Patents by Inventor Ketan Baban KATKAR

Ketan Baban KATKAR has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • STARTING MATERIAL FOR CHEMICAL VAPOR DEPOSITION COMPOSED OF ORGANOMANGANESE COMPOUND, AND CHEMICAL VAPOR DEPOSITION METHOD USING SAID STARTING MATERIAL FOR CHEMICAL VAPOR DEPOSITION
    Publication number: 20220235455
    Abstract: A raw material for chemical deposition for producing a manganese thin film or a manganese compound thin film by chemical deposition method, including an organomanganese compound represented Chemical Formula 1 in which a cyclopentadienyl ligand and an isocyanide ligand are coordinated to manganese, which has basic characteristics as a raw material for chemical deposition and enables formation of a manganese thin film with a reducing gas such as hydrogen used as a reaction gas.
    Type: Application
    Filed: June 15, 2020
    Publication date: July 28, 2022
    Applicant: TANAKA KIKINZOKU KOGYO K.K.
    Inventors: Ryosuke HARADA, Tomohiro TSUGAWA, Toshiyuki SHIGETOMI, Seung-Joon LEE, Ketan Baban KATKAR