comprises oxime ester and a method for producing the same. Since the compound according to the present invention comprises two or more oxime ester groups and chromophores in one molecule at the same time, the solubility in respects to the organic solvent and the efficiency for producing a radical by absorbing ultraviolet rays are excellent. In addition, it can act as an effective initiator in respects to the photopolymerization of the unsaturated group, in particular, the acryl compound.
    Type: Grant
    Filed: July 15, 2008
    Date of Patent: June 12, 2012
    Assignee: LG Chem, Ltd.
    Inventors: Keon-Woo Lee, Chang-Ho Cho, Kyoung-Hoon Min, Raisa Kharbash, Chang-Soon Lee, Sung-Hyun Kim
  • Patent number: 8182979
    Abstract: A photopolymerization initiator is provided. The photopolymerization initiator contains at least one unsaturated double bond and at least one oxime ester group in the molecule. The photopolymerization initiator comprises a compound represented by Formula 1 or 2: wherein R1 and R2 are each independently —CH3, —C2H5, —C3H7 or —C6H5; wherein R3, R4 and R5 are each independently —CH3, —C2H5, —C3H7 or —C6H5. Further provided is a photosensitive resin composition comprising the photopolymerization initiator. The use of the photosensitive resin composition in photolithography reduces the formation of volatile residue during post-development baking.
    Type: Grant
    Filed: October 30, 2009
    Date of Patent: May 22, 2012
    Assignee: LG Chem, Ltd.
    Inventors: Keon Woo Lee, Raisa Kharbash, Chang Ho Cho, Sung Hyun Kim, Sang Kyu Kwak, Dong Kung Oh, Chang Soon Lee
  • Patent number: RE45219
    Abstract: Provided are a photoreactive polymer that includes a multi-cyclicmulticyclic compound at as its main chain and a method of preparing the same. The photoreactive polymer exhibits excellent thermal stability since it includes a multi-cyclicmulticyclic compound having a high glass transition temperature at as its main chain. In addition, the photoreactive polymer has a relatively large vacancy so that a photoreactive group can move relatively freely in the main chain therein. As a result, a slow photoreaction rate, which is a disadvantage of a conventional polymer material used to form an alignment layer for a liquid crystal display device, can be overcome.
    Type: Grant
    Filed: September 14, 2012
    Date of Patent: October 28, 2014
    Assignee: LG Chem, Ltd.
    Inventors: Heon Kim, Sung Ho Chun, Keon Woo Lee, Sung Joon Oh, Kyungjun Kim, Jungho Jo, Byung Hyun Lee, Min Young Lim, Hye Won Jeong