Patents by Inventor Kesheng Feng

Kesheng Feng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070138142
    Abstract: The present invention is directed to a microetching composition comprising a source of cupric ions, acid, a nitrile compound, and a source of halide ions. Other additive, including organic solvents, a source of molybdenum ions, amines, polyamines, and acrylamides may also be included in the composition of the invention. The present invention is also directed to a method of microetching copper or copper alloy surfaces to increase the adhesion of the copper surface to a polymeric material, comprising the steps of contacting a copper or copper alloy surface with the composition of the invention, and thereafter bonding the polymeric material to the copper or copper alloy surface.
    Type: Application
    Filed: December 21, 2005
    Publication date: June 21, 2007
    Inventors: Kesheng Feng, Nilesh Kapadia, Steven Castaldi
  • Publication number: 20070051693
    Abstract: The present invention related to an improved microetching solution and a method of using the improved composition for roughening a metal surface and increasing the adhesion strength of a metal layer to a subsequently applied layer. The microetching composition is an aqueous solution comprising cupric ion source, a pyridine derivative, multiethyleneamine, and an acid. In a preferred embodiment, the microetching solution of the invention also comprises a source of halide ions such as sodium chloride or hydrochloric acid.
    Type: Application
    Filed: August 23, 2005
    Publication date: March 8, 2007
    Inventors: Kesheng Feng, Nilesh Kapadia, Steve Castaldi
  • Patent number: 7094523
    Abstract: An improved composition and method for the development of resists is disclosed. The method comprises contacting the resist with a developer solution comprising a source of alkalinity and a cationic surfactant which is an ethoxylated and/or propoxylated tallow amine. The improved developer solution more effectively removes the uncured resist from the resist coated surface.
    Type: Grant
    Filed: November 30, 2005
    Date of Patent: August 22, 2006
    Inventors: Kesheng Feng, Daniel J. Hart
  • Patent number: 6610760
    Abstract: A radiation curable composition contains an epoxy-functional silicone polymer, an iodonium photocatalyst and a non-fluorescing polycyclic aromatic compound containing at least one hydroxy, alkoxy or glycidyl ether substituent bonded to an aromatic carbon atom of the compound.
    Type: Grant
    Filed: July 18, 2001
    Date of Patent: August 26, 2003
    Assignee: General Electric Company
    Inventors: Richard Paul Eckberg, Kesheng Feng, Douglas Neckers
  • Publication number: 20020032249
    Abstract: A radiation curable composition contains an epoxy-functional silicone polymer, an iodonium photocatalyst and a non-fluorescing polycyclic aromatic compound containing at least one hydroxy, alkoxy or glycidyl ether substituent bonded to an aromatic carbon atom of the compound.
    Type: Application
    Filed: July 18, 2001
    Publication date: March 14, 2002
    Applicant: GENERAL ELECTRIC COMPANY
    Inventors: Richard PAUL Eckberg, Kesheng Feng, Douglas Neckers
  • Patent number: 5955002
    Abstract: A method for monitoring a property of a cationically curable composition comprising the steps of: adding a fluorescence probe to a cationically curable composition; measuring the intensity of the fluorescence emission of the probe at a wavelength at which intensity changes in response to changes occurring in the composition, wherein the fluorescence probe is a compound of the formula (I): ##STR1## where R.sup.1, R.sup.2 and R.sup.3 are the same or different and represent hydrogen, C.sub.1 -C.sub.20 alkyl, C.sub.1 -C.sub.20 alkoxyl, C.sub.2 -C.sub.20 alkenyl, C.sub.2 -C.sub.20 alkenoxyl, C.sub.3 -C.sub.27 cycloaliphatic, C.sub.7 -C.sub.27 aralkyl, C.sub.7 -C.sub.27 aralkoxyl, C.sub.7 -C.sub.27 alkaryl, or a substituted or unsubstituted diphenyl ether having the structure R.sup.9 --C.sub.6 H.sub.4 --O--C.sub.6 H.sub.4 R.sup.10 where R.sup.9 and R.sup.10 may be hydrogen, alkyl, aryl or aralkyl; and R.sup.1,R.sup.2 and R.sup.
    Type: Grant
    Filed: November 12, 1997
    Date of Patent: September 21, 1999
    Assignee: Spectra Group Limited, Inc.
    Inventors: Douglas C. Neckers, Kathleen G. Specht, Kesheng Feng, Roman Popielarz