Patents by Inventor Kerstin Krahl

Kerstin Krahl has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of structuring a metal-containing layer
    Patent number: 6511918
    Abstract: The processes allow structuring of a metal-containing layer. The metal-containing layer is etched, using an etching mask, in a plasma-assisted etching gas atmosphere at a temperature of over 130° C. and in the presence of at least one halogen compound and at least one oxidizing agent. The concentration of the oxidizing agent is thereby set higher than the concentration of the halogen compound.
    Type: Grant
    Filed: June 4, 2001
    Date of Patent: January 28, 2003
    Assignee: Infineon Technologies AG
    Inventors: Stephan Wege, Kerstin Krahl
  • Method of structuring a metal-containing layer
    Publication number: 20020011461
    Abstract: The processes allow structuring of a metal-containing layer. The metal-containing layer is etched, using an etching mask, in a plasma-assisted etching gas atmosphere at a temperature of over 130° C. and in the presence of at least one halogen compound and at least one oxidizing agent. The concentration of the oxidizing agent is thereby set higher than the concentration of the halogen compound.
    Type: Application
    Filed: June 4, 2001
    Publication date: January 31, 2002
    Inventors: Stephan Wege, Kerstin Krahl