Patents by Inventor Keui Shun Chen

Keui Shun Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD FOR PATTERNING A PHOTOSENSITIVE LAYER
    Publication number: 20120114872
    Abstract: The method of patterning a photosensitive layer includes providing a substrate including a first layer formed thereon, treating the substrate including the first layer with cations, forming a first photosensitive layer over the first layer, patterning the first photosensitive layer to form a first pattern, treating the first pattern with cations, forming a second photosensitive layer over the treated first pattern, patterning the second photosensitive layer to form a second pattern, and processing the first layer using the first and second patterns as a mask.
    Type: Application
    Filed: January 10, 2012
    Publication date: May 10, 2012
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Hsiao-Tzu Lu, Keui Shun Chen, Tsiao-Chen Wu, Vencent Chang, George Liu
  • Method for patterning a photosensitive layer
    Patent number: 8124323
    Abstract: The method of patterning a photosensitive layer includes providing a substrate including a first layer formed thereon, treating the substrate including the first layer with cations, forming a first photosensitive layer over the first layer, patterning the first photosensitive layer to form a first pattern, treating the first pattern with cations, forming a second photosensitive layer over the treated first pattern, patterning the second photosensitive layer to form a second pattern, and processing the first layer using the first and second patterns as a mask.
    Type: Grant
    Filed: September 25, 2007
    Date of Patent: February 28, 2012
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Hsiao-Tzu Lu, Keui Shun Chen, Tsiao-Chen Wu, Vencent Chang, George Liu
  • METHOD FOR PATTERNING A PHOTOSENSITIVE LAYER
    Publication number: 20090081591
    Abstract: The method of patterning a photosensitive layer includes providing a substrate including a first layer formed thereon, treating the substrate including the first layer with cations, forming a first photosensitive layer over the first layer, patterning the first photosensitive layer to form a first pattern, treating the first pattern with cations, forming a second photosensitive layer over the treated first pattern, patterning the second photosensitive layer to form a second pattern, and processing the first layer using the first and second patterns as a mask.
    Type: Application
    Filed: September 25, 2007
    Publication date: March 26, 2009
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Hsiao-Tzu Lu, Keui Shun Chen, Tsiao-Chen Wu, Vencent Chang, George Liu