Abstract: The invention relates to a mask for a coating system having a covering device for an area not to be coated of a substrate to be coated, having a working side exposed to the material flow of the coating material, wherein the covering device for the area not to be coated is comprised of at least one disk that can be rotated, the disk upper side of which is positioned vertically to the material flow of the coating material. A further aspect of the invention includes a thermal and/or kinetic coating system having at least one spray device, and a corresponding method for producing a coated substrate.