Patents by Inventor Keun No Park

Keun No Park has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of preventing generation of particles in chamber
    Patent number: 6716658
    Abstract: A method of preventing contaminating particles in a chamber in a deposition device is presented. In the method, a substrate is mounted within a chamber of gas-exposure equipment. The pressure within the chamber is reduced and a treatment gas is injected into the chamber to convert a surface of the substrate to be organic. After a desired time is elapsed, the pressure within the chamber is allowed increase to atmospheric pressure or above by introducing nitrogen gas into the chamber. Nitrogen gas introduction prevents entry of air, including the moisture within the air. Without the moisture, contaminating particles are not generated since the moisture is prevented from reacting with an ammonia component of the treatment gas.
    Type: Grant
    Filed: November 30, 2000
    Date of Patent: April 6, 2004
    Assignee: LG. Philips LDC Co., Ltd.
    Inventor: Keun No Park
  • Method of preventing generation of particles in chamber
    Publication number: 20010002338
    Abstract: A method of preventing contaminating particles in a chamber in a deposition device is presented. In the method, a substrate is mounted within a chamber of gas-exposure equipment. The pressure within the chamber is reduced and a treatment gas is injected into the chamber to convert a surface of the substrate to be organic. After a desired time is elapsed, the pressure within the chamber is allowed increase to atmospheric pressure or above by introducing nitrogen gas into the chamber. Nitrogen gas introduction prevents entry of air, including the moisture within the air. Without the moisture, contaminating particles are not generated since the moisture is prevented from reacting with an ammonia component of the treatment gas.
    Type: Application
    Filed: November 30, 2000
    Publication date: May 31, 2001
    Inventor: Keun No Park